JPS5989416A - 位置検出方法 - Google Patents

位置検出方法

Info

Publication number
JPS5989416A
JPS5989416A JP57200061A JP20006182A JPS5989416A JP S5989416 A JPS5989416 A JP S5989416A JP 57200061 A JP57200061 A JP 57200061A JP 20006182 A JP20006182 A JP 20006182A JP S5989416 A JPS5989416 A JP S5989416A
Authority
JP
Japan
Prior art keywords
mask
wafer
alignment
mark
objective lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57200061A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6352769B2 (enrdf_load_stackoverflow
Inventor
Naoki Ayada
綾田　直樹
Yasumi Yamada
山田　保美
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP57200061A priority Critical patent/JPS5989416A/ja
Priority to US06/550,097 priority patent/US4655599A/en
Publication of JPS5989416A publication Critical patent/JPS5989416A/ja
Publication of JPS6352769B2 publication Critical patent/JPS6352769B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
JP57200061A 1982-11-15 1982-11-15 位置検出方法 Granted JPS5989416A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP57200061A JPS5989416A (ja) 1982-11-15 1982-11-15 位置検出方法
US06/550,097 US4655599A (en) 1982-11-15 1983-11-09 Mask aligner having a photo-mask setting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57200061A JPS5989416A (ja) 1982-11-15 1982-11-15 位置検出方法

Publications (2)

Publication Number Publication Date
JPS5989416A true JPS5989416A (ja) 1984-05-23
JPS6352769B2 JPS6352769B2 (enrdf_load_stackoverflow) 1988-10-20

Family

ID=16418185

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57200061A Granted JPS5989416A (ja) 1982-11-15 1982-11-15 位置検出方法

Country Status (1)

Country Link
JP (1) JPS5989416A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6313329A (ja) * 1986-07-04 1988-01-20 Canon Inc 露光方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5356975A (en) * 1976-11-01 1978-05-23 Hitachi Ltd Exposure apparatus
JPS55135831A (en) * 1979-04-03 1980-10-23 Optimetrix Corp Improved stepprepetion projectionnmatching exposer
JPS57142612A (en) * 1981-02-27 1982-09-03 Nippon Kogaku Kk <Nikon> Alignment optical system of projection type exposure device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5356975A (en) * 1976-11-01 1978-05-23 Hitachi Ltd Exposure apparatus
JPS55135831A (en) * 1979-04-03 1980-10-23 Optimetrix Corp Improved stepprepetion projectionnmatching exposer
JPS57142612A (en) * 1981-02-27 1982-09-03 Nippon Kogaku Kk <Nikon> Alignment optical system of projection type exposure device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6313329A (ja) * 1986-07-04 1988-01-20 Canon Inc 露光方法

Also Published As

Publication number Publication date
JPS6352769B2 (enrdf_load_stackoverflow) 1988-10-20

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