JPS5935403A - Ｎｉ−Ｃｒ薄膜抵抗体の形成方法 - Google Patents

Ｎｉ−Ｃｒ薄膜抵抗体の形成方法

Info

Publication number
JPS5935403A
JPS5935403A JP57146544A JP14654482A JPS5935403A JP S5935403 A JPS5935403 A JP S5935403A JP 57146544 A JP57146544 A JP 57146544A JP 14654482 A JP14654482 A JP 14654482A JP S5935403 A JPS5935403 A JP S5935403A
Authority
JP
Japan
Prior art keywords
thin film
film resistor
alloy
forming
resistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57146544A
Other languages
English (en)
Japanese (ja)
Other versions
JPS639731B2 (enExample
Inventor
吉川　義隆
北崎　博
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP57146544A priority Critical patent/JPS5935403A/ja
Publication of JPS5935403A publication Critical patent/JPS5935403A/ja
Publication of JPS639731B2 publication Critical patent/JPS639731B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Non-Adjustable Resistors (AREA)
JP57146544A 1982-08-23 1982-08-23 Ｎｉ−Ｃｒ薄膜抵抗体の形成方法 Granted JPS5935403A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57146544A JPS5935403A (ja) 1982-08-23 1982-08-23 Ｎｉ−Ｃｒ薄膜抵抗体の形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57146544A JPS5935403A (ja) 1982-08-23 1982-08-23 Ｎｉ−Ｃｒ薄膜抵抗体の形成方法

Publications (2)

Publication Number Publication Date
JPS5935403A true JPS5935403A (ja) 1984-02-27
JPS639731B2 JPS639731B2 (enExample) 1988-03-01

Family

ID=15410050

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57146544A Granted JPS5935403A (ja) 1982-08-23 1982-08-23 Ｎｉ−Ｃｒ薄膜抵抗体の形成方法

Country Status (1)

Country Link
JP (1) JPS5935403A (enExample)

Also Published As

Publication number Publication date
JPS639731B2 (enExample) 1988-03-01

Similar Documents

Publication Publication Date Title
JPS6323305A (ja) 高安定性積層フィルム抵抗器およびその製造方法
JPS61179501A (ja) 抵抗体の製造方法
JPH06158272A (ja) 抵抗膜および抵抗膜の製造方法
JPS5935403A (ja) Ｎｉ−Ｃｒ薄膜抵抗体の形成方法
JPS634321B2 (enExample)
JPH0252403A (ja) 電子部品
JPH04370901A (ja) 電気抵抗材料
JPH044722B2 (enExample)
JPS62293701A (ja) 薄膜温度センサとその製造方法
JPH071722B2 (ja) 薄膜抵抗体
JPH0620803A (ja) 薄膜抵抗器及び薄膜抵抗器の製造方法
JPS6167901A (ja) 抵抗組成物及びそれよりなる厚膜抵抗体
JPH0461201A (ja) 薄膜抵抗体
JPS60115462A (ja) 薄膜サ−マルヘッド
DD223002A1 (de) Verfahren zur herstellung von duennschichtwiderstaenden hoher praezision
JPS60116104A (ja) 金属薄膜抵抗体
JPS625602A (ja) 薄膜抵抗体
JPS62202753A (ja) 薄膜型サ−マルヘツド
JP3031024B2 (ja) チップ型セラミック電子部品の製造方法
JP3288241B2 (ja) 抵抗材料および抵抗材料薄膜
JP4752075B2 (ja) 抵抗器、その製造方法
JPH0287501A (ja) 電気抵抗材料
JPS63135260A (ja) サ−マルヘツド
JPS62224002A (ja) 薄膜チツプ抵抗体の製法
JPS63229802A (ja) 非晶質２元合金薄膜抵抗体の製造方法