JPH023534B2 - - Google Patents
Info
- Publication number
- JPH023534B2 JPH023534B2 JP59018056A JP1805684A JPH023534B2 JP H023534 B2 JPH023534 B2 JP H023534B2 JP 59018056 A JP59018056 A JP 59018056A JP 1805684 A JP1805684 A JP 1805684A JP H023534 B2 JPH023534 B2 JP H023534B2
- Authority
- JP
- Japan
- Prior art keywords
- glaze layer
- mask
- layer
- width
- print head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Electronic Switches (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59018056A JPS60160122A (ja) | 1984-01-30 | 1984-01-30 | サーマルプリントヘッドの製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59018056A JPS60160122A (ja) | 1984-01-30 | 1984-01-30 | サーマルプリントヘッドの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60160122A JPS60160122A (ja) | 1985-08-21 |
| JPH023534B2 true JPH023534B2 (enExample) | 1990-01-24 |
Family
ID=11961036
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59018056A Granted JPS60160122A (ja) | 1984-01-30 | 1984-01-30 | サーマルプリントヘッドの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60160122A (enExample) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52144973A (en) * | 1976-05-28 | 1977-12-02 | Hitachi Ltd | Positioning method of semiconductor wafers |
| JPS59208722A (ja) * | 1983-05-13 | 1984-11-27 | Oki Electric Ind Co Ltd | 半導体集積回路装置用合せマ−ク |
| JPS6077421A (ja) * | 1983-10-05 | 1985-05-02 | Fujitsu Ltd | 位置合わせ方法 |
-
1984
- 1984-01-30 JP JP59018056A patent/JPS60160122A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60160122A (ja) | 1985-08-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |