JPS60108370A - 高純度炭化けい素スパッタリング用ターゲット材の製造方法 - Google Patents

高純度炭化けい素スパッタリング用ターゲット材の製造方法

Info

Publication number
JPS60108370A
JPS60108370A JP58213478A JP21347883A JPS60108370A JP S60108370 A JPS60108370 A JP S60108370A JP 58213478 A JP58213478 A JP 58213478A JP 21347883 A JP21347883 A JP 21347883A JP S60108370 A JPS60108370 A JP S60108370A
Authority
JP
Japan
Prior art keywords
silicon carbide
target
sputtering target
sintering
impurities
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58213478A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0214312B2 (enrdf_load_stackoverflow
Inventor
守信 遠藤
鈴木　仁一郎
戸出　孝
高見沢　稔
小林　泰史
本宮　達彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP58213478A priority Critical patent/JPS60108370A/ja
Publication of JPS60108370A publication Critical patent/JPS60108370A/ja
Publication of JPH0214312B2 publication Critical patent/JPH0214312B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Ceramic Products (AREA)
JP58213478A 1983-11-14 1983-11-14 高純度炭化けい素スパッタリング用ターゲット材の製造方法 Granted JPS60108370A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58213478A JPS60108370A (ja) 1983-11-14 1983-11-14 高純度炭化けい素スパッタリング用ターゲット材の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58213478A JPS60108370A (ja) 1983-11-14 1983-11-14 高純度炭化けい素スパッタリング用ターゲット材の製造方法

Publications (2)

Publication Number Publication Date
JPS60108370A true JPS60108370A (ja) 1985-06-13
JPH0214312B2 JPH0214312B2 (enrdf_load_stackoverflow) 1990-04-06

Family

ID=16639861

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58213478A Granted JPS60108370A (ja) 1983-11-14 1983-11-14 高純度炭化けい素スパッタリング用ターゲット材の製造方法

Country Status (1)

Country Link
JP (1) JPS60108370A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6001756A (en) * 1996-02-29 1999-12-14 Bridgestone Corporation Process for making a silicon carbide sintered body
US6090733A (en) * 1997-08-27 2000-07-18 Bridgestone Corporation Sintered silicon carbide and method for producing the same
JP2011256062A (ja) * 2010-06-07 2011-12-22 Bridgestone Corp 炭化ケイ素焼結体の製造方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6001756A (en) * 1996-02-29 1999-12-14 Bridgestone Corporation Process for making a silicon carbide sintered body
US6090733A (en) * 1997-08-27 2000-07-18 Bridgestone Corporation Sintered silicon carbide and method for producing the same
US6214755B1 (en) 1997-08-27 2001-04-10 Bridgestone Corporation Method for producing sintered silicon carbide
JP2011256062A (ja) * 2010-06-07 2011-12-22 Bridgestone Corp 炭化ケイ素焼結体の製造方法

Also Published As

Publication number Publication date
JPH0214312B2 (enrdf_load_stackoverflow) 1990-04-06

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