JPS59121938A - Cleaning by slowly flowing liquid and equipment of the same - Google Patents

Cleaning by slowly flowing liquid and equipment of the same

Info

Publication number
JPS59121938A
JPS59121938A JP22805382A JP22805382A JPS59121938A JP S59121938 A JPS59121938 A JP S59121938A JP 22805382 A JP22805382 A JP 22805382A JP 22805382 A JP22805382 A JP 22805382A JP S59121938 A JPS59121938 A JP S59121938A
Authority
JP
Japan
Prior art keywords
liquid
cleaning
tank
cleansing
cleaned
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22805382A
Other languages
Japanese (ja)
Inventor
Kinya Usuda
臼田 欣也
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP22805382A priority Critical patent/JPS59121938A/en
Publication of JPS59121938A publication Critical patent/JPS59121938A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE:To reduce the frequency of the putting in and out and improve the cleansing effect by a method wherein the cleansing liquid in a cleansing bath is let flow slowly and a cleansed object is dipped into the cleansing liquid at its downstream and is cleansed while it is conveyed against the direction of the flow of the cleansing liquid and is pulled out of the liquid at its upstream. CONSTITUTION:The cleansing liquid L11 in a cleansing bath 11 is positively recovered and fed to a tank 13 by the operation of a pump 14 and, on the other hand, the cleansing liquid stored in the tank 13 is fed to the cleaning bath 11 through a filter 16 by the operation of another pump 15. The cleansing liquid is circulated while the surface of the liquid in the cleansing bath 11 is kept nearly stable. Floating foreign articles are transferred from right to left and the floating foreign articles near a liquid feeding inlet 11b are quickly removed. A cleansed object 10 is dipped near a liquid recovering outlet 11a or at the downstream of the flowing cleansing liquid and put on a conveyer 12 so that it is conveyed to the direction of an arrow mark A and is cleansed continuously until it reaches near the liquid feeding inlet 11b or the upstream of the flowing liquid.

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は1例えば半導体若しくはガラス基板の表面に付
着した塵挨の除去、または、現象、エツチング後のリン
ス工程に用いる弱流液による洗浄方法および装置に関す
る。
Detailed Description of the Invention [Technical Field of the Invention] The present invention relates to (1) a cleaning method using a weak flowing liquid used in a rinsing step after etching, and Regarding equipment.

〔発明の技術的背景〕[Technical background of the invention]

この種の従来の洗浄方法は第1図に示てように、蒸留水
またはリンス液等の洗浄液Ll、L 2 、 L l−
それぞれ貯えた洗浄槽1,2..3’Y並設し、半導体
若しくはガラス基板等の被洗浄物体(保持具?含む)1
0を、先ず、洗浄槽1の洗浄液に浸漬し、所定の時間ン
経過した後にこれン引き上げ1次いで、洗浄槽2および
3においても同様な操作ン繰返して表面の異物?洗い流
し1こ後、洗浄槽3の近傍に設けられた乾燥機4によっ
て乾燥させる。
This type of conventional cleaning method, as shown in FIG.
Cleaning tanks 1, 2, respectively. .. 3'Y side by side, objects to be cleaned such as semiconductors or glass substrates (including holders?) 1
0 is first immersed in the cleaning liquid in cleaning tank 1, and after a predetermined period of time has elapsed, it is lifted up. After rinsing, it is dried in a dryer 4 provided near the washing tank 3.

この場合、被洗浄物体10から除去された異物の中、比
重の小さいものは、浮遊異物として洗浄液の表面部に残
り、この浮遊異物が被洗浄物体10の引上げ時に、その
表面に再度付着する惧れがあるので、通常は洗浄液ケオ
ーバフローせしめて浮遊異物7取り除くようにしている
〇 〔背景技術の問題点〕 斯かる従来の洗浄方法にあっては、浮遊異物ン除去fb
べく洗浄液?オーバフローさせているものの、洗浄液の
表面から浮遊異物を完全に除去イろに長時間を要し、短
時間にて洗浄を終了てる場合には、被洗浄物体10の引
上げ時に浮遊異物がその表面に再度付着てるとともに、
この浮遊異物が次段の洗浄槽に持ち込まれろと言う欠点
があった0また、被洗浄物体が例えばガラスであるとき
In this case, among the foreign substances removed from the object 10 to be cleaned, those with a low specific gravity remain on the surface of the cleaning liquid as floating foreign substances, and there is a risk that these floating foreign substances may re-adhere to the surface of the object 10 to be cleaned when the object 10 is pulled up. Therefore, the floating foreign matter 7 is usually removed by allowing the cleaning solution to overflow.〇 [Problems in the background art] In such a conventional cleaning method, the floating foreign matter 7 is removed by allowing the cleaning solution to overflow.
Cleaning liquid? Although the cleaning liquid is allowed to overflow, if it takes a long time to completely remove the floating foreign matter from the surface of the cleaning liquid and the cleaning is completed in a short time, the floating foreign matter may fall onto the surface when the object 10 to be cleaned is pulled up. As it is reattached,
There is a drawback that this floating foreign matter is brought into the next stage cleaning tank.Also, when the object to be cleaned is glass, for example.

洗浄液への出し入れに際して静電気が発生し、この静ポ
、気によって浮遊異物または空気中の塵埃が吸引され、
十分な洗浄効果が得られないことがあ〔発明の目的〕 本発明は上記従来のものの欠点を除去でろためになされ
たもので、被洗浄物体の洗浄液への出し入れ回数?著し
く減少させろとともに2被洗浄物体?引上げる位置の浮
遊異物を速やかに除去し得、これによって、洗浄効果ケ
著しく増大させ得ろ弱流液による洗浄方法および装置の
提供?目的と】C〔発明の概要〕 この目的?達成てろために1本発明の弱流液による洗浄
方法は、洗浄槽内の洗浄液Y緩やかに流動させ、被洗浄
物体?洗浄液の下流側で浸漬し。
Static electricity is generated when the cleaning solution is put in and taken out, and floating foreign matter or dust in the air is attracted by the static electricity and air.
[Object of the Invention] The present invention has been made to eliminate the above-mentioned drawbacks of the conventional methods. Significantly reduce the number of objects to be cleaned? Providing a cleaning method and device using a weakly flowing liquid that can quickly remove floating foreign matter at a pulled-up position, thereby significantly increasing the cleaning effect. Purpose] C [Summary of the invention] This purpose? In order to achieve this, 1. The method of cleaning using a weak flow liquid of the present invention is to slowly flow the cleaning liquid Y in the cleaning tank and clean the object to be cleaned. Immerse it downstream of the cleaning solution.

この被洗浄物体?洗浄液に浸漬した状態で、この洗浄液
の流下方向とは反対方向に移動させながら洗浄し、前記
被洗浄物体ン洗浄液の上流側で引上げることケ特徴とし
ている。
This object to be cleaned? The object to be cleaned is cleaned while being immersed in the cleaning liquid while being moved in a direction opposite to the direction in which the cleaning liquid flows, and the object to be cleaned is pulled up on the upstream side of the cleaning liquid.

また、この方法を実施てるために5本発明の弱流液によ
る洗浄装置は、水平方向に細長く形成され、内部に洗浄
液ン貯え得ろ洗浄槽と、この洗浄槽内に貯えられろ洗浄
液?、1音内の一端部より回収して浄化fろとともに槽
内の他端部に供給fることにより、浄化された洗浄液7
槽の長手方向に流動させる浄化循環装置と、被洗浄物体
ケ保持し、且つ、この被洗浄物体ケ保持し、且つ、この
被洗浄物体?前記洗浄槽内の洗浄液に浸漬させた状態で
、洗浄液の流下方向とは反対の方向に移動させる搬送装
置と?具備−fろことを特徴とじている。
In addition, in order to carry out this method, the washing device using a weak flow liquid of the present invention is formed in a horizontally elongated manner, and has a washing tank in which the washing liquid is stored inside, and a washing tank in which the washing liquid is stored in the washing tank. , the purified cleaning liquid 7 is collected from one end of the tank and supplied to the other end of the tank along with the purification filter.
A purification circulation device that causes fluid to flow in the longitudinal direction of the tank, holds an object to be cleaned, holds this object to be cleaned, and cleans the object to be cleaned. A conveyance device that moves the body immersed in the cleaning liquid in the cleaning tank in a direction opposite to the direction in which the cleaning liquid flows down. Features: Features:

〔発明の実施例〕[Embodiments of the invention]

以下、添付図面を参照して本発明の一実施例について説
明fる。第2図は本発明に係る弱流液による洗浄装置の
構成ン示したもので、洗浄槽11は水平方向に細長く形
成され、その内底部には搬送装置としてのコンベヤ12
が設けられ、且つ、この槽内に洗浄液Lllが装入され
ている。
Hereinafter, one embodiment of the present invention will be described with reference to the accompanying drawings. FIG. 2 shows the structure of a cleaning device using a weak flow liquid according to the present invention, in which a cleaning tank 11 is formed into a horizontally elongated shape, and a conveyor 12 serving as a conveying device is provided at the inner bottom of the cleaning tank 11.
A cleaning liquid Lll is charged into this tank.

また、洗浄槽11の長手方向の一方の端部には洗浄液L
 11 ’2回回収るだめの液回収孔11&が一他方の
端部には洗浄液Lll’に供給fるだめの液供給孔11
bがそれぞれ設けられている。
Further, one end of the cleaning tank 11 in the longitudinal direction is provided with a cleaning liquid L.
11 'Liquid recovery hole 11 & of the twice-recovery reservoir is provided at the other end, while liquid supply hole 11 of the reservoir for supplying the cleaning liquid Lll' is provided at the other end.
b are provided respectively.

さらに、洗浄!11の外部には、洗浄液を貯留でるタン
ク13が設けられており、このタンク13と液回収孔1
1aとが、ポンプ14ケ介して管接続され、また、タン
ク13と液供給孔11bとが、ポンプ15およびフィル
タ16ン介して管接続されている。
Plus, wash! 11 is provided with a tank 13 for storing cleaning liquid, and this tank 13 and the liquid recovery hole 1
1a are pipe-connected through 14 pumps, and the tank 13 and the liquid supply hole 11b are pipe-connected through a pump 15 and a filter 16.

ここで、コンベヤ12は、ここに載置され被洗浄物体1
0Y常に図面の左側から右側へ移動させるもので、洗浄
効果?損うことがないようにメツシュ等のベルトが用い
られる〇 上記の如く構成された洗浄装置の作用Y説明てるワ 先ず、ポンプ14?作動させて洗浄槽11内の洗浄液L
11?強制的に回収してタンク13に送給する一方、ポ
ンプ15をも作動させてタンク13に貯えられた洗浄液
?、フィルタ16ケ介して洗浄槽11に供給する。この
場付、洗浄液の回収量と供給量とが略等しくなるように
ポンプ14およびポンプ15は関連?持って制御される
Here, the conveyor 12 is placed on the object 1 to be cleaned.
0Y Is it a cleaning effect that always moves from the left side to the right side of the drawing? A belt such as a mesh belt is used to prevent damage. The function of the cleaning device constructed as above is explained. First, the pump 14? The cleaning liquid L in the cleaning tank 11 is
11? The cleaning liquid stored in the tank 13 is forcibly collected and fed to the tank 13 while the pump 15 is also activated. , and is supplied to the cleaning tank 11 through 16 filters. In this case, are the pumps 14 and 15 related so that the amount of cleaning fluid recovered and the amount of supply are approximately equal? be held and controlled.

次に、液回収孔11aと液供給孔11bは比較的大きな
口径?有し、且つ、4の長手方向の対向側壁に形成され
ている。
Next, do the liquid recovery holes 11a and the liquid supply holes 11b have relatively large diameters? and is formed on four longitudinally opposite side walls.

しかして、洗浄槽11の液面が略一定に維持された状態
で洗浄液が循環され、その途中でフィルタ160作用の
もとで浄化され、さらに洗浄槽11の内部にあってはB
矢印方向に移動fる。
Thus, the cleaning liquid is circulated while the liquid level in the cleaning tank 11 is maintained substantially constant, and during the circulation, it is purified under the action of the filter 160, and furthermore, inside the cleaning tank 11, B
Move in the direction of the arrow f.

この洗浄液の流動は、単に洗浄液ンオーバフローさせろ
従来の洗浄力法に比べて、被洗浄物体10の洗浄ヶ促進
fることの曲、浮遊異物χ常に図面の右側から左側へ移
動させ、液供給孔11bの近傍におけろ浮遊異物ケ速や
かに除去fることができる0 ここで、被洗浄物体10χ液回収孔11aの近傍。
This flow of cleaning liquid facilitates the cleaning of the object 10 by simply allowing the cleaning liquid to overflow, which facilitates the cleaning of the object 10 to be cleaned compared to the conventional cleaning power method. Floating foreign matter can be quickly removed in the vicinity of the cleaning object 11b.

すなわち、流動fる洗浄液の下流@11で浸漬してコン
ベヤ12に載置f6と、この被洗浄物体[0はA矢印方
向に搬送され、液供給孔11bの近傍、すなわち、流動
″″rる洗浄液の上流てる′までの間、継親して洗浄が
行なわれる。
That is, the object to be cleaned [0] is immersed in the downstream @11 of the flowing cleaning liquid and placed on the conveyor 12, and the object to be cleaned [0 is conveyed in the direction of the arrow A, and is placed in the vicinity of the liquid supply hole 11b, that is, the flowing cleaning liquid Cleaning is performed by step-parenting until the cleaning liquid reaches the upstream stage.

続いて、被洗浄物体10は液供給孔11bの近傍にて引
上げられ1例えば、シャワ一式給水器17によってシャ
ワー洗浄された後、乾繰機に送り込まれろ0 このようにして、被洗浄物体10を引上げる位置の浮遊
異物は上述したように、液の流動によって除去されてい
るので、浮遊異物が洗浄ケ終了して引上げられる被洗浄
物体10の表面に付着でろと言う従来の洗浄方法の欠点
が解消され石とともに。
Subsequently, the object 10 to be cleaned is pulled up near the liquid supply hole 11b, and after being shower-washed by, for example, a shower set water supply device 17, the object 10 to be cleaned is sent to a drying machine. As mentioned above, the floating foreign matter at the position to be pulled up is removed by the flow of the liquid, so the drawback of the conventional cleaning method is that the floating foreign matter should not adhere to the surface of the object to be cleaned 10 that is pulled up after cleaning. Dissolved and with stones.

被洗#物体10の洗浄液への出し入れ回数乞最小に留め
得、被洗浄物体10がガラス等の静成気乞帯び易いもの
であっても、空気中のI曖挨を吸引f/−ことの対策が
立て易くなる。
The number of times the object 10 to be washed is put in and taken out of the cleaning solution can be kept to a minimum, and even if the object 10 to be washed is easily contaminated with static air, such as glass, it is possible to suck up dust in the air. It becomes easier to take countermeasures.

次に、第3図は本発明に係る洗浄装置の他の実施例の構
成ン示す平面図で、洗浄槽2]は環状に形成され、近接
する周万回の2箇所に仕切板21 aおよび21 bが
設けられている。
Next, FIG. 3 is a plan view showing the configuration of another embodiment of the cleaning device according to the present invention, in which the cleaning tank 2 is formed in an annular shape, and there are partition plates 21a and 21a at two adjacent locations around the circumference. 21b is provided.

この仕切板21 aには上述したと同様な液回収孔2]
 cが仕切板21 bにも上述したと同様な液供給孔2
1 dがそれぞれ穿たれ、これらがポンプ15およびフ
ィルタ16?介して管接続されている。
This partition plate 21a has a liquid recovery hole 2 similar to that described above.
C is the partition plate 21, and b is also the same liquid supply hole 2 as described above.
1d respectively, and these are the pump 15 and filter 16? Connected via pipe.

また環状に形成された洗浄槽2]の中心部には、放射状
に配列した複数のアーム31〜3n?有fる回転式搬送
装置(9)が設けられている。
Further, in the center of the annularly formed cleaning tank 2, there are a plurality of arms 31 to 3n arranged radially. A rotary transport device (9) is provided.

ここで、アーム31〜讃はその先端部に被洗浄物体7保
持する遍切な保持機構40ン有し、且つその基端部には
第4図に示てように被洗浄物体を保持したまま上下方向
に作動させる図示しない上下動装置が設けられている。
Here, each of the arms 31 to 31 has a holding mechanism 40 at its distal end for holding the object to be cleaned 7, and at its base end, it can be moved up and down while holding the object to be cleaned, as shown in FIG. A vertical movement device (not shown) that operates in the direction is provided.

しかして、洗浄槽2]内に所定の量の洗浄液ン装入し、
ポンプ15を駆動fると、この洗浄液は液回収孔2] 
cより回収され、フィルタ16の作用のもとで浄化され
た洗浄液が液供給孔21 d V通って槽内に供給され
ろ。この結果、洗浄液はB矢印方向に流動fろ。
Then, a predetermined amount of cleaning solution is charged into the cleaning tank 2,
When the pump 15 is driven, this cleaning liquid flows into the liquid recovery hole 2]
The cleaning liquid recovered from the filter 16 and purified under the action of the filter 16 is supplied into the tank through the liquid supply hole 21dV. As a result, the cleaning liquid flows in the direction of arrow B.

一方1回転式搬送装置30はA矢印方向に回動され、ア
ーム:31〜3nは洗浄槽2]の液供給側端部に到達し
たとき一旦持ち上げられ、洗浄槽21の液回収側端部に
到達したとき元の位置に下げられろ0このように、アー
ム31〜3nが持ち上げられたとき、ここに被洗浄物体
10ン保持せしめるならば。
On the other hand, the single-rotation transfer device 30 is rotated in the direction of the arrow A, and when the arms 31 to 3n reach the liquid supply side end of the cleaning tank 2, they are lifted once and moved to the liquid recovery side end of the cleaning tank 21. When the arms 31 to 3n are lifted up, the object to be cleaned 10 is held there.

被洗浄物体10は液回収孔2] cの近傍で洗浄液に浸
漬され、この状態にて洗浄槽21内を略−巡した後、液
供給孔2jνの近傍で洗浄液から引き上げられろ。
The object to be cleaned 10 is immersed in the cleaning liquid near the liquid recovery hole 2c, and after approximately circulating in the cleaning tank 21 in this state, it is pulled up from the cleaning liquid near the liquid supply hole 2jν.

かくして、第2図7用いて説明したと同様な洗浄が行な
われる。
Thus, cleaning similar to that described with reference to FIG. 2 is performed.

なお、第3図に示f如く、洗浄槽21ケ環状に形成する
ことによって、その中心部に搬送装#乞設けることがで
きるので、洗浄装置全体がコンパクトになり自動化も容
易になる。
As shown in FIG. 3, by forming the cleaning tank 21 in an annular shape, a conveying device can be provided in the center of the tank, making the entire cleaning device compact and easy to automate.

〔発明の効果〕〔Effect of the invention〕

以上の説明によって明らかな如く、本発明によれば、被
洗浄物体を浮遊異物が実質的に存在しない位置で持ち上
げることから、浮遊異物が被洗浄物体に付着でろことケ
未然に防止し得、且つ、被洗浄物体の洗浄液への出し入
れ回数?最小に留め得ろことから、被洗浄物体が空気中
の屓挨ン吸収f、5こと?防止f6対策も容易化されろ
という優れた効果が得られる。
As is clear from the above description, according to the present invention, since the object to be cleaned is lifted at a position where there are substantially no floating foreign objects, it is possible to prevent floating foreign objects from adhering to the object to be cleaned. , how many times should the object to be cleaned be put in and taken out of the cleaning solution? Since it can be kept to a minimum, the object to be cleaned absorbs dust from the air f,5? An excellent effect can be obtained in that measures to prevent f6 can be made easier.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の洗浄方法ケ説明′f石だめの説明図、第
2図は本発明の弱流液による洗浄方法どよび装置tケ説
明¥るために、これケ実施した装置の一例ン、洗浄液の
浄化循環系統と併せて洗浄槽の構成?示した断面図、巣
3図は同装置の他の構成例?示した平面図1.第4図は
この装置の部分的な動作状態?示した斜視図である。 10・・・被洗浄物体、11・・・洗浄槽、11a・−
・液回収孔。 11b・・・i供給孔、 12・・・ベルトコンベヤ、
13・・・タンク、14,15°°、゛ポンプ、16・
・・フィルタ、21・・・洗浄槽、21 c・・・液回
収孔、21d・・・液供給孔、30・・・回転式搬送装
置、 31〜3n・・・アーム、40・・・保持機構、
出願人代理人   猪  股     清第1図 第3図
Figure 1 is an explanatory diagram of a conventional cleaning method, and Figure 2 is an example of the apparatus used to explain the cleaning method and apparatus using a weak flow liquid of the present invention. , the configuration of the cleaning tank along with the cleaning fluid purification circulation system? Are the cross-sectional diagrams and nest 3 diagrams shown other configuration examples of the same device? Plan view shown 1. Figure 4 shows the partial operating state of this device? FIG. 10...Object to be cleaned, 11...Cleaning tank, 11a.-
・Liquid recovery hole. 11b...i supply hole, 12...belt conveyor,
13... Tank, 14, 15°°, ゛Pump, 16.
...Filter, 21...Cleaning tank, 21c...Liquid collection hole, 21d...Liquid supply hole, 30...Rotary transfer device, 31-3n...Arm, 40...Holding mechanism,
Applicant's agent Kiyoshi Inomata Figure 1 Figure 3

Claims (1)

【特許請求の範囲】 1、洗浄槽内の洗浄液?緩やかに流動させ、被洗浄物体
を洗浄液の下流側で浸漬し、この被洗浄物体を洗浄液に
浸漬した状態で、この洗浄液の流下方向とは反対方向に
移動させながら洗浄し、前記洗浄物体を洗浄液の上流側
で引上げることを、特徴とする弱流液による洗浄方法。 2、水平方向に細長く形成され、内部に洗浄液ン貯え得
る洗浄槽と、この洗浄槽内に貯えられる洗浄gを、槽内
の一端部より回収して浄化てるとともに槽内の他端部に
供給f7)ことにより。 浄化された洗浄液を槽の長手方向に流動させる浄化循環
装置と、被洗浄物体を保持し、且つ、この被洗浄物体乞
前記洗浄槽内の洗浄液に浸漬させた状態で、洗浄液の流
下方法とは反対の方向に移動させる搬送装+tとン具備
したこと乞特徴とてる弱流液による洗浄装置。 3、前記洗浄′Mン環状に形成したことを特徴とする特
許請求の範囲第2項記載の弱流液による洗浄装置。
[Claims] 1. Cleaning liquid in the cleaning tank? The object to be cleaned is immersed on the downstream side of the cleaning liquid by gently flowing the cleaning liquid, and while the object to be cleaned is immersed in the cleaning liquid, the object to be cleaned is cleaned while being moved in the opposite direction to the flowing direction of the cleaning liquid, and the object to be cleaned is immersed in the cleaning liquid. A cleaning method using a weak flow liquid, which is characterized by pulling up on the upstream side of the liquid. 2. A cleaning tank that is elongated in the horizontal direction and can store cleaning liquid inside, and the cleaning liquid stored in this cleaning tank is collected from one end of the tank, purified, and supplied to the other end of the tank. f7) By. What is a purifying circulation device for flowing purified cleaning liquid in the longitudinal direction of a tank, and a method for holding an object to be cleaned and flowing down the cleaning liquid while the object to be cleaned is immersed in the cleaning liquid in the cleaning tank? A washing device using a weak flow liquid is equipped with a conveying device for moving in the opposite direction. 3. A cleaning device using a weak flow liquid according to claim 2, wherein the cleaning device is formed in an annular shape.
JP22805382A 1982-12-28 1982-12-28 Cleaning by slowly flowing liquid and equipment of the same Pending JPS59121938A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22805382A JPS59121938A (en) 1982-12-28 1982-12-28 Cleaning by slowly flowing liquid and equipment of the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22805382A JPS59121938A (en) 1982-12-28 1982-12-28 Cleaning by slowly flowing liquid and equipment of the same

Publications (1)

Publication Number Publication Date
JPS59121938A true JPS59121938A (en) 1984-07-14

Family

ID=16870455

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22805382A Pending JPS59121938A (en) 1982-12-28 1982-12-28 Cleaning by slowly flowing liquid and equipment of the same

Country Status (1)

Country Link
JP (1) JPS59121938A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0228786U (en) * 1988-08-12 1990-02-23
JPH02172580A (en) * 1988-12-23 1990-07-04 Alps Electric Co Ltd Flowing water type washing apparatus
JPH04171933A (en) * 1990-11-06 1992-06-19 Matsushita Electric Ind Co Ltd Semiconductor substrate washing equipment
JPH06280323A (en) * 1993-03-30 1994-10-04 Natl House Ind Co Ltd External wall
JPH0743348A (en) * 1993-07-30 1995-02-14 Marktec Corp Wet magnetic powder flaw detection testing method and removing device for surplus magnetic powder used for it
WO1999045574A1 (en) * 1998-03-02 1999-09-10 Mostafa Sabet Method for changing a processing medium contained in a processing tank and system for carrying out the method
WO2007063746A1 (en) * 2005-11-30 2007-06-07 Tokyo Electron Limited Cleaning apparatus and method of cleaning
CN105013739A (en) * 2015-06-24 2015-11-04 江苏华尚汽车玻璃工业有限公司 Washing technology of original automobile glass sheets

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0228786U (en) * 1988-08-12 1990-02-23
JPH02172580A (en) * 1988-12-23 1990-07-04 Alps Electric Co Ltd Flowing water type washing apparatus
JPH04171933A (en) * 1990-11-06 1992-06-19 Matsushita Electric Ind Co Ltd Semiconductor substrate washing equipment
JPH06280323A (en) * 1993-03-30 1994-10-04 Natl House Ind Co Ltd External wall
JPH0743348A (en) * 1993-07-30 1995-02-14 Marktec Corp Wet magnetic powder flaw detection testing method and removing device for surplus magnetic powder used for it
WO1999045574A1 (en) * 1998-03-02 1999-09-10 Mostafa Sabet Method for changing a processing medium contained in a processing tank and system for carrying out the method
WO2007063746A1 (en) * 2005-11-30 2007-06-07 Tokyo Electron Limited Cleaning apparatus and method of cleaning
CN105013739A (en) * 2015-06-24 2015-11-04 江苏华尚汽车玻璃工业有限公司 Washing technology of original automobile glass sheets

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