JPS5987182A - サ−マルヘツドの製造方法 - Google Patents
サ−マルヘツドの製造方法Info
- Publication number
- JPS5987182A JPS5987182A JP57198425A JP19842582A JPS5987182A JP S5987182 A JPS5987182 A JP S5987182A JP 57198425 A JP57198425 A JP 57198425A JP 19842582 A JP19842582 A JP 19842582A JP S5987182 A JPS5987182 A JP S5987182A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- resistor
- mask
- thermal head
- resistor pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electronic Switches (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57198425A JPS5987182A (ja) | 1982-11-11 | 1982-11-11 | サ−マルヘツドの製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57198425A JPS5987182A (ja) | 1982-11-11 | 1982-11-11 | サ−マルヘツドの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5987182A true JPS5987182A (ja) | 1984-05-19 |
| JPS6363383B2 JPS6363383B2 (enExample) | 1988-12-07 |
Family
ID=16390879
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57198425A Granted JPS5987182A (ja) | 1982-11-11 | 1982-11-11 | サ−マルヘツドの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5987182A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63312859A (ja) * | 1987-06-17 | 1988-12-21 | Rohm Co Ltd | サ−マルプリントヘッドの製造方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4942707A (enExample) * | 1972-08-31 | 1974-04-22 |
-
1982
- 1982-11-11 JP JP57198425A patent/JPS5987182A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4942707A (enExample) * | 1972-08-31 | 1974-04-22 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63312859A (ja) * | 1987-06-17 | 1988-12-21 | Rohm Co Ltd | サ−マルプリントヘッドの製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6363383B2 (enExample) | 1988-12-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS5987182A (ja) | サ−マルヘツドの製造方法 | |
| KR20020096877A (ko) | 박막저항소자 및 그의 제조방법 | |
| KR100668185B1 (ko) | 박막 칩 저항기 제조방법 | |
| JPH01241461A (ja) | サーマルヘッドのフォトリソ用マスク装置 | |
| JPS57138638A (en) | Photoetching mask | |
| JP4178603B2 (ja) | サーマルヘッドおよびその製造方法 | |
| JP4748864B2 (ja) | サーマルヘッド | |
| JPS61113285A (ja) | 光起電力素子の製造方法 | |
| JPH0347289Y2 (enExample) | ||
| JPH09190905A (ja) | 厚膜サーミスタ | |
| JPS5317075A (en) | Production of silicon mask for x-ray exposure | |
| JPS60189466A (ja) | サ−マルヘツドの製造方法 | |
| JPH01214455A (ja) | サーマルプリントヘッド | |
| JP2520374Y2 (ja) | マスクのアライメントマーク | |
| JPS5869078A (ja) | サ−マルヘツドの製造方法 | |
| JPH06120013A (ja) | 電子部品の製造方法 | |
| JPS5699681A (en) | Preparation of thin film type thermal head | |
| JPH023534B2 (enExample) | ||
| JPS57198648A (en) | Manufacture of semiconductor device | |
| JPS5941873B2 (ja) | サ−マルヘツドの製造方法 | |
| JPH03162969A (ja) | 薄膜サーマルヘッドおよびその製造方法 | |
| JPS63116846A (ja) | パタ−ン形成方法 | |
| JPH0414631B2 (enExample) | ||
| JPS61194760A (ja) | 厚膜抵抗体の製造方法 | |
| JPH0520515B2 (enExample) |