JPS592008A - 埋め込み型石英光導波路の製造方法 - Google Patents
埋め込み型石英光導波路の製造方法Info
- Publication number
- JPS592008A JPS592008A JP57109795A JP10979582A JPS592008A JP S592008 A JPS592008 A JP S592008A JP 57109795 A JP57109795 A JP 57109795A JP 10979582 A JP10979582 A JP 10979582A JP S592008 A JPS592008 A JP S592008A
- Authority
- JP
- Japan
- Prior art keywords
- quartz
- substrate
- sputtering
- layer
- waveguide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 77
- 239000010453 quartz Substances 0.000 title claims abstract description 68
- 238000004519 manufacturing process Methods 0.000 title claims description 16
- 230000003287 optical effect Effects 0.000 title claims description 16
- 239000000758 substrate Substances 0.000 claims abstract description 41
- 238000004544 sputter deposition Methods 0.000 claims abstract description 30
- 238000000151 deposition Methods 0.000 claims abstract description 11
- 238000000034 method Methods 0.000 claims description 22
- 238000005530 etching Methods 0.000 claims description 6
- 230000008569 process Effects 0.000 claims description 5
- 239000002019 doping agent Substances 0.000 claims description 4
- 239000013077 target material Substances 0.000 claims description 4
- 239000011521 glass Substances 0.000 abstract description 17
- 229920002120 photoresistant polymer Polymers 0.000 abstract description 6
- 239000000463 material Substances 0.000 abstract description 3
- 230000005540 biological transmission Effects 0.000 abstract description 2
- 238000001552 radio frequency sputter deposition Methods 0.000 abstract description 2
- 238000005253 cladding Methods 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 5
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000013307 optical fiber Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000010437 gem Substances 0.000 description 1
- 238000005305 interferometry Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/132—Integrated optical circuits characterised by the manufacturing method by deposition of thin films
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Physical Vapour Deposition (AREA)
- Optical Integrated Circuits (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57109795A JPS592008A (ja) | 1982-06-28 | 1982-06-28 | 埋め込み型石英光導波路の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57109795A JPS592008A (ja) | 1982-06-28 | 1982-06-28 | 埋め込み型石英光導波路の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS592008A true JPS592008A (ja) | 1984-01-07 |
| JPH0145881B2 JPH0145881B2 (enrdf_load_stackoverflow) | 1989-10-05 |
Family
ID=14519409
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57109795A Granted JPS592008A (ja) | 1982-06-28 | 1982-06-28 | 埋め込み型石英光導波路の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS592008A (enrdf_load_stackoverflow) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2565701A1 (fr) * | 1984-06-11 | 1985-12-13 | Gen Electric Co Plc | Procede de fabrication de guides d'ondes optiques integres et guide d'onde optique produit par sa mise en oeuvre |
| JPS62121407A (ja) * | 1985-11-21 | 1987-06-02 | Hitachi Ltd | 光フイルタおよびそれを用いた波長多重伝送デバイス |
| EP0205284A3 (en) * | 1985-06-12 | 1988-03-09 | THE GENERAL ELECTRIC COMPANY, p.l.c. | Optical waveguides |
| FR2769376A1 (fr) * | 1997-10-02 | 1999-04-09 | Samsung Electronics Co Ltd | Procede de fabrication d'un dispositif a guide d'ondes optique utilisant un systeme a plasma couple de maniere inductive |
-
1982
- 1982-06-28 JP JP57109795A patent/JPS592008A/ja active Granted
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2565701A1 (fr) * | 1984-06-11 | 1985-12-13 | Gen Electric Co Plc | Procede de fabrication de guides d'ondes optiques integres et guide d'onde optique produit par sa mise en oeuvre |
| EP0205284A3 (en) * | 1985-06-12 | 1988-03-09 | THE GENERAL ELECTRIC COMPANY, p.l.c. | Optical waveguides |
| JPS62121407A (ja) * | 1985-11-21 | 1987-06-02 | Hitachi Ltd | 光フイルタおよびそれを用いた波長多重伝送デバイス |
| FR2769376A1 (fr) * | 1997-10-02 | 1999-04-09 | Samsung Electronics Co Ltd | Procede de fabrication d'un dispositif a guide d'ondes optique utilisant un systeme a plasma couple de maniere inductive |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0145881B2 (enrdf_load_stackoverflow) | 1989-10-05 |
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