JPS59119047U - High power high frequency transistor - Google Patents

High power high frequency transistor

Info

Publication number
JPS59119047U
JPS59119047U JP1379483U JP1379483U JPS59119047U JP S59119047 U JPS59119047 U JP S59119047U JP 1379483 U JP1379483 U JP 1379483U JP 1379483 U JP1379483 U JP 1379483U JP S59119047 U JPS59119047 U JP S59119047U
Authority
JP
Japan
Prior art keywords
region
drain
frequency transistor
high concentration
high frequency
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1379483U
Other languages
Japanese (ja)
Inventor
滝野 孝則
Original Assignee
シャープ株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by シャープ株式会社 filed Critical シャープ株式会社
Priority to JP1379483U priority Critical patent/JPS59119047U/en
Publication of JPS59119047U publication Critical patent/JPS59119047U/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

−第1図は従来装置の断面図、第2図は本考案による一
実施例の断面図である。 1:p型半導体基板、2:n+ソース領域、4ニドリフ
ト領域、6:ゲート電極、QHn+ドレイン領域、10
:絶縁物層、11:n−堆積層。
- Fig. 1 is a sectional view of a conventional device, and Fig. 2 is a sectional view of an embodiment of the present invention. 1: p-type semiconductor substrate, 2: n+ source region, 4 drift region, 6: gate electrode, QHn+ drain region, 10
: insulator layer, 11: n-deposition layer.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] ゲート電極下の基板とドレイン高濃度領域との間に、ド
レイン高濃度領域と同一導電型の不純物を低濃度に拡散
したドリフト領域を備えてなる電界効果トランジスタに
おいて、ドレイン高濃度領域を囲むドリフト領域の一部
を含んで、ドレイン領域下の基板との間に絶縁物を介在
してなる高出力高周波トランジスタ。
In a field effect transistor comprising a drift region in which impurities of the same conductivity type as the drain high concentration region are diffused at a low concentration between the substrate under the gate electrode and the drain high concentration region, the drift region surrounding the drain high concentration region A high-power, high-frequency transistor with an insulator interposed between it and the substrate below the drain region.
JP1379483U 1983-01-31 1983-01-31 High power high frequency transistor Pending JPS59119047U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1379483U JPS59119047U (en) 1983-01-31 1983-01-31 High power high frequency transistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1379483U JPS59119047U (en) 1983-01-31 1983-01-31 High power high frequency transistor

Publications (1)

Publication Number Publication Date
JPS59119047U true JPS59119047U (en) 1984-08-11

Family

ID=30145171

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1379483U Pending JPS59119047U (en) 1983-01-31 1983-01-31 High power high frequency transistor

Country Status (1)

Country Link
JP (1) JPS59119047U (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49100979A (en) * 1973-01-31 1974-09-24
JPS55148464A (en) * 1979-05-08 1980-11-19 Chiyou Lsi Gijutsu Kenkyu Kumiai Mos semiconductor device and its manufacture

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49100979A (en) * 1973-01-31 1974-09-24
JPS55148464A (en) * 1979-05-08 1980-11-19 Chiyou Lsi Gijutsu Kenkyu Kumiai Mos semiconductor device and its manufacture

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