JPS599169A - 薄膜の製造方法 - Google Patents

薄膜の製造方法

Info

Publication number
JPS599169A
JPS599169A JP11615382A JP11615382A JPS599169A JP S599169 A JPS599169 A JP S599169A JP 11615382 A JP11615382 A JP 11615382A JP 11615382 A JP11615382 A JP 11615382A JP S599169 A JPS599169 A JP S599169A
Authority
JP
Japan
Prior art keywords
target material
target
sputtering
thin film
materials
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11615382A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0314904B2 (enrdf_load_stackoverflow
Inventor
Yuujirou Kaneko
裕治郎 金子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP11615382A priority Critical patent/JPS599169A/ja
Publication of JPS599169A publication Critical patent/JPS599169A/ja
Publication of JPH0314904B2 publication Critical patent/JPH0314904B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
JP11615382A 1982-07-06 1982-07-06 薄膜の製造方法 Granted JPS599169A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11615382A JPS599169A (ja) 1982-07-06 1982-07-06 薄膜の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11615382A JPS599169A (ja) 1982-07-06 1982-07-06 薄膜の製造方法

Publications (2)

Publication Number Publication Date
JPS599169A true JPS599169A (ja) 1984-01-18
JPH0314904B2 JPH0314904B2 (enrdf_load_stackoverflow) 1991-02-27

Family

ID=14680070

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11615382A Granted JPS599169A (ja) 1982-07-06 1982-07-06 薄膜の製造方法

Country Status (1)

Country Link
JP (1) JPS599169A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60202925A (ja) * 1984-03-28 1985-10-14 Hitachi Ltd スパツタタ−ゲツトおよびスパツタリング方法
US4835062A (en) * 1985-04-11 1989-05-30 Kernforschungszentrum Karlsruhe Gmbh Protective coating for metallic substrates
EP0489396A1 (de) * 1990-12-06 1992-06-10 Multi-Arc Oberflächentechnik GmbH Segmentierte Kathode für Lichtbogenbeschichtungsverfahren

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60202925A (ja) * 1984-03-28 1985-10-14 Hitachi Ltd スパツタタ−ゲツトおよびスパツタリング方法
US4835062A (en) * 1985-04-11 1989-05-30 Kernforschungszentrum Karlsruhe Gmbh Protective coating for metallic substrates
EP0489396A1 (de) * 1990-12-06 1992-06-10 Multi-Arc Oberflächentechnik GmbH Segmentierte Kathode für Lichtbogenbeschichtungsverfahren

Also Published As

Publication number Publication date
JPH0314904B2 (enrdf_load_stackoverflow) 1991-02-27

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