JPH0423817B2 - - Google Patents
Info
- Publication number
- JPH0423817B2 JPH0423817B2 JP21390482A JP21390482A JPH0423817B2 JP H0423817 B2 JPH0423817 B2 JP H0423817B2 JP 21390482 A JP21390482 A JP 21390482A JP 21390482 A JP21390482 A JP 21390482A JP H0423817 B2 JPH0423817 B2 JP H0423817B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- chip
- photomask
- chip patterns
- patterns
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000007547 defect Effects 0.000 claims description 27
- 238000007689 inspection Methods 0.000 claims description 16
- 238000004364 calculation method Methods 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 10
- 238000001514 detection method Methods 0.000 claims description 6
- 230000002950 deficient Effects 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57213904A JPS59105318A (ja) | 1982-12-08 | 1982-12-08 | パターン検査装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57213904A JPS59105318A (ja) | 1982-12-08 | 1982-12-08 | パターン検査装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59105318A JPS59105318A (ja) | 1984-06-18 |
| JPH0423817B2 true JPH0423817B2 (enrdf_load_stackoverflow) | 1992-04-23 |
Family
ID=16646944
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57213904A Granted JPS59105318A (ja) | 1982-12-08 | 1982-12-08 | パターン検査装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59105318A (enrdf_load_stackoverflow) |
-
1982
- 1982-12-08 JP JP57213904A patent/JPS59105318A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59105318A (ja) | 1984-06-18 |
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