JPS59172722A - アライメントマ−クの製造方法 - Google Patents

アライメントマ−クの製造方法

Info

Publication number
JPS59172722A
JPS59172722A JP58047025A JP4702583A JPS59172722A JP S59172722 A JPS59172722 A JP S59172722A JP 58047025 A JP58047025 A JP 58047025A JP 4702583 A JP4702583 A JP 4702583A JP S59172722 A JPS59172722 A JP S59172722A
Authority
JP
Japan
Prior art keywords
alignment mark
film
alignment
oxide film
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58047025A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6347330B2 (cg-RX-API-DMAC10.html
Inventor
Hiroshi Otsuka
博 大塚
Yoshio Ito
由夫 伊東
Hiroyuki Funatsu
舟津　博幸
Norio Moriyama
森山　徳生
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP58047025A priority Critical patent/JPS59172722A/ja
Publication of JPS59172722A publication Critical patent/JPS59172722A/ja
Publication of JPS6347330B2 publication Critical patent/JPS6347330B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58047025A 1983-03-23 1983-03-23 アライメントマ−クの製造方法 Granted JPS59172722A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58047025A JPS59172722A (ja) 1983-03-23 1983-03-23 アライメントマ−クの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58047025A JPS59172722A (ja) 1983-03-23 1983-03-23 アライメントマ−クの製造方法

Publications (2)

Publication Number Publication Date
JPS59172722A true JPS59172722A (ja) 1984-09-29
JPS6347330B2 JPS6347330B2 (cg-RX-API-DMAC10.html) 1988-09-21

Family

ID=12763632

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58047025A Granted JPS59172722A (ja) 1983-03-23 1983-03-23 アライメントマ−クの製造方法

Country Status (1)

Country Link
JP (1) JPS59172722A (cg-RX-API-DMAC10.html)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61154127A (ja) * 1984-12-27 1986-07-12 Oki Electric Ind Co Ltd ウエハ−アライメント・マ−ク
JPH02134808A (ja) * 1988-11-16 1990-05-23 Fujitsu Ltd 半導体装置の製造方法
JPH0377309A (ja) * 1989-08-19 1991-04-02 Fujitsu Ltd 半導体装置の製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5180777A (cg-RX-API-DMAC10.html) * 1975-01-13 1976-07-14 Hitachi Ltd
JPS5662324A (en) * 1979-10-26 1981-05-28 Seiko Epson Corp Semiconductor device position fitting method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5180777A (cg-RX-API-DMAC10.html) * 1975-01-13 1976-07-14 Hitachi Ltd
JPS5662324A (en) * 1979-10-26 1981-05-28 Seiko Epson Corp Semiconductor device position fitting method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61154127A (ja) * 1984-12-27 1986-07-12 Oki Electric Ind Co Ltd ウエハ−アライメント・マ−ク
JPH02134808A (ja) * 1988-11-16 1990-05-23 Fujitsu Ltd 半導体装置の製造方法
JPH0377309A (ja) * 1989-08-19 1991-04-02 Fujitsu Ltd 半導体装置の製造方法

Also Published As

Publication number Publication date
JPS6347330B2 (cg-RX-API-DMAC10.html) 1988-09-21

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