JPS60124918A - 薄膜蒸着装置 - Google Patents

薄膜蒸着装置

Info

Publication number
JPS60124918A
JPS60124918A JP23556783A JP23556783A JPS60124918A JP S60124918 A JPS60124918 A JP S60124918A JP 23556783 A JP23556783 A JP 23556783A JP 23556783 A JP23556783 A JP 23556783A JP S60124918 A JPS60124918 A JP S60124918A
Authority
JP
Japan
Prior art keywords
thin film
clusters
substrate
cluster
nozzle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23556783A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0351087B2 (enrdf_load_stackoverflow
Inventor
Kenichiro Yamanishi
山西　健一郎
Akira Nushihara
主原　昭
Yoshifumi Minowa
美濃和　芳文
Sanjiyu Ko
広　三寿
Masahiro Hanai
正博 花井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP23556783A priority Critical patent/JPS60124918A/ja
Publication of JPS60124918A publication Critical patent/JPS60124918A/ja
Publication of JPH0351087B2 publication Critical patent/JPH0351087B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP23556783A 1983-12-12 1983-12-12 薄膜蒸着装置 Granted JPS60124918A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23556783A JPS60124918A (ja) 1983-12-12 1983-12-12 薄膜蒸着装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23556783A JPS60124918A (ja) 1983-12-12 1983-12-12 薄膜蒸着装置

Publications (2)

Publication Number Publication Date
JPS60124918A true JPS60124918A (ja) 1985-07-04
JPH0351087B2 JPH0351087B2 (enrdf_load_stackoverflow) 1991-08-05

Family

ID=16987900

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23556783A Granted JPS60124918A (ja) 1983-12-12 1983-12-12 薄膜蒸着装置

Country Status (1)

Country Link
JP (1) JPS60124918A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04202767A (ja) * 1990-11-30 1992-07-23 Matsushita Electric Ind Co Ltd イオンビーム発生装置および発生方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4933890A (enrdf_load_stackoverflow) * 1972-07-29 1974-03-28

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4933890A (enrdf_load_stackoverflow) * 1972-07-29 1974-03-28

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04202767A (ja) * 1990-11-30 1992-07-23 Matsushita Electric Ind Co Ltd イオンビーム発生装置および発生方法

Also Published As

Publication number Publication date
JPH0351087B2 (enrdf_load_stackoverflow) 1991-08-05

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