JPS6362090B2 - - Google Patents

Info

Publication number
JPS6362090B2
JPS6362090B2 JP57200066A JP20006682A JPS6362090B2 JP S6362090 B2 JPS6362090 B2 JP S6362090B2 JP 57200066 A JP57200066 A JP 57200066A JP 20006682 A JP20006682 A JP 20006682A JP S6362090 B2 JPS6362090 B2 JP S6362090B2
Authority
JP
Japan
Prior art keywords
mask
alignment
wafer
mark
objective lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57200066A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5989421A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP57200066A priority Critical patent/JPS5989421A/ja
Priority to US06/550,097 priority patent/US4655599A/en
Publication of JPS5989421A publication Critical patent/JPS5989421A/ja
Publication of JPS6362090B2 publication Critical patent/JPS6362090B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Control Of Position Or Direction (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP57200066A 1982-11-15 1982-11-15 位置検出装置 Granted JPS5989421A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP57200066A JPS5989421A (ja) 1982-11-15 1982-11-15 位置検出装置
US06/550,097 US4655599A (en) 1982-11-15 1983-11-09 Mask aligner having a photo-mask setting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57200066A JPS5989421A (ja) 1982-11-15 1982-11-15 位置検出装置

Publications (2)

Publication Number Publication Date
JPS5989421A JPS5989421A (ja) 1984-05-23
JPS6362090B2 true JPS6362090B2 (enrdf_load_stackoverflow) 1988-12-01

Family

ID=16418269

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57200066A Granted JPS5989421A (ja) 1982-11-15 1982-11-15 位置検出装置

Country Status (1)

Country Link
JP (1) JPS5989421A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61116836A (ja) * 1984-11-13 1986-06-04 Hitachi Ltd 縮小投影露光方式におけるアライメント方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS602772B2 (ja) * 1976-11-01 1985-01-23 株式会社日立製作所 露光装置
JPS53144270A (en) * 1977-05-23 1978-12-15 Hitachi Ltd Projection-type mask aligner
JPS57183031A (en) * 1981-05-06 1982-11-11 Toshiba Corp Method for wafer exposure and device thereof

Also Published As

Publication number Publication date
JPS5989421A (ja) 1984-05-23

Similar Documents

Publication Publication Date Title
US4062623A (en) Device for observing an object
JPH0580497A (ja) 面状態検査装置
JPH04232951A (ja) 面状態検査装置
US4669867A (en) Alignment and exposure apparatus
JPH0785466B2 (ja) 位置合せ装置
JPS6341023A (ja) ウエハをレチクルヘアラインする方法および装置
JPH07130635A (ja) 基板の高さ位置検出装置
JPS61174717A (ja) 位置合わせ装置
US4655599A (en) Mask aligner having a photo-mask setting device
WO1994024611A1 (en) On axis mask and wafer alignment system
JP3048168B2 (ja) 表面状態検査装置及びこれを備える露光装置
US4801808A (en) Alignment and exposure apparatus having an objective lens system capable of observing a mark on an exposure optical holding member to permit alignment of a mask relative to the exposure optical system
GB2133565A (en) An observation device and an aligner using same
JPS6352767B2 (enrdf_load_stackoverflow)
JPS6362090B2 (enrdf_load_stackoverflow)
JPS6352769B2 (enrdf_load_stackoverflow)
JPH08288205A (ja) 照明光学系および該照明光学系を備えた投影露光装置
JPS5989418A (ja) パタ−ン検知方法
JP3448663B2 (ja) 投影露光装置
JPH0344242B2 (enrdf_load_stackoverflow)
JP3211246B2 (ja) 投影露光装置及び素子製造方法
JPS5989419A (ja) 位置合わせ装置
JPS5989420A (ja) 位置合わせ装置
JP2771138B2 (ja) 投影露光装置
JPS6135520A (ja) 位置合せ装置の対物レンズ系基準位置決定方法