JPS59197141A - 減圧反応装置に於ける排気処理方法 - Google Patents

減圧反応装置に於ける排気処理方法

Info

Publication number
JPS59197141A
JPS59197141A JP59047651A JP4765184A JPS59197141A JP S59197141 A JPS59197141 A JP S59197141A JP 59047651 A JP59047651 A JP 59047651A JP 4765184 A JP4765184 A JP 4765184A JP S59197141 A JPS59197141 A JP S59197141A
Authority
JP
Japan
Prior art keywords
gas
pump
reaction
discharged
exhaust gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59047651A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6322173B2 (enExample
Inventor
Akira Kojima
明 小島
Hisayoshi Yamoto
久良 矢元
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP59047651A priority Critical patent/JPS59197141A/ja
Publication of JPS59197141A publication Critical patent/JPS59197141A/ja
Publication of JPS6322173B2 publication Critical patent/JPS6322173B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
JP59047651A 1984-03-13 1984-03-13 減圧反応装置に於ける排気処理方法 Granted JPS59197141A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59047651A JPS59197141A (ja) 1984-03-13 1984-03-13 減圧反応装置に於ける排気処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59047651A JPS59197141A (ja) 1984-03-13 1984-03-13 減圧反応装置に於ける排気処理方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP10732878A Division JPS5534158A (en) 1978-09-01 1978-09-01 Vacuum reaction apparatus

Publications (2)

Publication Number Publication Date
JPS59197141A true JPS59197141A (ja) 1984-11-08
JPS6322173B2 JPS6322173B2 (enExample) 1988-05-11

Family

ID=12781155

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59047651A Granted JPS59197141A (ja) 1984-03-13 1984-03-13 減圧反応装置に於ける排気処理方法

Country Status (1)

Country Link
JP (1) JPS59197141A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0221616A (ja) * 1988-07-11 1990-01-24 Fuji Photo Film Co Ltd 半導体デバイスの熱処理装置
FR2727692A1 (fr) * 1994-12-05 1996-06-07 Europ Propulsion Dispositif d'extraction de gaz pour four d'infiltration ou depot chimique en phase vapeur dans une installation de fabrication de pieces en materiau composite

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04138376U (ja) * 1991-06-19 1992-12-25 憲治 平 傘置き用ブロツク

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5534158A (en) * 1978-09-01 1980-03-10 Sony Corp Vacuum reaction apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5534158A (en) * 1978-09-01 1980-03-10 Sony Corp Vacuum reaction apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0221616A (ja) * 1988-07-11 1990-01-24 Fuji Photo Film Co Ltd 半導体デバイスの熱処理装置
FR2727692A1 (fr) * 1994-12-05 1996-06-07 Europ Propulsion Dispositif d'extraction de gaz pour four d'infiltration ou depot chimique en phase vapeur dans une installation de fabrication de pieces en materiau composite
WO1996017972A1 (fr) * 1994-12-05 1996-06-13 Societe Europeenne De Propulsion Dispositif d'extraction de gaz

Also Published As

Publication number Publication date
JPS6322173B2 (enExample) 1988-05-11

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