JPS5954225A - 投影露光方法 - Google Patents

投影露光方法

Info

Publication number
JPS5954225A
JPS5954225A JP57165280A JP16528082A JPS5954225A JP S5954225 A JPS5954225 A JP S5954225A JP 57165280 A JP57165280 A JP 57165280A JP 16528082 A JP16528082 A JP 16528082A JP S5954225 A JPS5954225 A JP S5954225A
Authority
JP
Japan
Prior art keywords
pattern
stage
original
projection exposure
chips
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57165280A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0474854B2 (enrdf_load_stackoverflow
Inventor
Hideji Sugiyama
秀司 杉山
Hisamasa Tsuyuki
露木　寿正
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57165280A priority Critical patent/JPS5954225A/ja
Publication of JPS5954225A publication Critical patent/JPS5954225A/ja
Publication of JPH0474854B2 publication Critical patent/JPH0474854B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP57165280A 1982-09-21 1982-09-21 投影露光方法 Granted JPS5954225A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57165280A JPS5954225A (ja) 1982-09-21 1982-09-21 投影露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57165280A JPS5954225A (ja) 1982-09-21 1982-09-21 投影露光方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP4249109A Division JPH0766905B2 (ja) 1992-09-18 1992-09-18 投影露光方法

Publications (2)

Publication Number Publication Date
JPS5954225A true JPS5954225A (ja) 1984-03-29
JPH0474854B2 JPH0474854B2 (enrdf_load_stackoverflow) 1992-11-27

Family

ID=15809326

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57165280A Granted JPS5954225A (ja) 1982-09-21 1982-09-21 投影露光方法

Country Status (1)

Country Link
JP (1) JPS5954225A (enrdf_load_stackoverflow)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6144429A (ja) * 1984-08-09 1986-03-04 Nippon Kogaku Kk <Nikon> 位置合わせ方法、及び位置合せ装置
JPS61177724A (ja) * 1985-02-01 1986-08-09 Hitachi Ltd 投影露光方法
JPS6284516A (ja) * 1985-10-08 1987-04-18 Nippon Kogaku Kk <Nikon> 位置合わせ方法
JPS62183517A (ja) * 1986-02-07 1987-08-11 Canon Inc 露光方法
JPS62217686A (ja) * 1986-03-19 1987-09-25 Toshiba Mach Co Ltd レ−ザミラ−の位置変位補正方法
JPS62291133A (ja) * 1986-06-11 1987-12-17 Nikon Corp 位置合わせ方法
JPS63250120A (ja) * 1987-04-07 1988-10-18 Mitsubishi Electric Corp アライメント補正装置
JPH0620921A (ja) * 1992-09-18 1994-01-28 Hitachi Ltd 投影露光方法
JPH06151277A (ja) * 1992-10-30 1994-05-31 Canon Inc 露光装置
JPH07254558A (ja) * 1994-12-19 1995-10-03 Nikon Corp 位置合わせ方法
JPH09190972A (ja) * 1996-12-09 1997-07-22 Nikon Corp 回路パターンの形成方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5717132A (en) * 1980-07-07 1982-01-28 Fujitsu Ltd Formation of microscopic pattern using lithography and device thereof
JPS5780724A (en) * 1980-11-07 1982-05-20 Nippon Kogaku Kk <Nikon> Positioning device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5717132A (en) * 1980-07-07 1982-01-28 Fujitsu Ltd Formation of microscopic pattern using lithography and device thereof
JPS5780724A (en) * 1980-11-07 1982-05-20 Nippon Kogaku Kk <Nikon> Positioning device

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6144429A (ja) * 1984-08-09 1986-03-04 Nippon Kogaku Kk <Nikon> 位置合わせ方法、及び位置合せ装置
JPS61177724A (ja) * 1985-02-01 1986-08-09 Hitachi Ltd 投影露光方法
JPS6284516A (ja) * 1985-10-08 1987-04-18 Nippon Kogaku Kk <Nikon> 位置合わせ方法
JPS62183517A (ja) * 1986-02-07 1987-08-11 Canon Inc 露光方法
JPS62217686A (ja) * 1986-03-19 1987-09-25 Toshiba Mach Co Ltd レ−ザミラ−の位置変位補正方法
JPS62291133A (ja) * 1986-06-11 1987-12-17 Nikon Corp 位置合わせ方法
JPS63250120A (ja) * 1987-04-07 1988-10-18 Mitsubishi Electric Corp アライメント補正装置
JPH0620921A (ja) * 1992-09-18 1994-01-28 Hitachi Ltd 投影露光方法
JPH06151277A (ja) * 1992-10-30 1994-05-31 Canon Inc 露光装置
JPH07254558A (ja) * 1994-12-19 1995-10-03 Nikon Corp 位置合わせ方法
JPH09190972A (ja) * 1996-12-09 1997-07-22 Nikon Corp 回路パターンの形成方法

Also Published As

Publication number Publication date
JPH0474854B2 (enrdf_load_stackoverflow) 1992-11-27

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