JPS594045A - 真空吸着固定手段 - Google Patents
真空吸着固定手段Info
- Publication number
- JPS594045A JPS594045A JP11314182A JP11314182A JPS594045A JP S594045 A JPS594045 A JP S594045A JP 11314182 A JP11314182 A JP 11314182A JP 11314182 A JP11314182 A JP 11314182A JP S594045 A JPS594045 A JP S594045A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- chuck table
- circumferential part
- chuck
- air
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Jigs For Machine Tools (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11314182A JPS594045A (ja) | 1982-06-30 | 1982-06-30 | 真空吸着固定手段 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11314182A JPS594045A (ja) | 1982-06-30 | 1982-06-30 | 真空吸着固定手段 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS594045A true JPS594045A (ja) | 1984-01-10 |
| JPS634938B2 JPS634938B2 (enExample) | 1988-02-01 |
Family
ID=14604600
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11314182A Granted JPS594045A (ja) | 1982-06-30 | 1982-06-30 | 真空吸着固定手段 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS594045A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107414552A (zh) * | 2017-08-22 | 2017-12-01 | 大连理工大学 | 一种用于铣削加工碳纤维复合材料的可调式吸附夹具 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5961064B2 (ja) * | 2012-07-31 | 2016-08-02 | 三星ダイヤモンド工業株式会社 | 吸着テーブルの製造方法並びに吸着テーブル |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5390781A (en) * | 1977-01-20 | 1978-08-09 | Toshiba Corp | Semiconductor radiation detector |
| JPS5390871A (en) * | 1977-01-21 | 1978-08-10 | Toyo Dengu Seisakushiyo Kk | Device for chucking semiconductor wafer |
| JPS56172941U (enExample) * | 1980-05-23 | 1981-12-21 |
-
1982
- 1982-06-30 JP JP11314182A patent/JPS594045A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5390781A (en) * | 1977-01-20 | 1978-08-09 | Toshiba Corp | Semiconductor radiation detector |
| JPS5390871A (en) * | 1977-01-21 | 1978-08-10 | Toyo Dengu Seisakushiyo Kk | Device for chucking semiconductor wafer |
| JPS56172941U (enExample) * | 1980-05-23 | 1981-12-21 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107414552A (zh) * | 2017-08-22 | 2017-12-01 | 大连理工大学 | 一种用于铣削加工碳纤维复合材料的可调式吸附夹具 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS634938B2 (enExample) | 1988-02-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TW202027162A (zh) | 電漿處理裝置 | |
| JPH08330401A (ja) | ウエハチャック | |
| TWI861466B (zh) | 在靜電吸盤上形成臺面 | |
| JP4815801B2 (ja) | シリコンウエーハの研磨方法および製造方法および円板状ワークの研磨装置ならびにシリコンウエーハ | |
| CN1258092A (zh) | 样品加工系统 | |
| JP2001176957A (ja) | 吸着プレート及び真空吸引装置 | |
| JPS594045A (ja) | 真空吸着固定手段 | |
| JP3131860B2 (ja) | 成膜処理装置 | |
| JPH08340036A (ja) | 処理装置 | |
| KR101123968B1 (ko) | 정전척 재생 방법 | |
| JPH03184756A (ja) | ウエーハの研削加工方法 | |
| JP4564351B2 (ja) | 半導体ウェーハの分割方法、研削装置および半導体ウェーハ分割システム | |
| JPH02239621A (ja) | 真空チャツク装置 | |
| JPH04367227A (ja) | ウェハの裏面研削処理方法及びこの方法に用いるウェハチャック | |
| JPH03173129A (ja) | 研磨装置 | |
| JP2001205548A (ja) | 片面研削装置および片面研削方法 | |
| JP2025121061A (ja) | 処理装置、及び、処理方法 | |
| JPH11156710A (ja) | ウェーハの接着方法及び接着装置 | |
| JP2025003057A (ja) | 加工方法 | |
| JP2000243739A (ja) | ウエーハの化学研磨処理方法及び装置 | |
| JP4781833B2 (ja) | エッチング装置 | |
| JPH10309657A (ja) | ウェーハの研削装置および該装置を用いたウェ−ハ研削方法 | |
| KR20030008411A (ko) | 반도체 제조장치의 지지척에 결합되는 인슐레이터 구조 | |
| JP2002370131A (ja) | 真空チャック | |
| TWI293798B (en) | Wafer carrying apparatus |