JPS59122922A - 半導体ウエハの吸着度測定装置 - Google Patents
半導体ウエハの吸着度測定装置Info
- Publication number
- JPS59122922A JPS59122922A JP23456582A JP23456582A JPS59122922A JP S59122922 A JPS59122922 A JP S59122922A JP 23456582 A JP23456582 A JP 23456582A JP 23456582 A JP23456582 A JP 23456582A JP S59122922 A JPS59122922 A JP S59122922A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor wafer
- sample
- sucking
- pressure sensor
- degree
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L5/00—Apparatus for, or methods of, measuring force, work, mechanical power, or torque, specially adapted for specific purposes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L5/00—Apparatus for, or methods of, measuring force, work, mechanical power, or torque, specially adapted for specific purposes
- G01L5/0061—Force sensors associated with industrial machines or actuators
- G01L5/0076—Force sensors associated with manufacturing machines
- G01L5/009—Force sensors associated with material gripping devices
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Force Measurement Appropriate To Specific Purposes (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23456582A JPS59122922A (ja) | 1982-12-28 | 1982-12-28 | 半導体ウエハの吸着度測定装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23456582A JPS59122922A (ja) | 1982-12-28 | 1982-12-28 | 半導体ウエハの吸着度測定装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59122922A true JPS59122922A (ja) | 1984-07-16 |
| JPH0368330B2 JPH0368330B2 (enrdf_load_stackoverflow) | 1991-10-28 |
Family
ID=16973002
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23456582A Granted JPS59122922A (ja) | 1982-12-28 | 1982-12-28 | 半導体ウエハの吸着度測定装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59122922A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04206546A (ja) * | 1990-11-30 | 1992-07-28 | Hitachi Ltd | プラズマ処理方法および装置 |
| JPH0922899A (ja) * | 1995-05-02 | 1997-01-21 | Nissin Electric Co Ltd | 真空処理装置及び該装置により目的処理物を得る方法 |
| KR101362673B1 (ko) * | 2006-11-03 | 2014-02-12 | 엘아이지에이디피 주식회사 | 정전력 측정장치 및 이를 이용한 정전력 측정방법 |
-
1982
- 1982-12-28 JP JP23456582A patent/JPS59122922A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04206546A (ja) * | 1990-11-30 | 1992-07-28 | Hitachi Ltd | プラズマ処理方法および装置 |
| JPH0922899A (ja) * | 1995-05-02 | 1997-01-21 | Nissin Electric Co Ltd | 真空処理装置及び該装置により目的処理物を得る方法 |
| KR101362673B1 (ko) * | 2006-11-03 | 2014-02-12 | 엘아이지에이디피 주식회사 | 정전력 측정장치 및 이를 이용한 정전력 측정방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0368330B2 (enrdf_load_stackoverflow) | 1991-10-28 |
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