JPS59113035A - 珪素含有材からなる素地表面に密着性良好なポリイミド層を形成する方法 - Google Patents
珪素含有材からなる素地表面に密着性良好なポリイミド層を形成する方法Info
- Publication number
- JPS59113035A JPS59113035A JP22929483A JP22929483A JPS59113035A JP S59113035 A JPS59113035 A JP S59113035A JP 22929483 A JP22929483 A JP 22929483A JP 22929483 A JP22929483 A JP 22929483A JP S59113035 A JPS59113035 A JP S59113035A
- Authority
- JP
- Japan
- Prior art keywords
- silicon
- solution
- polyimide layer
- polyimide
- precursor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Laminated Bodies (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22929483A JPS59113035A (ja) | 1983-12-05 | 1983-12-05 | 珪素含有材からなる素地表面に密着性良好なポリイミド層を形成する方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22929483A JPS59113035A (ja) | 1983-12-05 | 1983-12-05 | 珪素含有材からなる素地表面に密着性良好なポリイミド層を形成する方法 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56029241A Division JPS5813088B2 (ja) | 1981-02-27 | 1981-02-27 | シロキサン変性ポリイミド前駆体の製造法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59113035A true JPS59113035A (ja) | 1984-06-29 |
JPH0129370B2 JPH0129370B2 (enrdf_load_stackoverflow) | 1989-06-09 |
Family
ID=16889873
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP22929483A Granted JPS59113035A (ja) | 1983-12-05 | 1983-12-05 | 珪素含有材からなる素地表面に密着性良好なポリイミド層を形成する方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59113035A (enrdf_load_stackoverflow) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6162025U (enrdf_load_stackoverflow) * | 1984-09-28 | 1986-04-26 | ||
JPS63317554A (ja) * | 1987-06-19 | 1988-12-26 | Shin Etsu Chem Co Ltd | 液状ポリイミド樹脂組成物 |
US4871833A (en) * | 1986-05-03 | 1989-10-03 | Hoechst Aktiengesellschaft | Polyamic acids, polyimides prepared from these and process for producing high-temperature resistant layers |
JPH0211631A (ja) * | 1988-06-30 | 1990-01-16 | Nippon Steel Chem Co Ltd | 半導体保護用樹脂及び半導体 |
JPH0243221A (ja) * | 1988-06-10 | 1990-02-13 | Occidental Chem Corp | 新規可溶性ポリイミドシロキサン及びその製法及び用途 |
KR100405301B1 (ko) * | 1999-09-10 | 2003-11-12 | 주식회사 엘지화학 | 새로운 폴리이미드 전구체 및 이를 이용한 감광성 수지 조성물 |
CN103483586A (zh) * | 2013-09-25 | 2014-01-01 | 广东生益科技股份有限公司 | 改性聚酰亚胺树脂、含该改性聚酰亚胺树脂的胶黏剂组合物及含该胶黏剂组合物的覆盖膜 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5474677A (en) * | 1977-11-28 | 1979-06-14 | Hitachi Ltd | Surface stabilizing method of semiconcuctor element using polyimide silicone |
-
1983
- 1983-12-05 JP JP22929483A patent/JPS59113035A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5474677A (en) * | 1977-11-28 | 1979-06-14 | Hitachi Ltd | Surface stabilizing method of semiconcuctor element using polyimide silicone |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6162025U (enrdf_load_stackoverflow) * | 1984-09-28 | 1986-04-26 | ||
US4871833A (en) * | 1986-05-03 | 1989-10-03 | Hoechst Aktiengesellschaft | Polyamic acids, polyimides prepared from these and process for producing high-temperature resistant layers |
JPS63317554A (ja) * | 1987-06-19 | 1988-12-26 | Shin Etsu Chem Co Ltd | 液状ポリイミド樹脂組成物 |
JPH0243221A (ja) * | 1988-06-10 | 1990-02-13 | Occidental Chem Corp | 新規可溶性ポリイミドシロキサン及びその製法及び用途 |
JPH0211631A (ja) * | 1988-06-30 | 1990-01-16 | Nippon Steel Chem Co Ltd | 半導体保護用樹脂及び半導体 |
KR100405301B1 (ko) * | 1999-09-10 | 2003-11-12 | 주식회사 엘지화학 | 새로운 폴리이미드 전구체 및 이를 이용한 감광성 수지 조성물 |
CN103483586A (zh) * | 2013-09-25 | 2014-01-01 | 广东生益科技股份有限公司 | 改性聚酰亚胺树脂、含该改性聚酰亚胺树脂的胶黏剂组合物及含该胶黏剂组合物的覆盖膜 |
Also Published As
Publication number | Publication date |
---|---|
JPH0129370B2 (enrdf_load_stackoverflow) | 1989-06-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4520075A (en) | Siloxane-modified polyimide precursor and polyimide | |
EP0525741B1 (en) | Silicone-modified polyimide resin and method for preparing same | |
US4672099A (en) | Soluble polyimide-siloxane precursor, process for producing same and cross-linked polyimide-siloxane | |
JPH01217037A (ja) | 低吸湿性かつ高接着性のシリコン含有ポリイミド及びその前駆体の製造方法 | |
KR101558621B1 (ko) | 폴리이미드 필름 | |
JPS5813087B2 (ja) | シロキサン変性ポリイミド前駆体の製造方法 | |
JPH0291125A (ja) | シリコーンポリイミド及びその製造方法 | |
JPS5813088B2 (ja) | シロキサン変性ポリイミド前駆体の製造法 | |
KR20210057942A (ko) | 고탄성 및 고내열 폴리이미드 필름 및 그 제조방법 | |
JPH0145493B2 (enrdf_load_stackoverflow) | ||
JP2873815B2 (ja) | シロキサン変性ポリアミドイミド樹脂組成物 | |
JPS59107523A (ja) | 半導体素子の保護膜形成方法 | |
JPS59113035A (ja) | 珪素含有材からなる素地表面に密着性良好なポリイミド層を形成する方法 | |
JP2624724B2 (ja) | ポリイミドシロキサン組成物 | |
KR930004942B1 (ko) | 실리콘 폴리이미드 전구체조성물 | |
JP2631878B2 (ja) | ポリイミドシロキサン組成物および膜 | |
JPS6076533A (ja) | ポリイミド前駆体の製造方法 | |
JPS59107524A (ja) | 半導体素子の層間絶縁膜形成方法 | |
JP4940499B2 (ja) | 低誘電率重合体 | |
JPH06271673A (ja) | シロキサン変性ポリアミドイミド樹脂および樹脂組成物 | |
JPH06207024A (ja) | 低弾性率ポリイミドシロキサン複合体及びその製造法 | |
JPS59107521A (ja) | 半導体素子の保護膜形成方法 | |
JPS58118825A (ja) | ポリイミド前駆体の製造法 | |
JP2873816B2 (ja) | シロキサン変性ポリアミドイミド樹脂組成物 | |
JPH06271674A (ja) | シロキサン変性ポリアミドイミド樹脂および樹脂組成物 |