JPS60101974A - 半導体装置 - Google Patents
半導体装置Info
- Publication number
- JPS60101974A JPS60101974A JP58209376A JP20937683A JPS60101974A JP S60101974 A JPS60101974 A JP S60101974A JP 58209376 A JP58209376 A JP 58209376A JP 20937683 A JP20937683 A JP 20937683A JP S60101974 A JPS60101974 A JP S60101974A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- source
- gaas
- resistance
- gate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/80—FETs having rectifying junction gate electrodes
Landscapes
- Junction Field-Effect Transistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58209376A JPS60101974A (ja) | 1983-11-08 | 1983-11-08 | 半導体装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58209376A JPS60101974A (ja) | 1983-11-08 | 1983-11-08 | 半導体装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60101974A true JPS60101974A (ja) | 1985-06-06 |
| JPH0210586B2 JPH0210586B2 (cg-RX-API-DMAC7.html) | 1990-03-08 |
Family
ID=16571893
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58209376A Granted JPS60101974A (ja) | 1983-11-08 | 1983-11-08 | 半導体装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60101974A (cg-RX-API-DMAC7.html) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63142873A (ja) * | 1986-12-05 | 1988-06-15 | Nec Corp | 半導体装置及びその製造方法 |
| JPH0482275A (ja) * | 1990-01-31 | 1992-03-16 | Res Dev Corp Of Japan | 半導体デバイス及びその製造方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5223275A (en) * | 1975-08-15 | 1977-02-22 | Hitachi Ltd | Field effect transistor and its manufacturing method |
| JPS56124273A (en) * | 1980-03-04 | 1981-09-29 | Semiconductor Res Found | Semiconductor device |
-
1983
- 1983-11-08 JP JP58209376A patent/JPS60101974A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5223275A (en) * | 1975-08-15 | 1977-02-22 | Hitachi Ltd | Field effect transistor and its manufacturing method |
| JPS56124273A (en) * | 1980-03-04 | 1981-09-29 | Semiconductor Res Found | Semiconductor device |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63142873A (ja) * | 1986-12-05 | 1988-06-15 | Nec Corp | 半導体装置及びその製造方法 |
| JPH0482275A (ja) * | 1990-01-31 | 1992-03-16 | Res Dev Corp Of Japan | 半導体デバイス及びその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0210586B2 (cg-RX-API-DMAC7.html) | 1990-03-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5179037A (en) | Integration of lateral and vertical quantum well transistors in the same epitaxial stack | |
| JP2801624B2 (ja) | ヘテロ接合バイポーラトランジスタ | |
| EP0313749B1 (en) | Heterojunction bipolar transistor | |
| US5336909A (en) | Bipolar transistor with an improved collector structure | |
| JPH0624208B2 (ja) | 半導体装置 | |
| US4716445A (en) | Heterojunction bipolar transistor having a base region of germanium | |
| US6570241B2 (en) | Semiconductor device having the effect that the drop in the current gain is kept to the minimum, when the substrate density is amplified and that the variation in the collector current is improved | |
| US6147371A (en) | Bipolar transistor and manufacturing method for same | |
| US4903091A (en) | Heterojunction transistor having bipolar characteristics | |
| JPH0665216B2 (ja) | 半導体装置 | |
| JPH05315366A (ja) | 半導体装置 | |
| US5489785A (en) | Band-to-band resonant tunneling transistor | |
| JP2537168B2 (ja) | ヘテロ接合バイポ−ラトランジスタ | |
| KR100548047B1 (ko) | 전계효과트랜지스터 | |
| JPS60101974A (ja) | 半導体装置 | |
| US4772932A (en) | Bipolar transistor and including gas layers between the emitter and base and the base and collector | |
| EP0229672B1 (en) | A heterojunction bipolar transistor having a base region of germanium | |
| JPH07142706A (ja) | ヘテロ接合半導体装置の製造方法およびヘテロ接合半導体装置 | |
| JPH05283673A (ja) | 共振トンネル半導体装置 | |
| US5408111A (en) | Field-effect transistor having a double pulse-doped structure | |
| JPH07263708A (ja) | トンネルトランジスタ | |
| JP3256643B2 (ja) | 半導体装置 | |
| JP4405060B2 (ja) | ヘテロ接合型バイポーラトランジスタ | |
| JP2770583B2 (ja) | コレクタトップ型ヘテロ接合バイポーラトランジスタの製造方法 | |
| JPH0388369A (ja) | ヘテロ構造半導体装置 |