JP2003053286A - Cleaning apparatus for drum substrate for photosensor - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a cleaning apparatus which can efficiently clean a drum substrate with a flowing cleaning liquid and which does not cause separated dirt to reattach to the drum substrate. SOLUTION: A degreasing treatment section 1 for degreasing a drum substrate D, a first rinse treatment section 2 for rinsing, a scrub treatment section 3 for scrub cleaning with a brush, and a second rinse treatment section 4 for rinsing are installed so that a drum substrate is cleaned in a flowing cleaning liquid by immersing the drum substrate D horizontally in cleaning liquids 11, 31 horizontally flowing in cleaning vessels 10 and 30.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning device for performing degreasing cleaning, scrub cleaning, etc. on a drum base material used for a photoconductor such as a copying machine or a printer.

[0002]

2. Description of the Related Art Drum-shaped photoconductors used in copying machines, printers, etc. are usually coated with a film for sensitization on the surface of a cylindrical drum substrate produced by extrusion molding or impact molding of aluminum. Although it is formed by installing it, since cutting oil, cutting chips, etc. are attached to the manufactured drum base material, these cutting oil, cutting chips, etc. must be removed before installing the photosensitive coating film. Must be removed by washing.

As a technique for cleaning such a drum base material as described above, there are conventional techniques such as JP-A-6-89033, JP-A-6-27687, and JP-A-2000-1810.
The techniques described in Japanese Patent Publication No. 90, Japanese Patent Application Laid-Open No. 2000-292943, and the like are known. These cleaning techniques
The drum base material is loaded vertically into the cleaning tank and washed with a brush while showering, or it is cleaned with a brush, ultrasonic waves or bubbling while immersed in the cleaning liquid. .

However, in this way, in the method of cleaning the drum base material with the brush while showering, the dirt dropped from the drum base material is not completely washed off by the shower cleaning liquid alone, but remains attached to the brush. It has the drawback that it tends to redeposit on the drum substrate.

On the other hand, also in the method of cleaning by immersing the drum base material in the cleaning liquid housed in the cleaning tank, the dirt dropped from the drum base material remains in the cleaning liquid as it is, and it directly adheres to the drum base material. It is easy to reattach, or once attached to the brush and then reattached to the drum substrate. There is also a method of cleaning by immersing the drum base material in the cleaning liquid that overflows from the cleaning tank. However, in such an overflow method, all the cleaning liquid rising in the cleaning tank overflows and flows out of the cleaning tank. Instead, only a part of the ascending flow overflows and the rest descends again in the tank, so that a circulating flow of the cleaning liquid is always generated. For this reason, the dirt circulates in the tank by riding on this circulating flow and is easily reattached to the brush and the drum.

[0006]

The technical problem of the present invention is that the drum base material can be easily and surely cleaned by the flowing cleaning liquid, and there is no risk that the dropped dirt will reattach to the drum base material. , To provide a cleaning device having excellent cleaning efficiency.

[0007]

In order to solve the above problems, according to the present invention, a degreasing treatment section for degreasing and cleaning a drum base material as an object to be treated, and a rinsing treatment for the degreased drum base material. A first rinsing unit for performing a scrubbing, a scrubbing unit for scrubbing the drum substrate rinsed by the first rinsing unit with a brush, and a rinsing process for the scrubbed drum substrate. Second to give
It has a rinse treatment section and a drying treatment section for performing a drying treatment on the drum substrate that has been rinsed in the second rinse treatment section, and the degreasing treatment section and the first and second rinse treatment sections are provided. , A washing tank for flowing the washing liquid sideways,
The scrubbing section has a supporting means for laterally supporting the drum base material immersed in the cleaning liquid in the cleaning tank, and an ultrasonic wave means for projecting ultrasonic waves into the cleaning liquid, and the scrubbing section supplies the cleaning liquid. It consists of a washing tank for flowing sideways, and a supporting roller and a washing brush installed horizontally and in parallel in this washing tank at intervals smaller than the diameter of the drum base material. An apparatus for cleaning a drum base material for a photoconductor is provided, which comprises: at least one cleaning unit configured to clean the drum base material mounted on the substrate while being driven to rotate in the cleaning liquid. .

As described above, according to the present invention, the degreasing processing section, the scrubbing processing section, and the first and second rinse processing sections respectively perform the cleaning processing with the drum base material being immersed in the laterally flowing cleaning liquid. Since it is configured to do so, dirt can be efficiently removed by the flow of the cleaning liquid,
Moreover, the dirt that has fallen off the drum base material does not get on the flow of the cleaning liquid and is quickly discharged together with the cleaning liquid from the downstream side, and does not stay in the cleaning tank and reattach to the drum base material.

Further, in the scrubbing section, the drum base material is simply placed sideways on the supporting roller and the cleaning brush which are horizontally and parallelly arranged in the cleaning tank, and the supporting roller and the cleaning roller are cleaned. The drum base material is automatically driven by the rotation of the brush and rubbed against the cleaning brush for scrub cleaning. Therefore, it is not necessary to forcibly rotate the drum base material while it is clamped by the clamping means. It is possible to scrub and clean the drum base material reliably and efficiently.

According to a specific embodiment of the present invention, the degreasing processing section and the first and second rinsing processing sections respectively hold the drum base material in parallel with the flow of the cleaning liquid for processing. Is configured.

In the present invention, preferably, the supporting means in the degreasing processing section and the first and second rinsing processing sections each comprise a pair of rotationally driven supporting rollers, and the mounted drum base. That is, the material is configured to be rotated while being driven.

According to another specific embodiment of the present invention,
The drying processing section has a warm pure water tank in which warm pure water is stored, and is configured to be heated and dried by immersing the drum base material in the warm pure water and then pulling it up.

According to another preferred embodiment of the present invention,
The scrubbing section has a plurality of cleaning means arranged along the flow of the cleaning liquid, and the drum base material is cleaned while being sequentially transported from the downstream side cleaning means to the upstream side cleaning means. Is configured.

[0014]

BEST MODE FOR CARRYING OUT THE INVENTION Preferred embodiments of a drum substrate cleaning apparatus according to the present invention will be described in detail below with reference to the drawings. FIG. 1 schematically shows the overall structure of a cleaning device. The cleaning device is a drum substrate D which is an object to be processed.
Degreasing treatment section 1 for degreasing and cleaning, first rinsing treatment section 2 for rinsing degreased drum base material D, and drum substrate rinsing-processed by this first rinsing treatment section 2 A scrubbing section 3 for scrubbing D with a brush, a second rinse section 4 for rinsing the scrubbed drum substrate D, and a second scrubbing section 4.
A cleaning processing unit 5 for performing a drying processing on the drum base material D that has been rinsed by the rinsing processing unit 4 is installed side by side in order to form one cleaning line, and the drum substrate is arranged along this cleaning line. Material D is clamped by means 6A-6
The processing described above is performed in order while sequentially feeding each one by F. In the figure, 7 and 8 are conveyors respectively arranged on the inlet side and the outlet side of the cleaning line.

The degreasing unit 1 removes oil and fat components such as cutting oil adhering to the drum base material D with a cleaning liquid composed of an organic solvent, pure water type cleaning agent, etc. As can be seen, a flow-type cleaning tank 10 in which the cleaning liquid 11 is caused to flow sideways, a supporting means 12 for supporting the drum base material D in the cleaning tank 10 in a lateral direction while being immersed therein, The cleaning liquid 11 has ultrasonic means 13 for projecting ultrasonic waves.

The cleaning tank 10 is in the shape of a square groove having a flat bottom surface, has a liquid supply portion 16 for supplying the cleaning liquid 11 at one end, and discharges the cleaning liquid 11 at the other end. A drainage part 17 is provided so that the cleaning liquid 11 can continuously flow laterally from the liquid supply part 16 toward the drainage part 17. The liquid supply unit 16 and the liquid discharge unit 17 are arranged on both sides of the cleaning line so that the cleaning liquid flows in the direction intersecting with the cleaning line.

In order to make the flow of the cleaning liquid 11 substantially uniform over the entire liquid depth, the liquid supply unit 16 and the liquid discharge unit 17 are made of porous plates such as perforated plates and fiber plates. 18 and 19 are provided, respectively. Among these, the rectification mechanism 18 on the liquid supply unit 16 side is formed by a plurality of fiber plates or perforated plates having different porosities, and the cleaning liquid 11 is supplied through these plates in a pressurized state so that the total liquid depth is increased. A nearly uniform flow velocity for is obtained.

On the other hand, the rectifying mechanism 19 on the side of the drainage unit 17 is formed by a metal perforated plate having a large number of water passage holes 19a formed therein, and a part of the cleaning liquid 11 overflows at the upper end of the perforated plate. The remaining portion is arranged so as to flow out to the drainage portion 17 through the water passage hole 19a.

Although a fresh cleaning liquid may be constantly supplied to the liquid supply unit 16 from a supply source, the liquid supply unit 16 and the drainage unit 1
7, a tank 21 having a cleaning liquid purification function, and
A liquid supply mechanism 20 including a pump 22 for supplying the cleaning liquid 11 in the tank 21 to the liquid supply unit 16 and a filter 23 for removing foreign matter in the cleaning liquid 11 is connected to the used cleaning liquid 11 It can also be reused in a circulating manner by recovering and purifying the liquid from the drainage unit 17 and then supplying it from the liquid supply unit 16.

The supporting means 12 is provided with a pair of supporting rollers 26, 26 for supporting and rotating the drum base material D in parallel and laterally with the liquid flow. These supporting rollers 26, 26 are formed of sponge in a columnar shape, and are arranged at substantially the same height horizontally and parallel to each other with their axes oriented parallel to the liquid flow at the position where they are immersed in the cleaning liquid 11. It is installed and connected to a drive source (not shown) installed outside the tank. The drive source is driven and rotated in the same rotation direction at required rotation speeds. These support rollers 26, 26 are formed to be slightly longer than the length of the drum substrate D to be cleaned,
Further, the installation interval between them is set smaller than the diameter of the drum base material D.

The degreasing processing section 1 includes an inlet side conveyor 7
Clamping means 6A for supplying the upper drum base material D to the degreasing treatment section 1 is provided. The clamp means 6A has a pair of clamp arms 28, 28 located on both sides of the drum base material D in the axial direction. These clamp arms 28, 28 are movable up and down by a drive mechanism (not shown), and are movable in a direction in which they approach and separate from each other. A locking member 29 that clamps the drum base material D by fitting and locking the same is attached. The locking member 29 is formed by a cross-shaped claw 29a, and these claws 2 are formed on the inner end surface of the drum base material D.
9a is in point contact. In this case, in order to make it easier to fit the locking member 29 to the end portion of the drum base material D and also to clamp the drum base materials D having different diameters, the entire pawl is gradually tapered so as to be tapered. It is preferable that the claws 29a are formed in a shape such that the outer circumference of each claw 29a is on a hemispherical surface or a semi-elliptical surface as illustrated.

However, the form of the locking member 29 is not limited to this, and the inside of the drum base material D such as a Y-shaped claw, a simple thin rod or a hook. Any form may be used as long as it can be fitted and locked to the. Alternatively, the locking member 29 may be formed by a plurality of openable / closable claws, and the inner peripheral surface of the drum substrate D may be clamped or released by opening / closing these claws.

Now, when the drum base material D on the inlet side conveyor 7 is supplied to the degreasing treatment section 1 by the clamp means 6A and is placed on the support rollers 26, 26, these support rollers 26, 26 are provided. Are driven and rotated at the same rotational speed in the same rotational direction, and ultrasonic waves are projected from the ultrasonic means 13 into the cleaning liquid 11. Then, the drum base material D is driven to rotate in the direction of the arrow while being immersed in the laterally flowing cleaning liquid 11, and is efficiently contacted with new cleaning liquid to be efficiently degreased by the action of ultrasonic waves. At this time, since the drum base material D is oriented parallel to the flow of the cleaning liquid 11, not only the outer peripheral surface but also the inner peripheral surface of the drum base material D is efficiently treated by the flow of the cleaning liquid. Further, the oil content dropped from the drum base material D is quickly sent to the downstream side along with the flow of the cleaning liquid 11 and is discharged from the drainage unit 17, so that it does not stay in the cleaning tank 10 and therefore the drum. It does not redeposit on the substrate D.
As the ultrasonic wave means 13, in order to prevent the drum base material D made of aluminum from being damaged, for example, emphasized wave ultrasonic wave of about 80 KHz is preferably used.

Further, the drum base material D is clamped by the clamping means 6
When the drum base material D is placed on the support rollers 26, 26 by A, the cleaning liquid 11 is held with the drum base material D held horizontally.
Although it may be dipped therein, in order to dip the cleaning liquid 11 smoothly without disturbing the flow of the cleaning liquid 11, the drum base material D should be tilted about 20 to 30 degrees in the axial direction. Is desirable.

The drum base material D which has been degreased is
Clamping means 6 arranged near the first rinse processing section 2
B is sent to the first rinse processing unit 2. On the other hand, to the degreasing processing section 1 from which the drum base material D has been taken out, a new drum base material D is supplied from the inlet side conveyor 7 by the clamp means 6A. When the drum base material D is taken out from the cleaning liquid 11 as described above, it is desirable that the drum base material D is taken out by the clamp means 6 while being slightly tilted in the axial direction, whereby the drum base material D is taken out. The cleaning liquid inside D can be quickly discharged. In addition, the clamp means 6B to 6F
Has the same structure as the clamp means 6A.

The first rinsing unit 2 is for rinsing the degreased drum base material D with a cleaning liquid such as a cleaning agent containing oil. The degreasing unit 1 is used as a cleaning liquid. Except that the structure and processing method of the device are substantially the same. Therefore, the description is omitted to avoid duplication.

The drum base material D which has been rinsed
Is sent to the scrubbing section 3 by the clamp means 6C. On the other hand, the first material from which the drum base material D has been taken out
The drum material D is supplied to the rinse processing section 2 from the degreasing processing section 1 by the clamping means 6B, and similarly, the degreasing processing section 1 is provided with a new drum base material from the inlet side conveyor 7 by the clamping means 6A. D is supplied.

As shown in FIG. 6, the scrubbing section 3 includes a cleaning tank 30 for flowing the cleaning liquid 31 in a lateral direction, and a drum base D contained in the cleaning liquid 31 disposed in the cleaning tank 30. A plurality of cleaning means 32 for performing scrub cleaning
A to 32C and ultrasonic means 33 for projecting ultrasonic waves to the cleaning liquid 31 are provided.

The cleaning tank 30 is in the form of a square groove having a flat bottom surface, has a liquid supply portion 16 for supplying the cleaning liquid 31 at one end, and discharges the cleaning liquid 31 at the other end. A drainage part 17 is provided, and the cleaning liquid 31 flows laterally continuously from the liquid supply part 16 toward the drainage part 17. Compared with the cleaning tank 10 in the degreasing processing unit 1, the cleaning tank 30 has a longer tank length because of the plurality of cleaning means 32, and the cleaning liquid 31 has a cleaning line. Since the basic configuration is substantially the same except that it is installed so as to flow in the direction along, the same components as those of the cleaning tank 30 are designated by the same reference numerals and the description thereof will be omitted. .

On the other hand, the cleaning means 32A to 32C are composed of a support roller 35 and a cleaning brush 36 for supporting the drum base material D immersed in the cleaning liquid 31 and scrub cleaning while rotating the drum base material D. The support roller 35 and the cleaning brush 36 are both formed of sponge in a columnar shape, and have substantially the same height at the position where they are immersed in the cleaning liquid 31, with their respective axes extending in the direction orthogonal to the liquid flow. Are arranged horizontally and parallel to each other, and are connected to a drive source (not shown) installed outside the tank. The drive source is driven and rotated in the same rotation direction at required rotation speeds. The support roller 35 and the cleaning brush 36 are formed to be slightly longer than the length of the drum base material D to be cleaned, and the installation interval between them is set to be smaller than the diameter of the drum base material D. In this case, in order to increase the surface pressure of the cleaning brush 36 with respect to the drum base material D during cleaning as much as possible, the gap between the support roller 35 and the cleaning brush 36 should be made as large as possible so that the drum base material D is placed between them. It is desirable that the cleaning brush 36 is brought into contact with the cleaning brush 36 with a certain degree of depression.

It should be noted that the diameter relationship between the support roller 35 and the cleaning brush 36 does not matter, but in the illustrated embodiment, the cleaning brush 36 has a larger diameter than the support roller 35. The cleaning brush 36 is not limited to a sponge, and a fiber cleaning brush 3 formed by implanting fibers such as rayon in a columnar shape on the outer periphery of the core material.
It may be 6.

Then, the drum base material D is supplied to the downstream first cleaning means 32A by the clamp means 6C,
When the support roller 35 and the cleaning brush 36 are placed sideways and parallel to each other, the support roller 35 and the cleaning brush 36 are driven and rotated in the same direction at different speeds. Then, the drum base material D is driven to rotate at a speed different from that of the cleaning brush 36 due to the frictional force between the drum base material D and the cleaning brush 36, and the cleaning brush 36 scrubs the outer peripheral surface thereof. According to the experiment, when the support roller 35 is rotated at 10 rpm and the cleaning brush 36 is rotated at 144 rpm, when the cleaning brush 36 is made of sponge, the drum base material D is driven to rotate at about 20 rpm, and the cleaning brush 36 is rotated. It was found that the drum base material D was driven to rotate at about 5 rpm, and the drum base material D was efficiently cleaned by the cleaning brush 36 in any case.

The scrub cleaning of the drum base material D is carried out in a state of being completely immersed in the cleaning liquid 31 flowing in a lateral direction, and during the cleaning, the cleaning liquid 31 may be washed by the ultrasonic wave means 33 if necessary. Ultrasonic waves are projected. Then, the dirt dropped from the drum base material D rides on the flow of the cleaning liquid 31 and is promptly discharged from the liquid draining unit 17, and the cleaning tank 30.
Since it does not stay inside, it does not reattach to the drum base material D or the cleaning brush 36 and contaminate the drum base material D.

When the scrub cleaning by the first cleaning means 32A is completed, the drum base material D is sent to the second cleaning means 32B on the upstream side by the clamping means 6C and similarly scrub cleaned, and further upstream side. Third cleaning means 32 at
Cleaning means 32B, 3 from the downstream side cleaning means 32A to the upstream side, such as being sent to C for scrub cleaning.
The scrubbing is carried out sequentially while being sequentially transferred to 2C. When the drum base material D is supplied to or removed from the cleaning means 32A to 32C, it is desirable that the drum base material D is slightly tilted in the axial direction in the case of other processing units. Is the same as. Alternatively, the drum base material D
From the downstream cleaning means 32A to the upstream cleaning means 32
In the case of sequentially feeding to B and 32C, the drum base material D can be moved while being immersed in the liquid, and in this case, the drum base material D does not need to be particularly inclined.

Cleaning brush 36 for the drum base material D
If the surface pressure is low, the surface pressure adjusting means can adjust the surface pressure to a required level. This surface pressure adjusting means can be formed by, for example, a cylindrical weight 37 as shown by a chain line in FIG. 6, and the weight 37 may be housed inside the drum base material D. In this case, this weight 3
The inner peripheral surface of the drum base material D can be cleaned by making 7 rotatable and forming a cleaning brush made of sponge or fiber on the outer periphery thereof.

FIG. 7 shows another example of the surface pressure adjusting means. This surface pressure adjusting means has a function of the locking member 29 in the clamp means 6C, and the locking member 29 is provided with the long holes 3 of the clamp arms 28, 28.
9 is supported via a sliding member 40 so as to be movable in the vertical direction and is also supported by the sliding member 40 so as to be rotatable, and the drum base material D clamped by the locking member 29 is supported. After being placed on the roller 35 and the cleaning brush 36, when the clamp arms 28, 28 are further lowered as shown by the chain line in FIG.
Has a free relationship in the vertical direction with respect to the clamp arms 28, 28, and the weight of the locking member 29 acts on the drum base material D. In this case, it is desirable that the locking member 29 can be arbitrarily adjusted in weight by attaching and removing a necessary weight. When the surface pressure is adjusted at the positions of the three cleaning means 32A to 32C, the clamping means may be provided correspondingly.

The drum base material D, which has been scrub-cleaned by the third cleaning means 32C, is sent to the second rinse processing section 4 by the clamp means 6D arranged at the position of the second rinse processing section 4. This second rinse processing unit 4
Is for performing a final cleaning on the drum base material D using pure water, and has the cleaning tanks 10 and 10 installed in two stages before and after,
The drum base material D is sequentially fed between the cleaning tanks 10 and 10 by the clamp means 6E to perform a two-step rinsing process. Each of these cleaning tanks 10 has the same configuration, and their configurations and processing methods are substantially the same except that the cleaning liquid used is different from that of the degreasing treatment section 1. Therefore, the description thereof is omitted to avoid duplication.

The drum base material D that has been rinsed in the second rinse processing section 4 is sent to the drying processing section 5 by the clamp means 6F. This drying processing unit 5 is
As shown in FIG. 8, a warm pure water tank 42 containing warm pure water 43 kept at a predetermined temperature is provided, and the drum base material D is immersed in the warm pure water 43 for a certain period of time to raise the temperature. Then, by pulling it up, it is a system of warm heat drying utilizing its own heat. The warm pure water tank 42 is
A collection groove 44 for collecting hot pure water that has overflowed and a suction unit 45 for sucking and exhausting water vapor evaporated from the water surface are provided on the outer periphery of the upper end portion.

The operation of immersing or pulling up the drum base material D in hot pure water is performed by the clamp means 6F. At this time, as shown in the drawing, the drum base material D is tilted by 20 to 30 degrees. It is desirable that the hot pure water 43 be put into and taken out of the drum base material D without wavy, and the hot pure water inside the drum base material D can be quickly discharged and dried in a short time.

The drum base material D which has been subjected to the drying treatment in the drying treatment section 5 is taken out onto the exit side conveyor 8 by the clamping means 6F and sent to the next step. In the drying processing section 5, other drying means such as warm air drying may be combined with the above hot pure water drying, or other drying means such as warm air drying instead of hot pure water drying. Can also be used.

In the above-described embodiment, the processing is carried out in the processing units 1 to 4 other than the drying processing unit 5 while the drum base material D is completely immersed in the cleaning liquid. As shown in FIG. 5, the drum base material D may be processed while being semi-immersed in the cleaning liquid 47. In this case, a nozzle 48 for spraying the cleaning liquid 47 is provided on the drum base material D, and the cleaning liquid is supplied from the nozzle 48 to the upper half portion of the drum base material D exposed from the cleaning liquid 47 by a shower ring. It is desirable to do so.

Further, in the illustrated embodiment, the scrubbing section 3 is provided with a plurality of cleaning means 32, but the cleaning means 32 may be one, and the support roller 35 and the cleaning brush 36. Can also be installed with their axes parallel to the liquid flow. When the support roller 35 and the cleaning brush 36 are directed parallel to the liquid flow in this way, the scrubbing section 3 and the other degreasing section 1 and the first and second rinse sections 3 and 4 are The direction of the liquid flow can be aligned with the direction orthogonal to the cleaning line or the direction along the cleaning line. For example, in the scrubbing unit 3 shown in FIG. 1, the directions of the support roller 35 and the cleaning brush 36 may be the same, and the liquid flow direction may be the same as that of the other processing units 1, 2, 4.

Further, the degreasing processing section 1 and the first rinsing processing section 2 are provided with one processing tank, and the second rinsing processing section 4 is provided with two processing tanks. The number of processing tanks in the processing section is not limited to this, and one or a plurality of processing tanks are selectively provided depending on the type of the drum base material D, processing conditions, and the like.

[0044]

As described above, according to the present invention, the drum base material can be easily and surely cleaned by the laterally flowing cleaning liquid, and the dirt that has fallen off can be quickly discharged on the cleaning liquid flow. As a result, it is possible to reliably prevent re-adhesion to the drum base material, resulting in excellent cleaning efficiency.

[Brief description of drawings]

FIG. 1 is a plan view showing the overall configuration of a cleaning device according to the present invention.

FIG. 2 is a partially enlarged view of the cleaning device of FIG.

3 is a cross-sectional view taken along the line AA in FIG.

4 is a cross-sectional view taken along the line BB in FIG.

FIG. 5 is a cross-sectional view showing an aspect of clamping a drum base material.

FIG. 6 is an enlarged sectional view of a scrubbing section.

FIG. 7 is a cross-sectional view showing a different configuration example of the clamp means.

FIG. 8 is an enlarged cross-sectional view of a drying processing unit.

FIG. 9 is a main-portion cross-sectional view showing a different configuration example of each processing unit.

[Explanation of symbols]

D drum base material 1 Degreasing treatment tank 2 First rinse processing section 3 scrubbing department 4 Second rinse processing section 5 Drying processing section 10,30 cleaning tank 11,31 cleaning solution 12 Supporting means 13,33 Ultrasonic means 26 Support roller 32A to 32C cleaning means 35 Support roller 36 cleaning brush 42 warm pure water tank 43 warm pure water

─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. ⁷ Identification code FI theme code (reference) G03G 5/00 101 G03G 5/00 101 5/10 5/10 BF term (reference) 2H068 AA54 EA07 3B116 AA41 AB01 AB33 BA02 BA14 BB03 BB22 BB82 BB83 BB87 CC01 CC03 CD11 CD22 3B201 AA41 AB01 AB33 BA02 BA14 BB03 BB22 BB82 BB83 BB87 BB92 BB93 BB95 CC01 CC11 CD11 CD22

Claims (5)

[Claims] 1. A degreasing treatment section for degreasing and cleaning a drum base material which is an object to be treated, a first rinsing treatment section for rinsing a degreased drum base material, and this first rinsing treatment. Scrubbing section for scrubbing the drum base material that has been rinsed by the brush with a brush, a second rinse processing section for performing a rinse treatment on the scrubbed drum base material, and a second rinse processing section And a first and a second rinsing processing section, respectively, for cleaning the drum base material that has been rinsed by the method described above. A scrubbing section, a tank, a supporting means for laterally supporting the drum base material in the cleaning solution immersed in the cleaning solution, and an ultrasonic means for projecting ultrasonic waves into the cleaning solution. , Wash solution sideways It consists of a cleaning tank for flushing, a support roller and a cleaning brush installed in the cleaning tank horizontally and in parallel at a distance smaller than the diameter of the drum substrate. And at least one cleaning unit configured to clean the drum substrate placed on the substrate while being driven to rotate in the cleaning liquid. 2. The degreasing processing section and the first and second rinsing processing sections are respectively configured to hold and process the drum base material in parallel with the flow of the cleaning liquid. The cleaning device according to claim 1. 3. The supporting means in the degreasing processing section and the first and second rinse processing sections each comprise a pair of supporting rollers which are rotationally driven, and the mounted drum base material is provided with these supporting rollers. The cleaning device according to claim 1 or 2, wherein the cleaning device is configured to perform processing while being rotated by the rotation of the support roller. 4. The drying treatment section has a warm pure water tank in which warm pure water is stored, and is configured so that the drum base material is dipped in the warm pure water and then pulled up to be heated and dried. The cleaning device according to any one of claims 1 to 3, which is characterized. 5. The scrubbing section has a plurality of cleaning means arranged along the flow of the cleaning liquid, and the drum base material is sequentially cleaned from the downstream cleaning means to the upstream cleaning means. The cleaning device according to any one of claims 1 to 4, wherein the cleaning device is configured to be cleaned while being transported.