JPS5989416A - Pattern printing apparatus - Google Patents

Pattern printing apparatus

Info

Publication number
JPS5989416A
JPS5989416A JP57200061A JP20006182A JPS5989416A JP S5989416 A JPS5989416 A JP S5989416A JP 57200061 A JP57200061 A JP 57200061A JP 20006182 A JP20006182 A JP 20006182A JP S5989416 A JPS5989416 A JP S5989416A
Authority
JP
Japan
Prior art keywords
mask
wafer
alignment
printing apparatus
detector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57200061A
Other languages
Japanese (ja)
Other versions
JPS6352769B2 (en
Inventor
Naoki Ayada
Yasumi Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP57200061A priority Critical patent/JPS6352769B2/ja
Priority claimed from US06/550,097 external-priority patent/US4655599A/en
Publication of JPS5989416A publication Critical patent/JPS5989416A/en
Publication of JPS6352769B2 publication Critical patent/JPS6352769B2/ja
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Abstract

PURPOSE:To set a mask at a predetermined position with an accuracy higher than a criterion, by carrying out the mark position detection and the mask-wafer relative position detection by the same detector. CONSTITUTION:A mask is set at a predetermined position by mask position detectors 47, 47' for mask alignment. The mask and a wafer are aligned with each other by a detector which also detects the relative position between the mask and the wafer for mask-wafer alignment. Prior to the detection of the relative position between the mask and the wafer, the wafer is set at a predetermined position by a wafer moving device and a further detector which detects the wafer position for wafer alignment.
JP57200061A 1982-11-15 1982-11-15 Expired JPS6352769B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57200061A JPS6352769B2 (en) 1982-11-15 1982-11-15

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP57200061A JPS6352769B2 (en) 1982-11-15 1982-11-15
US06/550,097 US4655599A (en) 1982-11-15 1983-11-09 Mask aligner having a photo-mask setting device

Publications (2)

Publication Number Publication Date
JPS5989416A true JPS5989416A (en) 1984-05-23
JPS6352769B2 JPS6352769B2 (en) 1988-10-20

Family

ID=16418185

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57200061A Expired JPS6352769B2 (en) 1982-11-15 1982-11-15

Country Status (1)

Country Link
JP (1) JPS6352769B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6313329A (en) * 1986-07-04 1988-01-20 Canon Inc Exposure device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5356975A (en) * 1976-11-01 1978-05-23 Hitachi Ltd Exposure apparatus
JPS55135831A (en) * 1979-04-03 1980-10-23 Optimetrix Corp Improved stepprepetion projectionnmatching exposer
JPS57142612A (en) * 1981-02-27 1982-09-03 Nippon Kogaku Kk <Nikon> Alignment optical system of projection type exposure device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5356975A (en) * 1976-11-01 1978-05-23 Hitachi Ltd Exposure apparatus
JPS55135831A (en) * 1979-04-03 1980-10-23 Optimetrix Corp Improved stepprepetion projectionnmatching exposer
JPS57142612A (en) * 1981-02-27 1982-09-03 Nippon Kogaku Kk <Nikon> Alignment optical system of projection type exposure device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6313329A (en) * 1986-07-04 1988-01-20 Canon Inc Exposure device

Also Published As

Publication number Publication date
JPS6352769B2 (en) 1988-10-20

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