JPS6012547A - 高コントラストホトレジスト現像剤 - Google Patents

高コントラストホトレジスト現像剤

Info

Publication number
JPS6012547A
JPS6012547A JP59125000A JP12500084A JPS6012547A JP S6012547 A JPS6012547 A JP S6012547A JP 59125000 A JP59125000 A JP 59125000A JP 12500084 A JP12500084 A JP 12500084A JP S6012547 A JPS6012547 A JP S6012547A
Authority
JP
Japan
Prior art keywords
formula
group
developer
integer
carbon atoms
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59125000A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0462576B2 (enExample
Inventor
ジエ−ムズ・マ−ビン・ルイス
ロバ−ト・オ−スチン・オ−ウエンス
アンドリユ−・ジヨセフ・ブラケニ−
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honeywell International Inc
Original Assignee
Allied Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Allied Chemical Corp filed Critical Allied Chemical Corp
Publication of JPS6012547A publication Critical patent/JPS6012547A/ja
Publication of JPH0462576B2 publication Critical patent/JPH0462576B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP59125000A 1983-06-17 1984-06-18 高コントラストホトレジスト現像剤 Granted JPS6012547A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US50557183A 1983-06-17 1983-06-17
US505571 1983-06-17

Publications (2)

Publication Number Publication Date
JPS6012547A true JPS6012547A (ja) 1985-01-22
JPH0462576B2 JPH0462576B2 (enExample) 1992-10-06

Family

ID=24010858

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59125000A Granted JPS6012547A (ja) 1983-06-17 1984-06-18 高コントラストホトレジスト現像剤

Country Status (6)

Country Link
EP (1) EP0129106B1 (enExample)
JP (1) JPS6012547A (enExample)
KR (1) KR860001559B1 (enExample)
CA (1) CA1251350A (enExample)
DE (1) DE3469074D1 (enExample)
HK (1) HK49289A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61177727A (ja) * 1985-02-04 1986-08-09 Sony Corp ポジタイプフオトレジストの現像方法
JPS62247357A (ja) * 1986-01-29 1987-10-28 マイクロシィ・インコーポレーテッド コントラストが高く、金属イオンの少ないホトレジスト現像組成物および現像法
JPS63158552A (ja) * 1986-12-23 1988-07-01 Fuji Photo Film Co Ltd 平版印刷版の製造方法
JPS6472154A (en) * 1987-09-12 1989-03-17 Tama Kagaku Kogyo Kk Positive type photoresist developing solution

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01177541A (ja) * 1988-01-07 1989-07-13 Fuji Photo Film Co Ltd 平版印刷版の製造方法
US5811221A (en) * 1997-05-30 1998-09-22 Kodak Polychrome Graphics, Llc Alkaline developing composition and method of use to process lithographic printing plates
US6083662A (en) * 1997-05-30 2000-07-04 Kodak Polychrome Graphics Llc Methods of imaging and printing with a positive-working infrared radiation sensitive printing plate

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5051324A (enExample) * 1973-09-04 1975-05-08
JPS54116227A (en) * 1978-03-01 1979-09-10 Fujitsu Ltd Formation method for positive type resist image
JPS5740429A (en) * 1980-08-25 1982-03-06 Chisso Corp 4-(4-n-alkyl-1-cyclohexen-1-yl)-4'-fluorobiphenyl

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2921142A1 (de) * 1979-05-25 1980-12-11 Bayer Ag Verwendung von perfluoralkansulfonamid- salzen als tenside

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5051324A (enExample) * 1973-09-04 1975-05-08
JPS54116227A (en) * 1978-03-01 1979-09-10 Fujitsu Ltd Formation method for positive type resist image
JPS5740429A (en) * 1980-08-25 1982-03-06 Chisso Corp 4-(4-n-alkyl-1-cyclohexen-1-yl)-4'-fluorobiphenyl

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61177727A (ja) * 1985-02-04 1986-08-09 Sony Corp ポジタイプフオトレジストの現像方法
JPS62247357A (ja) * 1986-01-29 1987-10-28 マイクロシィ・インコーポレーテッド コントラストが高く、金属イオンの少ないホトレジスト現像組成物および現像法
JPS63158552A (ja) * 1986-12-23 1988-07-01 Fuji Photo Film Co Ltd 平版印刷版の製造方法
JPS6472154A (en) * 1987-09-12 1989-03-17 Tama Kagaku Kogyo Kk Positive type photoresist developing solution

Also Published As

Publication number Publication date
DE3469074D1 (en) 1988-03-03
JPH0462576B2 (enExample) 1992-10-06
EP0129106A1 (en) 1984-12-27
KR860001559B1 (ko) 1986-10-04
KR850000704A (ko) 1985-02-28
EP0129106B1 (en) 1988-01-27
HK49289A (en) 1989-06-30
CA1251350A (en) 1989-03-21

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees