JPS59107522A - 珪素含有材からなる素地表面に密着性良好なポリイミド層を形成する方法 - Google Patents

珪素含有材からなる素地表面に密着性良好なポリイミド層を形成する方法

Info

Publication number
JPS59107522A
JPS59107522A JP58229291A JP22929183A JPS59107522A JP S59107522 A JPS59107522 A JP S59107522A JP 58229291 A JP58229291 A JP 58229291A JP 22929183 A JP22929183 A JP 22929183A JP S59107522 A JPS59107522 A JP S59107522A
Authority
JP
Japan
Prior art keywords
silicon
polyimide
polyimide layer
dianhydride
adhesion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58229291A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0259621B2 (enrdf_load_stackoverflow
Inventor
Kazumasa Igarashi
一雅 五十嵐
Katsuhiko Yamaguchi
勝彦 山口
Kazuo Iko
伊香　和夫
Kazuyuki Miki
三木　和幸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Electric Industrial Co Ltd filed Critical Nitto Electric Industrial Co Ltd
Priority to JP58229291A priority Critical patent/JPS59107522A/ja
Publication of JPS59107522A publication Critical patent/JPS59107522A/ja
Publication of JPH0259621B2 publication Critical patent/JPH0259621B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
    • H01L21/02118—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Silicon Polymers (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Formation Of Insulating Films (AREA)
JP58229291A 1983-12-05 1983-12-05 珪素含有材からなる素地表面に密着性良好なポリイミド層を形成する方法 Granted JPS59107522A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58229291A JPS59107522A (ja) 1983-12-05 1983-12-05 珪素含有材からなる素地表面に密着性良好なポリイミド層を形成する方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58229291A JPS59107522A (ja) 1983-12-05 1983-12-05 珪素含有材からなる素地表面に密着性良好なポリイミド層を形成する方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP56029240A Division JPS5813087B2 (ja) 1981-02-27 1981-02-27 シロキサン変性ポリイミド前駆体の製造方法

Publications (2)

Publication Number Publication Date
JPS59107522A true JPS59107522A (ja) 1984-06-21
JPH0259621B2 JPH0259621B2 (enrdf_load_stackoverflow) 1990-12-13

Family

ID=16889821

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58229291A Granted JPS59107522A (ja) 1983-12-05 1983-12-05 珪素含有材からなる素地表面に密着性良好なポリイミド層を形成する方法

Country Status (1)

Country Link
JP (1) JPS59107522A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH0259621B2 (enrdf_load_stackoverflow) 1990-12-13

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