JPS5916385B2 - イオン源 - Google Patents

イオン源

Info

Publication number
JPS5916385B2
JPS5916385B2 JP52041281A JP4128177A JPS5916385B2 JP S5916385 B2 JPS5916385 B2 JP S5916385B2 JP 52041281 A JP52041281 A JP 52041281A JP 4128177 A JP4128177 A JP 4128177A JP S5916385 B2 JPS5916385 B2 JP S5916385B2
Authority
JP
Japan
Prior art keywords
electrode
ion source
terminal end
ions
electric field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP52041281A
Other languages
English (en)
Japanese (ja)
Other versions
JPS52125998A (en
Inventor
ロイ・クラムピツト
デレク・カ−ク・ジエフリズ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
UK Atomic Energy Authority
Original Assignee
UK Atomic Energy Authority
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by UK Atomic Energy Authority filed Critical UK Atomic Energy Authority
Publication of JPS52125998A publication Critical patent/JPS52125998A/ja
Publication of JPS5916385B2 publication Critical patent/JPS5916385B2/ja
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/26—Ion sources; Ion guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Particle Accelerators (AREA)
JP52041281A 1976-04-13 1977-04-11 イオン源 Expired JPS5916385B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB000000015111 1976-04-13
GB15111/76A GB1574611A (en) 1976-04-13 1976-04-13 Ion sources

Publications (2)

Publication Number Publication Date
JPS52125998A JPS52125998A (en) 1977-10-22
JPS5916385B2 true JPS5916385B2 (ja) 1984-04-14

Family

ID=10053248

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52041281A Expired JPS5916385B2 (ja) 1976-04-13 1977-04-11 イオン源

Country Status (6)

Country Link
US (1) US4088919A (OSRAM)
JP (1) JPS5916385B2 (OSRAM)
DE (1) DE2716202A1 (OSRAM)
FR (1) FR2348562A1 (OSRAM)
GB (1) GB1574611A (OSRAM)
NL (1) NL183554C (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6417190U (OSRAM) * 1987-07-22 1989-01-27

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2805273C3 (de) * 1978-02-08 1982-03-18 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V., 3400 Göttingen Einrichtung zum Erzeugen eines Strahles beschleunigter Ionen durch Kontaktionisation
US4328667A (en) * 1979-03-30 1982-05-11 The European Space Research Organisation Field-emission ion source and ion thruster apparatus comprising such sources
JPS5633468A (en) * 1979-08-23 1981-04-03 Atomic Energy Authority Uk Spray generating source of fine droplet and ion of liquid material
JPS56112058A (en) * 1980-02-08 1981-09-04 Hitachi Ltd High brightness ion source
US4318029A (en) * 1980-05-12 1982-03-02 Hughes Aircraft Company Liquid metal ion source
US4318030A (en) * 1980-05-12 1982-03-02 Hughes Aircraft Company Liquid metal ion source
FR2510305A1 (fr) * 1981-07-24 1983-01-28 Europ Agence Spatiale Reservoir pour source ionique a emission de champ, notamment pour propulseur ionique a applications spatiales, et procede de fabrication d'un tel reservoir
JPS5830055A (ja) * 1981-08-18 1983-02-22 New Japan Radio Co Ltd イオンビ−ム源
JPS5838906B2 (ja) * 1981-09-03 1983-08-26 日本電子株式会社 金属イオン源
JPS5878557U (ja) * 1981-11-24 1983-05-27 株式会社日立製作所 電界放出型イオン源
JPS58137941A (ja) * 1982-02-10 1983-08-16 Jeol Ltd イオン源
US4577135A (en) * 1982-02-22 1986-03-18 United Kingdom Atomic Energy Authority Liquid metal ion sources
JPS58163135A (ja) * 1982-03-20 1983-09-27 Nippon Denshi Zairyo Kk イオン源
JPS58178944A (ja) * 1982-04-14 1983-10-20 Hitachi Ltd イオン源
US4629931A (en) * 1984-11-20 1986-12-16 Hughes Aircraft Company Liquid metal ion source
JPS60138831A (ja) * 1984-11-30 1985-07-23 Hitachi Ltd 荷電粒子源
US4638210A (en) * 1985-04-05 1987-01-20 Hughes Aircraft Company Liquid metal ion source
DE3677062D1 (de) * 1985-06-04 1991-02-28 Denki Kagaku Kogyo Kk Quelle geladener teilchen.
JPS61211937A (ja) * 1985-11-15 1986-09-20 Hitachi Ltd 電界放出型イオン源
US4731562A (en) * 1986-05-27 1988-03-15 The United States Of America As Represented By The Department Of Energy Electrohydrodynamically driven large-area liquid ion sources
DE3817604C2 (de) * 1987-05-27 2000-05-18 Mitsubishi Electric Corp Ionenstrahlgenerator
DE3845007C2 (de) * 1987-05-27 2000-09-28 Mitsubishi Electric Corp System zur Herstellung von Dünnschichten mittels eines Ionenstrahlgenerators
DE3817897A1 (de) * 1988-01-06 1989-07-20 Jupiter Toy Co Die erzeugung und handhabung von ladungsgebilden hoher ladungsdichte
US5153901A (en) * 1988-01-06 1992-10-06 Jupiter Toy Company Production and manipulation of charged particles
US5054046A (en) * 1988-01-06 1991-10-01 Jupiter Toy Company Method of and apparatus for production and manipulation of high density charge
US5123039A (en) * 1988-01-06 1992-06-16 Jupiter Toy Company Energy conversion using high charge density
CA1330827C (en) * 1988-01-06 1994-07-19 Jupiter Toy Company Production and manipulation of high charge density
US5018180A (en) * 1988-05-03 1991-05-21 Jupiter Toy Company Energy conversion using high charge density
US5584740A (en) * 1993-03-31 1996-12-17 The United States Of America As Represented By The Secretary Of The Navy Thin-film edge field emitter device and method of manufacture therefor
US5727978A (en) * 1995-12-19 1998-03-17 Advanced Micro Devices, Inc. Method of forming electron beam emitting tungsten filament
EP1622184B1 (en) * 2004-07-28 2011-05-18 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Emitter for an ion source and method of producing same
DE102007027097B4 (de) * 2007-06-12 2010-12-30 Forschungszentrum Dresden - Rossendorf E.V. Flüssigmetall-Ionenquelle zur Erzeugung von Lithium-Ionenstrahlen
AT506340B1 (de) * 2008-01-25 2012-04-15 Fotec Forschungs & Technologi Verfahren zur herstellung einer ionenquelle
US8453426B2 (en) * 2009-04-06 2013-06-04 Raytheon Company Current controlled field emission thruster
EP3923313B1 (en) * 2019-07-23 2023-09-27 Param Corporation Electron gun device

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3122882A (en) * 1960-11-23 1964-03-03 Aerojet General Co Propulsion means
US3475636A (en) * 1967-11-14 1969-10-28 Hughes Aircraft Co Liquid-metal arc cathode with maximized electron/atom emission ratio
US3852595A (en) * 1972-09-21 1974-12-03 Stanford Research Inst Multipoint field ionization source
GB1442998A (en) * 1973-01-24 1976-07-21 Atomic Energy Authority Uk Field emission ion sources
DE2333866A1 (de) * 1973-07-03 1975-01-23 Max Planck Gesellschaft Felddesorptions-ionenquelle und verfahren zu ihrer herstellung

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6417190U (OSRAM) * 1987-07-22 1989-01-27

Also Published As

Publication number Publication date
NL183554C (nl) 1988-11-16
DE2716202A1 (de) 1977-11-03
FR2348562B1 (OSRAM) 1982-07-23
JPS52125998A (en) 1977-10-22
US4088919A (en) 1978-05-09
NL7703981A (nl) 1977-10-17
GB1574611A (en) 1980-09-10
NL183554B (nl) 1988-06-16
FR2348562A1 (fr) 1977-11-10

Similar Documents

Publication Publication Date Title
JPS5916385B2 (ja) イオン源
US4328667A (en) Field-emission ion source and ion thruster apparatus comprising such sources
US4900974A (en) Ion source
JPS5838906B2 (ja) 金属イオン源
US5936251A (en) Liquid metal ion source
JPH0415574B2 (OSRAM)
Zemskov et al. Investigation of Changes in the Field Emission Characteristics of the Eroded Cathode Surface after Submicrosecond Vacuum Arc Discharges with Different Current Amplitudes
JPS5911400Y2 (ja) 電界放射型イオン源
US4755683A (en) Liquid-metal ion beam source substructure
JPH1064438A (ja) 液体金属イオン源
JPS60249234A (ja) 液体イオン源
JPS6129041A (ja) 電界放出形液体金属イオン源
JPS5911401Y2 (ja) 電界放射型イオン源
US3602760A (en) Sintered coaxial plasma gun
JPS61214330A (ja) 液体金属イオン源
JPS62216136A (ja) 液体金属イオン源
JPS593815B2 (ja) イオン源
JPS58137940A (ja) イオン源
JPS63216251A (ja) ガスフエ−ズイオン源
JPS6345734Y2 (OSRAM)
JPS6329373B2 (OSRAM)
JPH0576127B2 (OSRAM)
JPS61279038A (ja) 液体金属イオン源
JPS6050841A (ja) 液体金属イオン源
JPH0160891B2 (OSRAM)