JPH041494B2 - - Google Patents
Info
- Publication number
- JPH041494B2 JPH041494B2 JP20663182A JP20663182A JPH041494B2 JP H041494 B2 JPH041494 B2 JP H041494B2 JP 20663182 A JP20663182 A JP 20663182A JP 20663182 A JP20663182 A JP 20663182A JP H041494 B2 JPH041494 B2 JP H041494B2
- Authority
- JP
- Japan
- Prior art keywords
- mark
- signal
- electron beam
- scanning
- moment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 claims description 22
- 238000001514 detection method Methods 0.000 claims description 17
- 230000001186 cumulative effect Effects 0.000 description 22
- 238000000034 method Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000035508 accumulation Effects 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20663182A JPS5996725A (ja) | 1982-11-25 | 1982-11-25 | マ−ク位置検出装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20663182A JPS5996725A (ja) | 1982-11-25 | 1982-11-25 | マ−ク位置検出装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5996725A JPS5996725A (ja) | 1984-06-04 |
JPH041494B2 true JPH041494B2 (enrdf_load_stackoverflow) | 1992-01-13 |
Family
ID=16526558
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20663182A Granted JPS5996725A (ja) | 1982-11-25 | 1982-11-25 | マ−ク位置検出装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5996725A (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62229939A (ja) * | 1986-03-31 | 1987-10-08 | Advantest Corp | 荷電粒子ビ−ム露光装置におけるマ−ク位置検出回路 |
-
1982
- 1982-11-25 JP JP20663182A patent/JPS5996725A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5996725A (ja) | 1984-06-04 |
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