JPS5996725A - マ−ク位置検出装置 - Google Patents

マ−ク位置検出装置

Info

Publication number
JPS5996725A
JPS5996725A JP20663182A JP20663182A JPS5996725A JP S5996725 A JPS5996725 A JP S5996725A JP 20663182 A JP20663182 A JP 20663182A JP 20663182 A JP20663182 A JP 20663182A JP S5996725 A JPS5996725 A JP S5996725A
Authority
JP
Japan
Prior art keywords
mark
signal
electron beam
moment
scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20663182A
Other languages
English (en)
Japanese (ja)
Other versions
JPH041494B2 (enrdf_load_stackoverflow
Inventor
Hideo Kusakabe
秀雄 日下部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP20663182A priority Critical patent/JPS5996725A/ja
Publication of JPS5996725A publication Critical patent/JPS5996725A/ja
Publication of JPH041494B2 publication Critical patent/JPH041494B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP20663182A 1982-11-25 1982-11-25 マ−ク位置検出装置 Granted JPS5996725A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20663182A JPS5996725A (ja) 1982-11-25 1982-11-25 マ−ク位置検出装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20663182A JPS5996725A (ja) 1982-11-25 1982-11-25 マ−ク位置検出装置

Publications (2)

Publication Number Publication Date
JPS5996725A true JPS5996725A (ja) 1984-06-04
JPH041494B2 JPH041494B2 (enrdf_load_stackoverflow) 1992-01-13

Family

ID=16526558

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20663182A Granted JPS5996725A (ja) 1982-11-25 1982-11-25 マ−ク位置検出装置

Country Status (1)

Country Link
JP (1) JPS5996725A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62229939A (ja) * 1986-03-31 1987-10-08 Advantest Corp 荷電粒子ビ−ム露光装置におけるマ−ク位置検出回路

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62229939A (ja) * 1986-03-31 1987-10-08 Advantest Corp 荷電粒子ビ−ム露光装置におけるマ−ク位置検出回路

Also Published As

Publication number Publication date
JPH041494B2 (enrdf_load_stackoverflow) 1992-01-13

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