JPS5989421A - 位置検出装置 - Google Patents

位置検出装置

Info

Publication number
JPS5989421A
JPS5989421A JP57200066A JP20006682A JPS5989421A JP S5989421 A JPS5989421 A JP S5989421A JP 57200066 A JP57200066 A JP 57200066A JP 20006682 A JP20006682 A JP 20006682A JP S5989421 A JPS5989421 A JP S5989421A
Authority
JP
Japan
Prior art keywords
mask
alignment
wafer
marks
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57200066A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6362090B2 (enrdf_load_stackoverflow
Inventor
Naoki Ayada
綾田　直樹
Yasumi Yamada
山田　保美
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP57200066A priority Critical patent/JPS5989421A/ja
Priority to US06/550,097 priority patent/US4655599A/en
Publication of JPS5989421A publication Critical patent/JPS5989421A/ja
Publication of JPS6362090B2 publication Critical patent/JPS6362090B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Control Of Position Or Direction (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP57200066A 1982-11-15 1982-11-15 位置検出装置 Granted JPS5989421A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP57200066A JPS5989421A (ja) 1982-11-15 1982-11-15 位置検出装置
US06/550,097 US4655599A (en) 1982-11-15 1983-11-09 Mask aligner having a photo-mask setting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57200066A JPS5989421A (ja) 1982-11-15 1982-11-15 位置検出装置

Publications (2)

Publication Number Publication Date
JPS5989421A true JPS5989421A (ja) 1984-05-23
JPS6362090B2 JPS6362090B2 (enrdf_load_stackoverflow) 1988-12-01

Family

ID=16418269

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57200066A Granted JPS5989421A (ja) 1982-11-15 1982-11-15 位置検出装置

Country Status (1)

Country Link
JP (1) JPS5989421A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61116836A (ja) * 1984-11-13 1986-06-04 Hitachi Ltd 縮小投影露光方式におけるアライメント方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5356975A (en) * 1976-11-01 1978-05-23 Hitachi Ltd Exposure apparatus
JPS53144270A (en) * 1977-05-23 1978-12-15 Hitachi Ltd Projection-type mask aligner
JPS57183031A (en) * 1981-05-06 1982-11-11 Toshiba Corp Method for wafer exposure and device thereof

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5356975A (en) * 1976-11-01 1978-05-23 Hitachi Ltd Exposure apparatus
JPS53144270A (en) * 1977-05-23 1978-12-15 Hitachi Ltd Projection-type mask aligner
JPS57183031A (en) * 1981-05-06 1982-11-11 Toshiba Corp Method for wafer exposure and device thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61116836A (ja) * 1984-11-13 1986-06-04 Hitachi Ltd 縮小投影露光方式におけるアライメント方法

Also Published As

Publication number Publication date
JPS6362090B2 (enrdf_load_stackoverflow) 1988-12-01

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