JPS5915419A - シリコン原子を有するスチレン系重合体 - Google Patents

シリコン原子を有するスチレン系重合体

Info

Publication number
JPS5915419A
JPS5915419A JP57123866A JP12386682A JPS5915419A JP S5915419 A JPS5915419 A JP S5915419A JP 57123866 A JP57123866 A JP 57123866A JP 12386682 A JP12386682 A JP 12386682A JP S5915419 A JPS5915419 A JP S5915419A
Authority
JP
Japan
Prior art keywords
polymer
silicon atom
styrenic polymer
containing styrenic
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57123866A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0565527B2 (https=
Inventor
Kazuhide Saigo
斉郷　和秀
Shigeyoshi Suzuki
成嘉 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP57123866A priority Critical patent/JPS5915419A/ja
Priority to US06/501,201 priority patent/US4551417A/en
Priority to CA000429834A priority patent/CA1207216A/en
Priority to IE1339/83A priority patent/IE54731B1/en
Priority to EP83303324A priority patent/EP0096596B2/en
Priority to DE8383303324T priority patent/DE3363914D1/de
Publication of JPS5915419A publication Critical patent/JPS5915419A/ja
Publication of JPH0565527B2 publication Critical patent/JPH0565527B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP57123866A 1982-06-08 1982-07-16 シリコン原子を有するスチレン系重合体 Granted JPS5915419A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP57123866A JPS5915419A (ja) 1982-07-16 1982-07-16 シリコン原子を有するスチレン系重合体
US06/501,201 US4551417A (en) 1982-06-08 1983-06-06 Method of forming patterns in manufacturing microelectronic devices
CA000429834A CA1207216A (en) 1982-06-08 1983-06-07 Method of forming patterns in manufacturing microelectronic devices
IE1339/83A IE54731B1 (en) 1982-06-08 1983-06-07 Microelectronic device manufacture
EP83303324A EP0096596B2 (en) 1982-06-08 1983-06-08 Microelectronic device manufacture
DE8383303324T DE3363914D1 (en) 1982-06-08 1983-06-08 Microelectronic device manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57123866A JPS5915419A (ja) 1982-07-16 1982-07-16 シリコン原子を有するスチレン系重合体

Publications (2)

Publication Number Publication Date
JPS5915419A true JPS5915419A (ja) 1984-01-26
JPH0565527B2 JPH0565527B2 (https=) 1993-09-17

Family

ID=14871317

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57123866A Granted JPS5915419A (ja) 1982-06-08 1982-07-16 シリコン原子を有するスチレン系重合体

Country Status (1)

Country Link
JP (1) JPS5915419A (https=)

Also Published As

Publication number Publication date
JPH0565527B2 (https=) 1993-09-17

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