JPS59105318A - パターン検査装置 - Google Patents

パターン検査装置

Info

Publication number
JPS59105318A
JPS59105318A JP57213904A JP21390482A JPS59105318A JP S59105318 A JPS59105318 A JP S59105318A JP 57213904 A JP57213904 A JP 57213904A JP 21390482 A JP21390482 A JP 21390482A JP S59105318 A JPS59105318 A JP S59105318A
Authority
JP
Japan
Prior art keywords
photomask
chip
pattern
defects
patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57213904A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0423817B2 (enrdf_load_stackoverflow
Inventor
Hideaki Kawashima
川島　英顕
Kiyoshi Nakagawa
清 中川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57213904A priority Critical patent/JPS59105318A/ja
Publication of JPS59105318A publication Critical patent/JPS59105318A/ja
Publication of JPH0423817B2 publication Critical patent/JPH0423817B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP57213904A 1982-12-08 1982-12-08 パターン検査装置 Granted JPS59105318A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57213904A JPS59105318A (ja) 1982-12-08 1982-12-08 パターン検査装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57213904A JPS59105318A (ja) 1982-12-08 1982-12-08 パターン検査装置

Publications (2)

Publication Number Publication Date
JPS59105318A true JPS59105318A (ja) 1984-06-18
JPH0423817B2 JPH0423817B2 (enrdf_load_stackoverflow) 1992-04-23

Family

ID=16646944

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57213904A Granted JPS59105318A (ja) 1982-12-08 1982-12-08 パターン検査装置

Country Status (1)

Country Link
JP (1) JPS59105318A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH0423817B2 (enrdf_load_stackoverflow) 1992-04-23

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