JPS5918193A - 液相エピタキシヤル成長用装置及びそれを使用した液相エピタキシヤル成長法 - Google Patents
液相エピタキシヤル成長用装置及びそれを使用した液相エピタキシヤル成長法Info
- Publication number
- JPS5918193A JPS5918193A JP12471382A JP12471382A JPS5918193A JP S5918193 A JPS5918193 A JP S5918193A JP 12471382 A JP12471382 A JP 12471382A JP 12471382 A JP12471382 A JP 12471382A JP S5918193 A JPS5918193 A JP S5918193A
- Authority
- JP
- Japan
- Prior art keywords
- melt
- sliding plate
- substrate
- layer
- melt holding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007791 liquid phase Substances 0.000 title claims abstract description 53
- 230000012010 growth Effects 0.000 title claims abstract description 48
- 239000000155 melt Substances 0.000 claims abstract description 55
- 239000000758 substrate Substances 0.000 claims description 64
- 238000000034 method Methods 0.000 claims description 18
- 230000000149 penetrating effect Effects 0.000 claims description 5
- 239000007788 liquid Substances 0.000 claims description 4
- 230000008018 melting Effects 0.000 abstract 1
- 238000002844 melting Methods 0.000 abstract 1
- 239000002994 raw material Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 62
- 235000012431 wafers Nutrition 0.000 description 13
- 239000004065 semiconductor Substances 0.000 description 8
- 238000004943 liquid phase epitaxy Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 2
- 238000005282 brightening Methods 0.000 description 2
- 230000010261 cell growth Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B19/00—Liquid-phase epitaxial-layer growth
- C30B19/06—Reaction chambers; Boats for supporting the melt; Substrate holders
- C30B19/063—Sliding boat system
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12471382A JPS5918193A (ja) | 1982-07-17 | 1982-07-17 | 液相エピタキシヤル成長用装置及びそれを使用した液相エピタキシヤル成長法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12471382A JPS5918193A (ja) | 1982-07-17 | 1982-07-17 | 液相エピタキシヤル成長用装置及びそれを使用した液相エピタキシヤル成長法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5918193A true JPS5918193A (ja) | 1984-01-30 |
JPH0224798B2 JPH0224798B2 (enrdf_load_stackoverflow) | 1990-05-30 |
Family
ID=14892260
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12471382A Granted JPS5918193A (ja) | 1982-07-17 | 1982-07-17 | 液相エピタキシヤル成長用装置及びそれを使用した液相エピタキシヤル成長法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5918193A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5482555A (en) * | 1991-05-16 | 1996-01-09 | Samsung Electronics Co., Ltd. | Liquid-phase epitaxy growth system and method for growing epitaxial layer |
-
1982
- 1982-07-17 JP JP12471382A patent/JPS5918193A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5482555A (en) * | 1991-05-16 | 1996-01-09 | Samsung Electronics Co., Ltd. | Liquid-phase epitaxy growth system and method for growing epitaxial layer |
Also Published As
Publication number | Publication date |
---|---|
JPH0224798B2 (enrdf_load_stackoverflow) | 1990-05-30 |
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