JPS59115739A - 反応装置 - Google Patents

反応装置

Info

Publication number
JPS59115739A
JPS59115739A JP22394582A JP22394582A JPS59115739A JP S59115739 A JPS59115739 A JP S59115739A JP 22394582 A JP22394582 A JP 22394582A JP 22394582 A JP22394582 A JP 22394582A JP S59115739 A JPS59115739 A JP S59115739A
Authority
JP
Japan
Prior art keywords
reaction
wall material
reaction chamber
reflective film
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22394582A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0317770B2 (enExample
Inventor
Yoshiya Iida
飯田　喜哉
Takao Hasegawa
隆夫 長谷川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokuyama Corp
Original Assignee
Tokuyama Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokuyama Corp filed Critical Tokuyama Corp
Priority to JP22394582A priority Critical patent/JPS59115739A/ja
Publication of JPS59115739A publication Critical patent/JPS59115739A/ja
Publication of JPH0317770B2 publication Critical patent/JPH0317770B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/0006—Controlling or regulating processes
    • B01J19/0013—Controlling the temperature of the process
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/00074—Controlling the temperature by indirect heating or cooling employing heat exchange fluids
    • B01J2219/00087—Controlling the temperature by indirect heating or cooling employing heat exchange fluids with heat exchange elements outside the reactor
    • B01J2219/00094—Jackets
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/00132—Controlling the temperature using electric heating or cooling elements
    • B01J2219/00135—Electric resistance heaters

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Silicon Compounds (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP22394582A 1982-12-22 1982-12-22 反応装置 Granted JPS59115739A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22394582A JPS59115739A (ja) 1982-12-22 1982-12-22 反応装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22394582A JPS59115739A (ja) 1982-12-22 1982-12-22 反応装置

Publications (2)

Publication Number Publication Date
JPS59115739A true JPS59115739A (ja) 1984-07-04
JPH0317770B2 JPH0317770B2 (enExample) 1991-03-08

Family

ID=16806157

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22394582A Granted JPS59115739A (ja) 1982-12-22 1982-12-22 反応装置

Country Status (1)

Country Link
JP (1) JPS59115739A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010098319A1 (ja) * 2009-02-27 2010-09-02 株式会社トクヤマ 多結晶シリコンロッド及びその製造装置
JP2013082614A (ja) * 2011-10-07 2013-05-09 Wacker Chemie Ag 多結晶シリコンを析出させるための装置及び方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010098319A1 (ja) * 2009-02-27 2010-09-02 株式会社トクヤマ 多結晶シリコンロッド及びその製造装置
CN102300808A (zh) * 2009-02-27 2011-12-28 株式会社德山 多晶硅棒及其制造装置
JP5651104B2 (ja) * 2009-02-27 2015-01-07 株式会社トクヤマ 多結晶シリコンロッド及びその製造装置
JP2013082614A (ja) * 2011-10-07 2013-05-09 Wacker Chemie Ag 多結晶シリコンを析出させるための装置及び方法
US9534290B2 (en) 2011-10-07 2017-01-03 Wacker Chemie Ag Apparatus for deposition of polycrystalline silicon comprising uniformly spaced filament rods and gas inlet orifices, and process for deposition of polycrystalline silicon using same

Also Published As

Publication number Publication date
JPH0317770B2 (enExample) 1991-03-08

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