JPS59123581A - Washing apparatus - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a cleaning device used, for example, for removing dust attached to the surface of a semiconductor or glass substrate, or for a rinsing process after etching. TECHNICAL BACKGROUND OF THE INVENTION As shown in FIG. 1, this type of conventional apparatus uses cleaning liquids II, L2. 10 objects to be cleaned (including holders?) such as semiconductors or glass substrates were first immersed in the cleaning solution in cleaning tank 1, and then a predetermined period of time had elapsed. This later?
Pull up, then.

In many cleaning tanks 2 and 3, similar operations were repeated to wash away foreign matter on the surface, and then the dryer 4 installed near the cleaning tank 3 was used to dry the product.

In this case, among the foreign substances removed from the object 10 to be cleaned, those with low specific gravity remain on the surface of the cleaning liquid as floating foreign substances, and when the object 10 to be cleaned is pulled up, these floating foreign substances adhere to the surface again. Since there is a risk of floating foreign matter, I usually let the cleaning solution overflow and tighten it. I'm trying to remove it.

[Problems with background technology]

In such conventional cleaning equipment, floating foreign matter? Although the cleaning solution was heated over 70°C to remove it, are foreign particles floating from the surface of the cleaning solution? If it takes a long time to completely remove the foreign matter and cleaning is completed in a short time, the floating foreign matter will re-adhere to the surface when the object 10 to be cleaned is pulled up.
There was a drawback that this floating foreign matter was carried into the next stage cleaning tank.

In addition, when the object to be cleaned is glass, for example, static electricity is generated when the object is put in and taken out of the cleaning liquid, and this static electricity attracts floating foreign matter or dust in the air, making it impossible to obtain a sufficient cleaning effect.

[Purpose of the invention]

Is the present invention based on the above circumstances? Is this done with consideration given to the number of times the object to be cleaned is put in and out of the cleaning solution? It is an object of the present invention to provide a cleaning device that can significantly reduce floating foreign matter and quickly remove floating foreign matter at a position where an object to be cleaned is pulled up, thereby significantly improving the cleaning effect.

[Summary of the invention]

This purpose? In order to achieve this, the cleaning device of the present invention has a plurality of cleaning chambers in which the overflow surface changes stepwise, and a liquid transfer hole through which an object to be cleaned can be moved is provided in the partition wall of the cleaning chamber adjacent to the overflow surface. A cleaning tank having a liquid recovery hole formed in the side wall of the stone facing the liquid transfer hole of the cleaning chamber formed below the surface and having the lowest overflow surface, and a cleaning tank having a liquid recovery hole formed in the side wall of the stone and a cleaning liquid collecting hole in the cleaning chamber having the highest overflow surface. a cleaning liquid supply means for supplying cleaning liquid to overflow each of the cleaning chambers, and moving the object to be cleaned, immersed in the cleaning liquid, sequentially from the cleaning chamber with a low overflow surface to the cleaning chamber with a high overflow surface through the liquid transfer hole; , the cleaning object in each cleaning chamber? A conveying device for moving the liquid in the direction opposite to the direction in which the liquid flows is adopted.

[Embodiments of the invention]

Is the attached drawing below? An embodiment of the present invention will be described with reference to FIG.

FIG. 2 is a cross-sectional view of the main parts of the cleaning device according to the present invention, showing the structure of the cleaning liquid together with the shield ring system.

In the same figure, the cleaning tank has cleaning chambers 21, 22, and 2 whose overflow surfaces become higher in stages, and among these, there is a partition wall 4 between the cleaning chambers 21 and 22, and a partition wall 4 between the cleaning chambers 22 and 22. The liquid mover is capable of moving the cleaning liquid to each of the four walls and moving the object to be cleaned 10 times.

29a Formed below the cover flow surface.

In addition, the cleaning chamber 21 has the lowest overflow surface.

A liquid recovery hole 27a for recovering the cleaning liquid is formed in the lower part of the side wall 27 facing the partition wall passage.

Note that the cleaning chamber 21. .eta., 23 are arranged in a rigid row, and at the inner bottom of each cleaning chamber is a conveyor for placing objects 10Y to be cleaned and moving them in the arrangement direction of the cleaning chambers.

5.26 are provided at 1'# in stages corresponding to the overflow surface, and liquid transfer holes 7, 8b and 29a are provided in the cleaning chambers B and B, respectively. The object to be cleaned is fed through a 10% step difference! ;) Lifting mechanisms 35 and 36 are provided for transfer to a conveyor.

Further, the dryer 30 is arranged adjacent to the cleaning chamber B where the overflow surface is the highest.

On the other hand, at the bottom of the outside of the cleaning tank, there is overflow liquid from each cleaning chamber. At the same time, the cleaning liquid flows out from the liquid recovery hole 27a of the cleaning chamber 21 f7) Cleaning liquid? There are 31 storage tanks, and 2 cleaning chambers with the highest overflow surface.
A shower water supply system for cleaning the object to be cleaned is provided at the top of the tank 31, and this tank 31 and the shower water supply 1534 are connected through a pipe, and a pump 32 and a filter 33 are disposed in the middle thereof. has been done.

How does Akira Hontaku's cleaning device configured as described above work? Please explain below.

First, the pump 32, the drives f and b, and the cleaning liquid stored in the tank 31 are fed in the direction indicated by the arrow A, and are also supplied to the shower water supply system through the filter 33.
The shower water falls into the washing room channel. In this way, the cleaning water that has fallen into the cleaning chamber 23 passes through the liquid transfer holes 29a and 28 a f and flows into the cleaning chamber 2. The cleaning liquid is supplied to the cleaning chambers 21, 22.2.
'( are stored in the order of

In this case, liquid recovery hole 27a, liquid transfer hole 4a, 29a.

The overflow surface of each cleaning chamber and the liquid supply source of the pump 32 are closely related to each other, but here, when cleaning liquid is stored in each cleaning chamber, approximately isoelectric cleaning liquid is discharged from each cleaning chamber. An overflow is provided on the side of the cleaning tank.

Most of the washing water that falls on the washing route flows along the belt conveyors 24, 25, and 26 and is collected in the tank 1, and the remaining overflowing washing liquid is also collected in the tank 31. This forms a cleaning circulation system for the cleaning liquid.

Next, the object to be cleaned 10 is placed on the belt conveyor 24 at the most downstream side of the cleaning chamber where the overflow surface is the lowest.
Then, the object to be cleaned 1o is cleaned while being transferred in the direction of arrow B, that is, in the direction opposite to the direction in which the cleaning liquid flows, and is then led to the cleaning chamber 22 through the liquid transfer holes 28a to 28f, and is introduced into the cleaning chamber 22. is transferred to the belt conveyor section. At this time, although the detailed configuration is omitted, the lifting mechanism 35 is connected to the flannel cleaning object 10? This is for transferring to a belt conveyor with steps.

Thereafter, the object to be cleaned 1o is similarly transported by the belt conveyor 5 and 213KJ- in the direction opposite to the direction in which the cleaning liquid flows, and is cleaned in the cleaning chamber η and the ejector.

Here, the two-belt conveyors 24 and Z5, 26 do not need to be belts, and moving rails may be used as long as they do not impair the cleaning effect.

Subsequently, when the object 1o to be cleaned reaches the upstream side of the cleaning chamber 23, the object 1o to be cleaned is pulled up from the cleaning liquid, is shower-washed by a shower water supply device 34 located directly above it, and then placed in a dryer. Dry with 3o.

In addition, the 10 objects to be cleaned are placed separately on the belt conveyor of the cleaning chamber 21 in the stone process, the lifting mechanism is moved to another belt conveyor, the stone process is moved to the 357 beak, and the objects are lifted out of the cleaning solution on the way home for shower cleaning. The process and the process of carrying the product to the dryer side, etc., must be appropriately controlled in relation to the speed of the belt conveyor determined by the cleaning specifications.

That configuration? When the cleaning liquid is purified by the filter 33 and is supplied to the cleaning chamber Z''+ +c, the object to be cleaned 10& is sequentially cleaned in the cleaning chambers with the highest cleanliness. In each cleaning chamber, the cleaning liquid flows, and the object to be cleaned 1 flows in the opposite direction to the flowing direction.
Since it moves 0 degrees, an ideal cleaning condition can be obtained.

In addition, since measures are taken to prevent the cleaning solution from overflowing in each cleaning chamber, floating foreign matter in the upstream cleaning chamber is promptly discarded outside the cleaning chamber, and these floating foreign matter are directly transported to the downstream cleaning chamber. It is possible to prevent such situations from occurring, especially by increasing the effectiveness of cleaning in downstream cleaning rooms.

Furthermore, since the object 10 to be cleaned is immersed in the cleaning liquid in the most downstream cleaning chamber and pulled up from the cleaning liquid in the most upstream cleaning chamber, it is always immersed in the cleaning liquid and cleaned one by one. The number of times the object 10 to be cleaned can be taken in and out of the cleaning solution can be kept to a minimum (() Even if the object 10 to be cleaned is easily charged with static electricity, such as glass, it becomes extremely easy to take measures against dust in the air. .

In addition, since the object 10 to be cleaned is lifted in the cleanest cleaning chamber and at the most upstream side thereof, floating foreign matter may adhere to the surface. Can you solve it?

In addition, in the above embodiment, the case where the cleaning chamber 21 is caused to overflow from each cleaning chamber is explained. For example, if the most amount of floating foreign matter is present, the stone overflows to the lowest power cleaning chamber 21. If the configuration is as follows: -r6, the cleaning effect will be poor ((it can leak).

In the above embodiment, the recovered liquid was purified and circulated, but for example, tap water could be used as the cleaning liquid? If used, pump 32 and filter 3
All you have to do is remove 3.

Furthermore, in the above embodiment, the conveyors 24, 25° 26
We have explained the case of constantly driven stones, but what about the objects to be cleaned on these conveyors? It may be made to stop for a certain period of time in the mounted state.

〔Effect of the invention〕

As is clear from the above explanation, according to the cleaning device of the present invention, the number of times the object to be cleaned is taken in and out of the cleaning liquid is significantly reduced4, and floating foreign matter can be promptly removed at the position where the object to be recleaned is pulled up. In addition, since the cleaning liquid is constantly flowing in each cleaning chamber and the object to be cleaned is moved in the opposite direction to the direction in which the cleaning liquid flows, the cleaning effect can be greatly improved. The liquid is constantly exchanged on the surface, and a greater cleaning effect can be obtained than with simple immersion.

Furthermore, the object to be cleaned? Even if it is placed on the conveyor and stopped, the two-liquid exchange is carried out constantly, albeit at a small speed, so that conditions suitable for long-term immersion cleaning can be obtained.

[Brief explanation of drawings]

FIG. 1 is an explanatory diagram showing the schematic configuration of a conventional cleaning device;
FIG. 2 is a top view of the main parts of an embodiment of the cleaning device according to the present invention, showing the configuration and cleaning fluid circulation system. 10... Object to be cleaned, processing... cleaning tank, 21, 2
2.2: (...Cleaning chamber, 24, 25.26...Conveyor, 27a...Liquid collection hole. 28a, 29a...Liquid transfer hole, 30...Dryer, 31. ...tank. 32...pop, 33...filter, word...shower water supply device. 35.36...lifting mechanism.

Claims (1)

[Scope of Claims] 1. It has a plurality of cleaning chambers in which the dopa flow surface changes stepwise, and a liquid transfer hole is formed under the overflow surface to allow the object to be cleaned to move to the partition wall of the adjacent cleaning chamber. , and supplying the cleaning liquid to a cleaning side in which a liquid recovery hole is formed in a side wall opposite to the liquid transfer hole of the cleaning chamber where the overflow is lowest, and to the cleaning chamber where the overflow is the highest, a cleaning liquid supply means for overflowing the cleaning chamber;
While the object to be cleaned is immersed in the cleaning liquid, the liquid transfer hole ? The object to be cleaned is sequentially moved from the cleaning chamber with a low overflow surface to the cleaning chamber with a high overflow surface through the cleaning chamber, and in each of the cleaning chambers, the object to be cleaned is moved in a direction opposite to the direction in which the liquid flows. Features 1/Characteristic cleaning equipment. 2. The cleaning liquid supply means includes a tank for storing the overflow liquid and the cleaning tL recovered from the liquid recovery hole; 2. The cleaning liquid in this tank? The filtration pump that supplies the cleaning chamber with the highest overflow surface and this cleaning solution? Purification 'f7) Filter and two features and -r stone Claim 1
Cleaning equipment described in section -