JPS6010716A - 半導体ウエ−ハ試験方法 - Google Patents
半導体ウエ−ハ試験方法Info
- Publication number
- JPS6010716A JPS6010716A JP58119595A JP11959583A JPS6010716A JP S6010716 A JPS6010716 A JP S6010716A JP 58119595 A JP58119595 A JP 58119595A JP 11959583 A JP11959583 A JP 11959583A JP S6010716 A JPS6010716 A JP S6010716A
- Authority
- JP
- Japan
- Prior art keywords
- row
- defective
- wafer
- point
- column
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H10P30/20—
Landscapes
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58119595A JPS6010716A (ja) | 1983-06-30 | 1983-06-30 | 半導体ウエ−ハ試験方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58119595A JPS6010716A (ja) | 1983-06-30 | 1983-06-30 | 半導体ウエ−ハ試験方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6010716A true JPS6010716A (ja) | 1985-01-19 |
| JPS6321345B2 JPS6321345B2 (OSRAM) | 1988-05-06 |
Family
ID=14765271
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58119595A Granted JPS6010716A (ja) | 1983-06-30 | 1983-06-30 | 半導体ウエ−ハ試験方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6010716A (OSRAM) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6425430A (en) * | 1987-07-21 | 1989-01-27 | Tokyo Electron Ltd | Probe device |
| US7282427B1 (en) | 2006-05-04 | 2007-10-16 | Applied Materials, Inc. | Method of implanting a substrate and an ion implanter for performing the method |
| US7679737B2 (en) | 2007-01-10 | 2010-03-16 | Fujitsu Microelectronics Limited | Method, system and apparatus of inspection |
-
1983
- 1983-06-30 JP JP58119595A patent/JPS6010716A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6425430A (en) * | 1987-07-21 | 1989-01-27 | Tokyo Electron Ltd | Probe device |
| US7282427B1 (en) | 2006-05-04 | 2007-10-16 | Applied Materials, Inc. | Method of implanting a substrate and an ion implanter for performing the method |
| US7679737B2 (en) | 2007-01-10 | 2010-03-16 | Fujitsu Microelectronics Limited | Method, system and apparatus of inspection |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6321345B2 (OSRAM) | 1988-05-06 |
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