JPS6352769B2 - - Google Patents
Info
- Publication number
- JPS6352769B2 JPS6352769B2 JP57200061A JP20006182A JPS6352769B2 JP S6352769 B2 JPS6352769 B2 JP S6352769B2 JP 57200061 A JP57200061 A JP 57200061A JP 20006182 A JP20006182 A JP 20006182A JP S6352769 B2 JPS6352769 B2 JP S6352769B2
- Authority
- JP
- Japan
- Prior art keywords
- mask
- alignment
- wafer
- objective lens
- mark
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Control Of Position Or Direction (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57200061A JPS5989416A (ja) | 1982-11-15 | 1982-11-15 | 位置検出方法 |
US06/550,097 US4655599A (en) | 1982-11-15 | 1983-11-09 | Mask aligner having a photo-mask setting device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57200061A JPS5989416A (ja) | 1982-11-15 | 1982-11-15 | 位置検出方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5989416A JPS5989416A (ja) | 1984-05-23 |
JPS6352769B2 true JPS6352769B2 (enrdf_load_stackoverflow) | 1988-10-20 |
Family
ID=16418185
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57200061A Granted JPS5989416A (ja) | 1982-11-15 | 1982-11-15 | 位置検出方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5989416A (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0789534B2 (ja) * | 1986-07-04 | 1995-09-27 | キヤノン株式会社 | 露光方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS602772B2 (ja) * | 1976-11-01 | 1985-01-23 | 株式会社日立製作所 | 露光装置 |
JPS55135831A (en) * | 1979-04-03 | 1980-10-23 | Optimetrix Corp | Improved stepprepetion projectionnmatching exposer |
JPS57142612A (en) * | 1981-02-27 | 1982-09-03 | Nippon Kogaku Kk <Nikon> | Alignment optical system of projection type exposure device |
-
1982
- 1982-11-15 JP JP57200061A patent/JPS5989416A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5989416A (ja) | 1984-05-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4062623A (en) | Device for observing an object | |
US4153371A (en) | Method and apparatus for reduction-projection type mask alignment | |
JPH0580497A (ja) | 面状態検査装置 | |
JPH04232951A (ja) | 面状態検査装置 | |
US4669867A (en) | Alignment and exposure apparatus | |
JPH0785466B2 (ja) | 位置合せ装置 | |
JPS6341023A (ja) | ウエハをレチクルヘアラインする方法および装置 | |
JPS61174717A (ja) | 位置合わせ装置 | |
WO1994024611A1 (en) | On axis mask and wafer alignment system | |
US4655599A (en) | Mask aligner having a photo-mask setting device | |
US5448350A (en) | Surface state inspection apparatus and exposure apparatus including the same | |
US4801808A (en) | Alignment and exposure apparatus having an objective lens system capable of observing a mark on an exposure optical holding member to permit alignment of a mask relative to the exposure optical system | |
US4717257A (en) | Alignment device | |
GB2133565A (en) | An observation device and an aligner using same | |
JPS6352767B2 (enrdf_load_stackoverflow) | ||
JPS6352769B2 (enrdf_load_stackoverflow) | ||
JPS6362090B2 (enrdf_load_stackoverflow) | ||
JPS5989418A (ja) | パタ−ン検知方法 | |
JP3448663B2 (ja) | 投影露光装置 | |
JPH0344242B2 (enrdf_load_stackoverflow) | ||
JPS63221616A (ja) | マスク・ウエハの位置合わせ方法 | |
JPS5989420A (ja) | 位置合わせ装置 | |
JPS5989419A (ja) | 位置合わせ装置 | |
JP4214555B2 (ja) | パターン位置計測装置 | |
JP3211246B2 (ja) | 投影露光装置及び素子製造方法 |