JPH0554605B2 - - Google Patents
Info
- Publication number
- JPH0554605B2 JPH0554605B2 JP60131760A JP13176085A JPH0554605B2 JP H0554605 B2 JPH0554605 B2 JP H0554605B2 JP 60131760 A JP60131760 A JP 60131760A JP 13176085 A JP13176085 A JP 13176085A JP H0554605 B2 JPH0554605 B2 JP H0554605B2
- Authority
- JP
- Japan
- Prior art keywords
- edge
- signal
- pattern
- sample
- measuring device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001514 detection method Methods 0.000 claims description 7
- 238000010894 electron beam technology Methods 0.000 claims description 7
- 230000001678 irradiating effect Effects 0.000 claims 1
- 230000000694 effects Effects 0.000 description 40
- 239000000523 sample Substances 0.000 description 11
- 238000012937 correction Methods 0.000 description 8
- 238000003708 edge detection Methods 0.000 description 8
- 230000015654 memory Effects 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000012545 processing Methods 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 230000006870 function Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 230000007274 generation of a signal involved in cell-cell signaling Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
Landscapes
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60131760A JPS61290313A (ja) | 1985-06-19 | 1985-06-19 | 立体形状測定装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60131760A JPS61290313A (ja) | 1985-06-19 | 1985-06-19 | 立体形状測定装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61290313A JPS61290313A (ja) | 1986-12-20 |
| JPH0554605B2 true JPH0554605B2 (enrdf_load_stackoverflow) | 1993-08-13 |
Family
ID=15065532
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60131760A Granted JPS61290313A (ja) | 1985-06-19 | 1985-06-19 | 立体形状測定装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61290313A (enrdf_load_stackoverflow) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0621785B2 (ja) * | 1985-06-28 | 1994-03-23 | 日本電気株式会社 | 形状測定方法 |
| JP2002131252A (ja) * | 2000-10-13 | 2002-05-09 | Applied Materials Inc | 基体検査方法及び装置 |
| DE112008004172T5 (de) | 2008-12-26 | 2012-03-15 | Advantest Corporation | Strukturmessgerät und Strukturmessverfahren |
-
1985
- 1985-06-19 JP JP60131760A patent/JPS61290313A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61290313A (ja) | 1986-12-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4766311A (en) | Method and apparatus for precision SEM measurements | |
| JPH0646550B2 (ja) | 電子ビ−ム定位置照射制御方法および電子ビ−ム定位置照射制御装置 | |
| US4639604A (en) | Method and apparatus for detecting an edge position of a pattern and eliminating overlapping pattern signals | |
| KR20000034930A (ko) | 주사형 전자현미경으로 표면의 기울기를 측정해서 샘플형상을 결정하는 방법 및 장치 | |
| US4670652A (en) | Charged particle beam microprobe apparatus | |
| US20080073526A1 (en) | Charged particle beam apparatus | |
| JPS61290312A (ja) | 断面形状測定装置 | |
| JP4215220B2 (ja) | 表面検査方法及び表面検査装置 | |
| JPH0554605B2 (enrdf_load_stackoverflow) | ||
| JPH0727548A (ja) | ホールパターン形状評価装置 | |
| JPH0416707A (ja) | 電子ビームによるパターン認識方法 | |
| JP3351671B2 (ja) | 荷電粒子ビームの測定方法 | |
| JP2009277749A (ja) | 高さ測定装置および高さ測定方法 | |
| JPS6347334B2 (enrdf_load_stackoverflow) | ||
| JP2787928B2 (ja) | 画像信号処理方法 | |
| JPH11142109A (ja) | ３次元計測装置、及び３次元計測方法 | |
| JP2571110B2 (ja) | 荷電ビームを用いたパタン寸法測定方法およびその装置 | |
| JPH0261544A (ja) | 反射電子回折測定装置 | |
| JPH04269614A (ja) | パターン位置検出方法及びその実施装置 | |
| JP2001153629A (ja) | 印刷半田測定装置 | |
| JPH0372923B2 (enrdf_load_stackoverflow) | ||
| JP2644257B2 (ja) | ビーム検出用ターゲット | |
| JP2986995B2 (ja) | 二次電子像変形補正装置 | |
| JP2507566B2 (ja) | 電子ビ―ム測長方法および装置 | |
| JP2758979B2 (ja) | マーク位置検出方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |