JPS59145532A - プラズマｃｖｄ方法 - Google Patents

プラズマｃｖｄ方法

Info

Publication number
JPS59145532A
JPS59145532A JP24197983A JP24197983A JPS59145532A JP S59145532 A JPS59145532 A JP S59145532A JP 24197983 A JP24197983 A JP 24197983A JP 24197983 A JP24197983 A JP 24197983A JP S59145532 A JPS59145532 A JP S59145532A
Authority
JP
Japan
Prior art keywords
wafer
bell jar
motor
inverting
fixed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24197983A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6156610B2 (enrdf_load_stackoverflow
Inventor
Masakuni Akiba
秋葉　政邦
Hiroto Nagatomo
長友　宏人
Jun Suzuki
純 鈴木
Takeo Yoshimi
吉見　武夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP24197983A priority Critical patent/JPS59145532A/ja
Publication of JPS59145532A publication Critical patent/JPS59145532A/ja
Publication of JPS6156610B2 publication Critical patent/JPS6156610B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
JP24197983A 1983-12-23 1983-12-23 プラズマｃｖｄ方法 Granted JPS59145532A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24197983A JPS59145532A (ja) 1983-12-23 1983-12-23 プラズマｃｖｄ方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24197983A JPS59145532A (ja) 1983-12-23 1983-12-23 プラズマｃｖｄ方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP11336277A Division JPS5447576A (en) 1977-09-22 1977-09-22 Plasma cvd apparatus

Publications (2)

Publication Number Publication Date
JPS59145532A true JPS59145532A (ja) 1984-08-21
JPS6156610B2 JPS6156610B2 (enrdf_load_stackoverflow) 1986-12-03

Family

ID=17082431

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24197983A Granted JPS59145532A (ja) 1983-12-23 1983-12-23 プラズマｃｖｄ方法

Country Status (1)

Country Link
JP (1) JPS59145532A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS6156610B2 (enrdf_load_stackoverflow) 1986-12-03

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