JPS5989763A - 薄膜蒸着装置 - Google Patents
薄膜蒸着装置Info
- Publication number
- JPS5989763A JPS5989763A JP17969783A JP17969783A JPS5989763A JP S5989763 A JPS5989763 A JP S5989763A JP 17969783 A JP17969783 A JP 17969783A JP 17969783 A JP17969783 A JP 17969783A JP S5989763 A JPS5989763 A JP S5989763A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- grid
- thin film
- vapor deposition
- evaporated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17969783A JPS5989763A (ja) | 1983-09-28 | 1983-09-28 | 薄膜蒸着装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17969783A JPS5989763A (ja) | 1983-09-28 | 1983-09-28 | 薄膜蒸着装置 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP24258883A Division JPS59157279A (ja) | 1983-12-22 | 1983-12-22 | 薄膜蒸着装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5989763A true JPS5989763A (ja) | 1984-05-24 |
JPH0153351B2 JPH0153351B2 (ko) | 1989-11-14 |
Family
ID=16070288
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17969783A Granted JPS5989763A (ja) | 1983-09-28 | 1983-09-28 | 薄膜蒸着装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5989763A (ko) |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63455A (ja) * | 1986-06-18 | 1988-01-05 | Ricoh Co Ltd | 薄膜蒸着装置 |
JPS6386866A (ja) * | 1986-09-29 | 1988-04-18 | Ricoh Co Ltd | 薄膜形成装置 |
JPH01100255A (ja) * | 1987-10-13 | 1989-04-18 | Ricoh Co Ltd | 反射防止膜の成膜方法 |
JPH01167645A (ja) * | 1987-12-23 | 1989-07-03 | Ricoh Co Ltd | ガスセンサの製造方法 |
US4854265A (en) * | 1986-06-18 | 1989-08-08 | Ricoh Company, Ltd. | Thin film forming apparatus |
JPH01198468A (ja) * | 1988-02-04 | 1989-08-10 | Ricoh Co Ltd | 薄膜形成装置 |
US4876984A (en) * | 1987-06-12 | 1989-10-31 | Ricoh Company, Ltd. | Apparatus for forming a thin film |
US4960072A (en) * | 1987-08-05 | 1990-10-02 | Ricoh Company, Ltd. | Apparatus for forming a thin film |
US4974544A (en) * | 1986-10-07 | 1990-12-04 | Ricoh Company, Co. | Vapor deposition apparatus |
US5058527A (en) * | 1990-07-24 | 1991-10-22 | Ricoh Company, Ltd. | Thin film forming apparatus |
US5133849A (en) * | 1988-12-12 | 1992-07-28 | Ricoh Company, Ltd. | Thin film forming apparatus |
US5147523A (en) * | 1990-06-11 | 1992-09-15 | Ricoh Company, Ltd. | Thin film gas sensor |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5533919U (ko) * | 1978-08-23 | 1980-03-05 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5533919B2 (ko) * | 1973-02-07 | 1980-09-03 |
-
1983
- 1983-09-28 JP JP17969783A patent/JPS5989763A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5533919U (ko) * | 1978-08-23 | 1980-03-05 |
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4854265A (en) * | 1986-06-18 | 1989-08-08 | Ricoh Company, Ltd. | Thin film forming apparatus |
JPS63455A (ja) * | 1986-06-18 | 1988-01-05 | Ricoh Co Ltd | 薄膜蒸着装置 |
JPS6386866A (ja) * | 1986-09-29 | 1988-04-18 | Ricoh Co Ltd | 薄膜形成装置 |
US4974544A (en) * | 1986-10-07 | 1990-12-04 | Ricoh Company, Co. | Vapor deposition apparatus |
GB2205860B (en) * | 1987-06-12 | 1991-09-25 | Ricoh Kk | Apparatus for forming a thin film |
US4876984A (en) * | 1987-06-12 | 1989-10-31 | Ricoh Company, Ltd. | Apparatus for forming a thin film |
US4960072A (en) * | 1987-08-05 | 1990-10-02 | Ricoh Company, Ltd. | Apparatus for forming a thin film |
US5112466A (en) * | 1987-08-05 | 1992-05-12 | Ricoh Company, Ltd. | Apparatus for forming a thin film |
JPH01100255A (ja) * | 1987-10-13 | 1989-04-18 | Ricoh Co Ltd | 反射防止膜の成膜方法 |
JPH01167645A (ja) * | 1987-12-23 | 1989-07-03 | Ricoh Co Ltd | ガスセンサの製造方法 |
JPH01198468A (ja) * | 1988-02-04 | 1989-08-10 | Ricoh Co Ltd | 薄膜形成装置 |
US5133849A (en) * | 1988-12-12 | 1992-07-28 | Ricoh Company, Ltd. | Thin film forming apparatus |
US5147523A (en) * | 1990-06-11 | 1992-09-15 | Ricoh Company, Ltd. | Thin film gas sensor |
US5058527A (en) * | 1990-07-24 | 1991-10-22 | Ricoh Company, Ltd. | Thin film forming apparatus |
Also Published As
Publication number | Publication date |
---|---|
JPH0153351B2 (ko) | 1989-11-14 |
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