JPS5983032U - Vertical epitaxial equipment - Google Patents

Vertical epitaxial equipment

Info

Publication number
JPS5983032U
JPS5983032U JP17939382U JP17939382U JPS5983032U JP S5983032 U JPS5983032 U JP S5983032U JP 17939382 U JP17939382 U JP 17939382U JP 17939382 U JP17939382 U JP 17939382U JP S5983032 U JPS5983032 U JP S5983032U
Authority
JP
Japan
Prior art keywords
base
quartz
vertical
bell jar
vertical epitaxial
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17939382U
Other languages
Japanese (ja)
Inventor
宮崎 美彦
吉三 小宮山
後藤 泰山
岩田 公弟
Original Assignee
東芝機械株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 東芝機械株式会社 filed Critical 東芝機械株式会社
Priority to JP17939382U priority Critical patent/JPS5983032U/en
Priority to DE19833342586 priority patent/DE3342586C2/en
Publication of JPS5983032U publication Critical patent/JPS5983032U/en
Priority to KR2019860008872U priority patent/KR860001742Y1/en
Pending legal-status Critical Current

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  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図および第2図は従来の縦型エピタキシャル装置の
それぞれ異なる例を示す概要断面図、第3図は本考案に
よる縦型エピタキシャル装置の一実施例を示す概要断面
図、第4図は本考案の他の実施例を示す概要断面図であ
る。 1・・・・・・基台、2・・・・・・シール部材、3.
14゜16・・、・・・・石英ベルジャ、4・・・・・
・気密室、5・・・・・・サ  ゛セプタ、6・・・・
・・基板、7・・・・・・ノズル、8・・・・・・RF
コイル、9・・・・・・排気管、10・・・・・・クリ
ンベンチ側板、11.18・・・・・・金属ベルジャ、
12・・・・・・冷却管、13・・・・・・支持片、1
5・・・・・・供給口、17・・・・・・クランプ片、
19・・・・・・弾性体、20・・・・・・係合子、2
1・・・・・・突起、22・・・・・・貫通孔、23・
・・・・・冷却ジャケット、24・・・・・・ベルジャ
昇降機構、25・・・・・・リング。
1 and 2 are schematic cross-sectional views showing different examples of conventional vertical epitaxial devices, FIG. 3 is a schematic cross-sectional view showing one embodiment of the vertical epitaxial device according to the present invention, and FIG. 4 is a schematic cross-sectional view showing different examples of conventional vertical epitaxial devices. FIG. 3 is a schematic cross-sectional view showing another embodiment of the invention. 1...Base, 2...Seal member, 3.
14゜16... Quartz bell jar, 4...
・Airtight room, 5...Scepter, 6...
...Substrate, 7...Nozzle, 8...RF
Coil, 9...Exhaust pipe, 10...Clean bench side plate, 11.18...Metal bell jar,
12... Cooling pipe, 13... Support piece, 1
5... Supply port, 17... Clamp piece,
19...Elastic body, 20...Engager, 2
1...Protrusion, 22...Through hole, 23.
... Cooling jacket, 24 ... Bell jar lifting mechanism, 25 ... Ring.

Claims (1)

【実用新案登録請求の範囲】 ■ 水平に設けたサセプタの周囲に気密室を形成し、該
サセプタの上に載置した基板上に半導体物質のエピタキ
シャル薄膜を気相成長させる縦型エピタキシキル装置に
おいて、気密室を基台と石英ベルジャとによって構成す
る・と共に、前記石英ベルジャの外側に保合子により離
脱可能に金属ベルジャを被せることを特徴とする縦型エ
ピタキシャル装置。 2 基台と対向する石英ベルジャの下端にフランジ部を
形成し、このフランジ部が弾性体を介して金属ベルジャ
により基台に向けてシールのため押圧されるように構成
されていることを特徴とする実用新案登録請求の範囲第
1項記載の縦型エピタキシャル装置。 3 基台の気密室を形成する部分が、石英ベルジャをシ
ールする面より低くなるように構成されていることを特
徴とする実用新案登録請求の範囲第1または2項記載の
縦型エピタキシャル装置。
[Claims for Utility Model Registration] ■ In a vertical epitaxy machine that forms an airtight chamber around a horizontally provided susceptor and grows an epitaxial thin film of a semiconductor material in a vapor phase on a substrate placed on the susceptor. A vertical epitaxial device, characterized in that an airtight chamber is constituted by a base and a quartz belljar, and a metal belljar is removably covered on the outside of the quartz belljar with a retainer. 2. A flange portion is formed at the lower end of the quartz bell jar facing the base, and the flange portion is configured to be pressed toward the base by the metal bell jar via an elastic body for sealing. A vertical epitaxial device according to claim 1 of the utility model registration claim. 3. The vertical epitaxial device according to claim 1 or 2, wherein the portion of the base that forms the airtight chamber is configured to be lower than the surface that seals the quartz bell jar.
JP17939382U 1982-11-27 1982-11-27 Vertical epitaxial equipment Pending JPS5983032U (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP17939382U JPS5983032U (en) 1982-11-27 1982-11-27 Vertical epitaxial equipment
DE19833342586 DE3342586C2 (en) 1982-11-27 1983-11-25 Apparatus for gas phase epitaxy
KR2019860008872U KR860001742Y1 (en) 1982-11-27 1986-06-24 Ephitactial apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17939382U JPS5983032U (en) 1982-11-27 1982-11-27 Vertical epitaxial equipment

Publications (1)

Publication Number Publication Date
JPS5983032U true JPS5983032U (en) 1984-06-05

Family

ID=30389242

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17939382U Pending JPS5983032U (en) 1982-11-27 1982-11-27 Vertical epitaxial equipment

Country Status (1)

Country Link
JP (1) JPS5983032U (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50537A (en) * 1973-05-03 1975-01-07

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50537A (en) * 1973-05-03 1975-01-07

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