JPS60124913A - 薄膜蒸着装置 - Google Patents

薄膜蒸着装置

Info

Publication number
JPS60124913A
JPS60124913A JP23556283A JP23556283A JPS60124913A JP S60124913 A JPS60124913 A JP S60124913A JP 23556283 A JP23556283 A JP 23556283A JP 23556283 A JP23556283 A JP 23556283A JP S60124913 A JPS60124913 A JP S60124913A
Authority
JP
Japan
Prior art keywords
clusters
substrate
thin film
vapor
crucible
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23556283A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0443411B2 (enrdf_load_stackoverflow
Inventor
Kenichiro Yamanishi
山西 健一郎
Akira Nushihara
主原 昭
Yoshifumi Minowa
美濃和 芳文
Sanjiyu Ko
広 三寿
Masahiro Hanai
正博 花井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP23556283A priority Critical patent/JPS60124913A/ja
Publication of JPS60124913A publication Critical patent/JPS60124913A/ja
Publication of JPH0443411B2 publication Critical patent/JPH0443411B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02612Formation types
    • H01L21/02617Deposition types
    • H01L21/02631Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP23556283A 1983-12-12 1983-12-12 薄膜蒸着装置 Granted JPS60124913A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23556283A JPS60124913A (ja) 1983-12-12 1983-12-12 薄膜蒸着装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23556283A JPS60124913A (ja) 1983-12-12 1983-12-12 薄膜蒸着装置

Publications (2)

Publication Number Publication Date
JPS60124913A true JPS60124913A (ja) 1985-07-04
JPH0443411B2 JPH0443411B2 (enrdf_load_stackoverflow) 1992-07-16

Family

ID=16987824

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23556283A Granted JPS60124913A (ja) 1983-12-12 1983-12-12 薄膜蒸着装置

Country Status (1)

Country Link
JP (1) JPS60124913A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH0443411B2 (enrdf_load_stackoverflow) 1992-07-16

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