CN220879720U - Photovoltaic sample wafer cleaning tool - Google Patents
Photovoltaic sample wafer cleaning tool Download PDFInfo
- Publication number
- CN220879720U CN220879720U CN202321827343.6U CN202321827343U CN220879720U CN 220879720 U CN220879720 U CN 220879720U CN 202321827343 U CN202321827343 U CN 202321827343U CN 220879720 U CN220879720 U CN 220879720U
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- Prior art keywords
- tank
- ultrasonic
- cleaning
- sample wafer
- rinsing
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- 238000004140 cleaning Methods 0.000 title claims abstract description 52
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 76
- 238000004506 ultrasonic cleaning Methods 0.000 claims abstract description 17
- 230000005587 bubbling Effects 0.000 claims abstract description 16
- 238000002360 preparation method Methods 0.000 claims abstract description 7
- 239000012459 cleaning agent Substances 0.000 abstract description 7
- 239000000463 material Substances 0.000 abstract description 2
- 238000005406 washing Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000008237 rinsing water Substances 0.000 description 3
- 239000002210 silicon-based material Substances 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000006210 lotion Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Abstract
The utility model discloses a photovoltaic sample wafer cleaning tool, which is characterized in that a preparation trough, a cleaning trough, an ultrasonic rinsing trough and a sample wafer inserting basket are sequentially arranged on a fixing frame along the sample wafer conveying direction; an ultrasonic cleaning device and a bubbling device are arranged in the ultrasonic rinsing tank; a sample wafer limiting seat is arranged at the bottom of the sample wafer inserting basket; the ultrasonic cleaning device and the bubbling device are electrically connected with the PLC. The advantages are that: the cleaning tool is compact and reasonable in structure, and one person can conveniently complete cleaning operation; a material preparation groove, a cleaning groove, a pre-rinsing groove and an ultrasonic rinsing groove are sequentially arranged on a fixing frame of the tool, the pre-rinsing groove is used for cleaning a cleaning agent on the surface of a sample wafer once, and then an ultrasonic cleaning device and a bubbling device in the ultrasonic rinsing groove act together to effectively remove the attached cleaning agent on the surface of the sample wafer; the PLC is used for controlling the opening and closing of the water inlet valve and the overflow valve in the tool and the starting and stopping of the ultrasonic cleaning device and the bubbling device, so that the efficient operation of the cleaning tool is effectively realized.
Description
Technical field:
The utility model relates to the field of photovoltaic silicon material processing, in particular to a photovoltaic sample wafer cleaning tool.
The background technology is as follows:
The silicon material sample used in the photovoltaic field has high requirements on cleanliness, so that the photovoltaic sample needs to be cleaned for many times, and at present, the cleaning of the photovoltaic sample mainly comprises alcohol wiping, acid-base washing, water washing and the like, wherein the purposes of alcohol wiping and acid-base washing are to remove handwriting, glue residues, impurities such as silicon mud and the like on the surface of the sample, and the purpose of water washing is to clean the lotion.
At present, in the actual operation process of cleaning a silicon material sample wafer, the sample wafer is cleaned without a fixed operation tool, all links need to be manually participated, and because a plurality of cleaning tanks are used, if the cleaning tanks are used for cleaning by a single person, the operation span is large, the efficiency is low, and the cleaning tanks are not called hands; if the cleaning is performed by multiple persons, the labor cost is high; in addition, in the cleaning process, each cleaning tank independently works, the water consumption is large, and the cleaning effect cannot be effectively ensured.
The utility model comprises the following steps:
The utility model aims to provide a cleaning tool which improves the cleaning efficiency of a photovoltaic sample wafer, is convenient for operators to operate and can reduce water consumption.
The utility model is implemented by the following technical scheme: the photovoltaic sample wafer cleaning tool comprises a fixing frame, wherein a preparation groove, a cleaning groove, an ultrasonic rinsing groove, a sample wafer inserting basket and a PLC (programmable logic controller) are sequentially arranged on the fixing frame along the sample wafer conveying direction; the tank wall of the ultrasonic rinsing tank is respectively provided with a water inlet and an ultrasonic rinsing overflow port, the bottom of the ultrasonic rinsing tank is provided with a water outlet, and the ultrasonic rinsing tank is internally provided with an ultrasonic cleaning device and a bubbling device; a sample wafer limiting seat is arranged at the bottom of the sample wafer inserting basket; the ultrasonic cleaning device and the bubbling device are electrically connected with the PLC.
Preferably, a pre-rinsing tank is arranged between the rinsing tank and the ultrasonic rinsing tank, a water inlet is arranged at the bottom of the pre-rinsing tank, and a pre-rinsing overflow port is arranged above one side wall of the pre-rinsing tank.
Preferably, the ultrasonic cleaning device further comprises a circulating water tank, wherein a water inlet of the circulating water tank is communicated with a water outlet of the ultrasonic rinsing tank through a pipeline, and a water outlet of the circulating water tank is communicated with a water inlet at the bottom of the pre-rinsing tank.
Preferably, a filter screen is arranged at the pipe orifice of the water inlet of the pre-rinsing tank.
Preferably, a water pump is arranged on a pipeline between the circulating water tank and the pre-rinsing tank.
Preferably, a water inlet valve is arranged at the water inlet of the ultrasonic rinsing tank, and the water inlet valve is connected with the PLC.
Preferably, a water outlet valve is arranged at the water outlet of the ultrasonic rinsing tank, the water outlet valve is connected with the PLC, and the water suction pump is connected with the PLC.
The utility model has the advantages that: the cleaning tool is compact and reasonable in structure, and one person can conveniently complete cleaning operation; according to the cleaning operation flow of the photovoltaic sample, a preparation groove, a cleaning groove, a pre-rinsing groove and an ultrasonic rinsing groove are sequentially arranged on a fixing frame of the tool, the pre-rinsing groove is used for cleaning a cleaning agent on the surface of the sample once, and then an ultrasonic cleaning device and a bubbling device in the ultrasonic rinsing groove are used together to effectively remove the attached cleaning agent on the surface of the sample; the drainage of the ultrasonic rinsing tank enters the pre-rinsing tank through the circulating water tank, so that the rinsing water utilization rate is improved. The PLC is used for controlling the opening and closing of the water inlet valve and the water outlet valve in the tool and the opening and closing of the ultrasonic cleaning device and the bubbling device, so that the cleaning efficiency of the cleaning tool is improved.
Description of the drawings:
In order to more clearly illustrate the embodiments of the utility model or the technical solutions in the prior art, the drawings that are required in the embodiments or the description of the prior art will be briefly described, it being obvious that the drawings in the following description are only some embodiments of the utility model, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
Fig. 1 is a schematic diagram of the overall structure of the present utility model.
FIG. 2 is a schematic view of a sink according to the present utility model.
Fig. 3 is a control logic diagram of the present utility model.
The ultrasonic cleaning device comprises a fixing frame 1, a material preparation tank 2, a cleaning tank 3, a pre-rinsing tank 4, a pre-rinsing overflow port 4.1, an ultrasonic rinsing tank 5, an ultrasonic rinsing overflow port 5.1, a water inlet valve 5.2, a water outlet valve 5.3, an ultrasonic cleaning device 5.4, a bubbling device 5.5, a sample inserting basket 6, a sample limiting seat 6.1, a circulating water tank 7, a water suction pump 7.1 and a PLC (programmable logic controller) 8.
The specific embodiment is as follows:
The following description of the embodiments of the present utility model will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present utility model, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.
Example 1:
A photovoltaic wafer cleaning tool as shown in fig. 1-3 comprises a fixture 1 for supporting the tool. On the fixing frame 1, a preparation tank 2, a cleaning tank 3, a pre-rinsing tank 4, an ultrasonic rinsing tank 5 and a sample inserting basket 6 are sequentially arranged according to the cleaning operation flow of the photovoltaic sample.
Wherein, the tank bottom of the pre-rinsing tank 4 is provided with a water inlet, and a pre-rinsing overflow port 4.1 is arranged above one side wall of the pre-rinsing tank 4. The tank wall of the ultrasonic rinsing tank 5 is respectively provided with a water inlet and an ultrasonic rinsing overflow port 5.1, the bottom of the ultrasonic rinsing tank 5 is provided with a water outlet, the water inlet is provided with a water inlet valve 5.2, the water outlet is provided with a water outlet valve 5.3, and an ultrasonic cleaning device 5.4 and a bubbling device 5.5 are arranged in the ultrasonic rinsing tank 5; the bottom of the sample wafer inserting basket 6 is provided with a sample wafer limiting seat 6.1.
In order to improve the utilization rate of the rinse water, a circulating water tank 7 is arranged in the tool, a water inlet of the circulating water tank 7 is communicated with a water outlet of the ultrasonic rinsing tank 5 through a pipeline, and a water outlet of the circulating water tank 7 is communicated with a water inlet at the bottom of the pre-rinsing tank 4. Wherein, the mouth of pipe department of the water inlet of the pre-rinsing tank 4 is provided with a filter screen, and a water pump 7.1 is arranged on the pipeline between the circulating water tank 7 and the pre-rinsing tank 4.
In order to realize efficient operation of the tool, the tool comprises a PLC (programmable logic controller) 8, and an ultrasonic cleaning device 5.4, a bubbling device 5.5, a water pump 7.1, a water outlet valve 5.3 and a water inlet valve 5.2 are all electrically connected with the PLC 8.
Description of use: the sample wafer to be cleaned is placed in the stock chest 2, and then the following steps are carried out:
(1) The PLC 8 is internally provided with a water inlet valve 5.2, a water outlet valve 5.3, the opening time of a water suction pump 7.1 and the working time of an ultrasonic cleaning device 5.4 and a bubbling device 5.5, and the PLC controls the devices and the valves;
(2) Placing the sample into a cleaning tank 3 for cleaning, wherein a corresponding cleaning agent can be placed in the cleaning tank 3 according to actual cleaning requirements;
(3) Taking out the sample wafer after cleaning in the cleaning tank 3, placing the sample wafer in the pre-rinsing tank 4, and washing off the cleaning agent attached to the surface of the sample wafer, wherein in the process, pre-rinsing water is sourced from the ultrasonic cleaning tank 3, and when the liquid level in the pre-rinsing tank 4 is higher than the pre-rinsing overflow port 4.1, the rinsing water overflows, so that the cleaning efficiency is effectively improved by the movable water;
(4) Taking out the sample in the pre-rinsing tank 4, placing the sample in the ultrasonic rinsing tank 5, and effectively removing the attached cleaning agent under the bubbling action of the ultrasonic and bubbling device 5.5;
(5) After cleaning, the sample is taken out and arranged on the limiting seat 6.1 in the sample inserting basket 6 in sequence.
The foregoing description of the preferred embodiments of the utility model is not intended to be limiting, but rather is intended to cover all modifications, equivalents, alternatives, and improvements that fall within the spirit and scope of the utility model.
Claims (7)
1. The photovoltaic sample wafer cleaning tool is characterized by comprising a fixing frame and a PLC, wherein a preparation groove, a cleaning groove, an ultrasonic rinsing groove and a sample wafer inserting basket are sequentially arranged on the fixing frame along the sample wafer conveying direction;
The tank wall of the ultrasonic rinsing tank is respectively provided with a water inlet and an ultrasonic rinsing overflow port, and an ultrasonic cleaning device and a bubbling device are arranged in the ultrasonic rinsing tank; a water outlet is arranged at the bottom of the ultrasonic rinsing tank; a sample wafer limiting seat is arranged at the bottom of the sample wafer inserting basket;
the ultrasonic cleaning device and the bubbling device are electrically connected with the PLC.
2. The photovoltaic sample wafer cleaning tool according to claim 1, wherein a pre-rinsing tank is arranged between the cleaning tank and the ultrasonic rinsing tank, a water inlet is arranged at the bottom of the pre-rinsing tank, and a pre-rinsing overflow port is arranged above one side wall of the pre-rinsing tank.
3. The photovoltaic wafer cleaning tool according to claim 2, further comprising a circulating water tank, wherein a water inlet of the circulating water tank is communicated with a water outlet of the ultrasonic rinsing tank through a pipeline, and a water outlet of the circulating water tank is communicated with a water inlet at the bottom of the pre-rinsing tank.
4. A photovoltaic wafer cleaning tool according to claim 2 or 3, wherein a filter screen is provided at the nozzle of the water inlet of the pre-rinse tank.
5. A photovoltaic wafer cleaning tool according to claim 3, wherein a water pump is provided on the conduit between the circulation tank and the pre-rinse tank.
6. The photovoltaic wafer cleaning tool according to claim 1, wherein a water inlet valve is arranged at a water inlet of the ultrasonic rinsing tank, and the water inlet valve is connected with the PLC.
7. The photovoltaic sample wafer cleaning tool according to claim 5, wherein a water outlet valve is arranged at a water outlet of the ultrasonic rinsing tank, the water outlet valve is connected with the PLC, and the water suction pump is connected with the PLC.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321827343.6U CN220879720U (en) | 2023-07-12 | 2023-07-12 | Photovoltaic sample wafer cleaning tool |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321827343.6U CN220879720U (en) | 2023-07-12 | 2023-07-12 | Photovoltaic sample wafer cleaning tool |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN220879720U true CN220879720U (en) | 2024-05-03 |
Family
ID=90879056
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202321827343.6U Active CN220879720U (en) | 2023-07-12 | 2023-07-12 | Photovoltaic sample wafer cleaning tool |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN220879720U (en) |
-
2023
- 2023-07-12 CN CN202321827343.6U patent/CN220879720U/en active Active
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| GR01 | Patent grant |