JPS59145029U - プラズマｃｖｄ装置 - Google Patents

プラズマｃｖｄ装置

Info

Publication number
JPS59145029U
JPS59145029U JP3840783U JP3840783U JPS59145029U JP S59145029 U JPS59145029 U JP S59145029U JP 3840783 U JP3840783 U JP 3840783U JP 3840783 U JP3840783 U JP 3840783U JP S59145029 U JPS59145029 U JP S59145029U
Authority
JP
Japan
Prior art keywords
plasma cvd
cvd equipment
wafer
processing chamber
radiation thermometer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3840783U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0514504Y2 (enExample
Inventor
中対　藤次
福島　喜正
掛樋　豊
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP3840783U priority Critical patent/JPS59145029U/ja
Publication of JPS59145029U publication Critical patent/JPS59145029U/ja
Application granted granted Critical
Publication of JPH0514504Y2 publication Critical patent/JPH0514504Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
JP3840783U 1983-03-18 1983-03-18 プラズマｃｖｄ装置 Granted JPS59145029U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3840783U JPS59145029U (ja) 1983-03-18 1983-03-18 プラズマｃｖｄ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3840783U JPS59145029U (ja) 1983-03-18 1983-03-18 プラズマｃｖｄ装置

Publications (2)

Publication Number Publication Date
JPS59145029U true JPS59145029U (ja) 1984-09-28
JPH0514504Y2 JPH0514504Y2 (enExample) 1993-04-19

Family

ID=30169076

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3840783U Granted JPS59145029U (ja) 1983-03-18 1983-03-18 プラズマｃｖｄ装置

Country Status (1)

Country Link
JP (1) JPS59145029U (enExample)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5019014U (enExample) * 1973-06-15 1975-03-03

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5019014U (enExample) * 1973-06-15 1975-03-03

Also Published As

Publication number Publication date
JPH0514504Y2 (enExample) 1993-04-19

Similar Documents

Publication Publication Date Title
JPS59145029U (ja) プラズマｃｖｄ装置
WO2025223385A1 (zh) 一种片状加热装置的电子水烟
JPH0230835Y2 (enExample)
JPS60192721U (ja) プレ−ト式調理器
JPS6221956Y2 (enExample)
JPS5832649U (ja) 半導体の導電型判定装置
JPS6128027U (ja) 温度計測装置
JPS59168136U (ja) 高温試料光学検出装置
JPS5943954U (ja) シ−ト材加熱器
JPS5921753U (ja) 真空内試料加熱装置
JPS58176959U (ja) Ｃｖｄ装置
JPH029446B2 (enExample)
JPS6157516U (enExample)
JPS5855296U (ja) 真空熱処理炉
JPS63115211U (enExample)
JPH0272530U (enExample)
JPS6176463U (enExample)
JPS58105315U (ja) 温熱治療用ホツトパツド装置
JPH0418443U (enExample)
JPS6015448U (ja) 内部加熱金型
JPH01110429U (enExample)
JPS5974731U (ja) 試料測定装置
JPH0573906A (ja) 磁気記録媒体製造装置
JPS6142864U (ja) 光起電力素子の製造装置
JPS58135940U (ja) 連続気相成長装置