JPS59161422A - 写真カラープリント材料 - Google Patents

写真カラープリント材料

Info

Publication number
JPS59161422A
JPS59161422A JP58174046A JP17404683A JPS59161422A JP S59161422 A JPS59161422 A JP S59161422A JP 58174046 A JP58174046 A JP 58174046A JP 17404683 A JP17404683 A JP 17404683A JP S59161422 A JPS59161422 A JP S59161422A
Authority
JP
Japan
Prior art keywords
acrylate
group
composition
color print
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58174046A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0562325B2 (enExample
Inventor
ステユア−ト・エム・エラ−ステイン
サン・エイ・リ−
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ATK Launch Systems LLC
Original Assignee
Thiokol Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thiokol Corp filed Critical Thiokol Corp
Publication of JPS59161422A publication Critical patent/JPS59161422A/ja
Publication of JPH0562325B2 publication Critical patent/JPH0562325B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/06Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C11/00Auxiliary processes in photography
    • G03C11/08Varnishing, e.g. application of protective layers on finished photographic prints
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Laminated Bodies (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Paints Or Removers (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP58174046A 1982-09-20 1983-09-20 写真カラープリント材料 Granted JPS59161422A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US41967682A 1982-09-20 1982-09-20
US419676 1982-09-20

Publications (2)

Publication Number Publication Date
JPS59161422A true JPS59161422A (ja) 1984-09-12
JPH0562325B2 JPH0562325B2 (enExample) 1993-09-08

Family

ID=23663269

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58174046A Granted JPS59161422A (ja) 1982-09-20 1983-09-20 写真カラープリント材料

Country Status (12)

Country Link
EP (1) EP0104057B1 (enExample)
JP (1) JPS59161422A (enExample)
AT (1) ATE27374T1 (enExample)
AU (2) AU1911383A (enExample)
BR (1) BR8305128A (enExample)
CA (1) CA1247440A (enExample)
DE (1) DE3371709D1 (enExample)
DK (1) DK425983A (enExample)
IL (2) IL69767A (enExample)
IN (1) IN159417B (enExample)
NO (1) NO833376L (enExample)
ZA (1) ZA836832B (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6465111A (en) * 1987-05-01 1989-03-10 Mitsubishi Rayon Co Actinic ray-curable composition for cast polymerization
JP2012149228A (ja) * 2010-12-27 2012-08-09 Seiko Epson Corp インクジェット用インク組成物
JP2017110195A (ja) * 2015-12-16 2017-06-22 三洋化成工業株式会社 活性エネルギー線硬化型耐指紋性付与剤

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8401981A (nl) * 1984-06-22 1986-01-16 Philips Nv Optische glasvezel voorzien van een kunststofbedekking en werkwijze voor de vervaardiging daarvan.
US4812346A (en) * 1985-07-26 1989-03-14 Hitachi Ltd. Optical disc base plate and process for producing the same
US4900125A (en) * 1988-07-21 1990-02-13 Abbott Laboratories Optical coupling method
CA1321671C (en) * 1989-05-11 1993-08-24 Paul J. Shustack Ultraviolet radiation-curable coatings for optical fibers and optical fibers coated therewith
US5536529A (en) * 1989-05-11 1996-07-16 Borden, Inc. Ultraviolet radiation-curable coatings for optical fibers and optical fibers coated therewith
US5352712A (en) * 1989-05-11 1994-10-04 Borden, Inc. Ultraviolet radiation-curable coatings for optical fibers
EP1417244B1 (en) * 2001-08-17 2007-05-23 Draka Comteq B.V. Radiation-curable coating composition for optical filers comprising all-in-one oligomeric system
US7068902B2 (en) 2001-08-17 2006-06-27 Alcatel Radiation-curable coating composition for optical fibers comprising all-in-one oligomeric system

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49130435A (enExample) * 1972-01-03 1974-12-13
JPS5244920A (en) * 1975-10-03 1977-04-08 Lucas Industries Ltd Suspension system for vehicle
JPS54106543A (en) * 1977-12-29 1979-08-21 Gaf Corp Radiation curable coating composition
JPS5755914A (en) * 1980-09-19 1982-04-03 Hitachi Chem Co Ltd Photopolymer composition and photosensitive element

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3924023A (en) * 1973-04-03 1975-12-02 Gaf Corp Floor tile production and products
US4120721A (en) * 1977-06-02 1978-10-17 W. R. Grace & Co. Radiation curable compositions for coating and imaging processes and method of use
US4135007A (en) * 1977-12-29 1979-01-16 Gaf Corporation Radiation curable coating composition comprising an acryl urethane oligomer, and an ultra-violet absorber
JPS56120718A (en) * 1980-02-28 1981-09-22 Asahi Chem Ind Co Ltd Improved polyurethane type photosensitive resin composition
DE3136818C2 (de) * 1980-09-19 1990-08-02 Hitachi Chemical Co., Ltd., Tokio/Tokyo Verwendung eines lichtempfindlichen Gemisches und eines lichtempfindlichen Aufzeichnungsmaterials zur Bildung einer Lötmaske
CA1172790A (en) * 1980-11-24 1984-08-14 Gerald M. Leszyk Radiation curable composition including an acrylated urethane, and unsaturated carboxylic acid, a multifunctional acrylate and a siloxy-containing polycarbinol

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49130435A (enExample) * 1972-01-03 1974-12-13
JPS5244920A (en) * 1975-10-03 1977-04-08 Lucas Industries Ltd Suspension system for vehicle
JPS54106543A (en) * 1977-12-29 1979-08-21 Gaf Corp Radiation curable coating composition
JPS5755914A (en) * 1980-09-19 1982-04-03 Hitachi Chem Co Ltd Photopolymer composition and photosensitive element

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6465111A (en) * 1987-05-01 1989-03-10 Mitsubishi Rayon Co Actinic ray-curable composition for cast polymerization
JP2012149228A (ja) * 2010-12-27 2012-08-09 Seiko Epson Corp インクジェット用インク組成物
JP2017110195A (ja) * 2015-12-16 2017-06-22 三洋化成工業株式会社 活性エネルギー線硬化型耐指紋性付与剤

Also Published As

Publication number Publication date
JPH0562325B2 (enExample) 1993-09-08
IL69767A (en) 1987-02-27
IN159417B (enExample) 1987-05-16
IL69767A0 (en) 1983-12-30
NO833376L (no) 1984-03-21
AU1911383A (en) 1984-03-29
DK425983A (da) 1984-03-21
EP0104057A2 (en) 1984-03-28
DE3371709D1 (en) 1987-06-25
EP0104057B1 (en) 1987-05-20
IL71224A (en) 1988-04-29
DK425983D0 (da) 1983-09-19
CA1247440A (en) 1988-12-28
ZA836832B (en) 1984-05-30
EP0104057A3 (en) 1984-10-10
ATE27374T1 (de) 1987-06-15
AU8002687A (en) 1988-02-18
BR8305128A (pt) 1984-05-08

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