JPS59104642A - 集積回路の製法 - Google Patents
集積回路の製法Info
- Publication number
- JPS59104642A JPS59104642A JP58203764A JP20376483A JPS59104642A JP S59104642 A JPS59104642 A JP S59104642A JP 58203764 A JP58203764 A JP 58203764A JP 20376483 A JP20376483 A JP 20376483A JP S59104642 A JPS59104642 A JP S59104642A
- Authority
- JP
- Japan
- Prior art keywords
- light
- layer
- material layer
- compound
- contrast
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title claims description 59
- 238000000034 method Methods 0.000 title claims description 38
- 230000003014 reinforcing effect Effects 0.000 title 1
- 150000001875 compounds Chemical class 0.000 claims description 42
- 229920002120 photoresistant polymer Polymers 0.000 claims description 33
- 230000008033 biological extinction Effects 0.000 claims description 30
- 239000000126 substance Substances 0.000 claims description 18
- 230000003287 optical effect Effects 0.000 claims description 15
- 239000002904 solvent Substances 0.000 claims description 14
- 230000035945 sensitivity Effects 0.000 claims description 12
- 238000010521 absorption reaction Methods 0.000 claims description 10
- 239000011230 binding agent Substances 0.000 claims description 6
- 239000003086 colorant Substances 0.000 claims description 6
- -1 aryl compound Chemical class 0.000 claims description 5
- 230000007423 decrease Effects 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 3
- 230000002708 enhancing effect Effects 0.000 claims description 2
- 230000031700 light absorption Effects 0.000 claims description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 2
- SQDFHQJTAWCFIB-UHFFFAOYSA-N n-methylidenehydroxylamine Chemical compound ON=C SQDFHQJTAWCFIB-UHFFFAOYSA-N 0.000 claims 3
- XHYQTIDZYNZAKZ-UHFFFAOYSA-N 1-[4-(diethylamino)phenyl]-n-phenylmethanimine oxide Chemical compound C1=CC(N(CC)CC)=CC=C1C=[N+]([O-])C1=CC=CC=C1 XHYQTIDZYNZAKZ-UHFFFAOYSA-N 0.000 claims 2
- 241001609030 Brosme brosme Species 0.000 claims 1
- CYTYCFOTNPOANT-UHFFFAOYSA-N Perchloroethylene Chemical compound ClC(Cl)=C(Cl)Cl CYTYCFOTNPOANT-UHFFFAOYSA-N 0.000 claims 1
- 206010034972 Photosensitivity reaction Diseases 0.000 claims 1
- 235000010290 biphenyl Nutrition 0.000 claims 1
- 239000004305 biphenyl Substances 0.000 claims 1
- 125000006267 biphenyl group Chemical group 0.000 claims 1
- 230000003247 decreasing effect Effects 0.000 claims 1
- 230000001747 exhibiting effect Effects 0.000 claims 1
- 125000003588 lysine group Chemical group [H]N([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])(N([H])[H])C(*)=O 0.000 claims 1
- KHIBJEZVFWHHNR-UHFFFAOYSA-N n-(4-acetylphenyl)-1-[4-(diethylamino)phenyl]methanimine oxide Chemical compound C1=CC(N(CC)CC)=CC=C1C=[N+]([O-])C1=CC=C(C(C)=O)C=C1 KHIBJEZVFWHHNR-UHFFFAOYSA-N 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims 1
- 230000036211 photosensitivity Effects 0.000 claims 1
- 239000000725 suspension Substances 0.000 claims 1
- 239000002699 waste material Substances 0.000 claims 1
- 238000002834 transmittance Methods 0.000 description 16
- 239000000203 mixture Substances 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 235000012431 wafers Nutrition 0.000 description 7
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 6
- 150000002430 hydrocarbons Chemical group 0.000 description 6
- 238000004061 bleaching Methods 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- 238000001259 photo etching Methods 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 238000004042 decolorization Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 238000006862 quantum yield reaction Methods 0.000 description 3
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- 241000545744 Hirudinea Species 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000002835 absorbance Methods 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 210000004709 eyebrow Anatomy 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 230000002787 reinforcement Effects 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 238000007363 ring formation reaction Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000004575 stone Substances 0.000 description 2
- 125000000547 substituted alkyl group Chemical group 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- XHRCFGDFESIFRG-UHFFFAOYSA-N 2-chloro-n-ethyl-n-[(2-methylphenyl)methyl]ethanamine Chemical compound ClCCN(CC)CC1=CC=CC=C1C XHRCFGDFESIFRG-UHFFFAOYSA-N 0.000 description 1
- KYARBIJYVGJZLB-UHFFFAOYSA-N 7-amino-4-hydroxy-2-naphthalenesulfonic acid Chemical compound OC1=CC(S(O)(=O)=O)=CC2=CC(N)=CC=C21 KYARBIJYVGJZLB-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- UNPLRYRWJLTVAE-UHFFFAOYSA-N Cloperastine hydrochloride Chemical compound Cl.C1=CC(Cl)=CC=C1C(C=1C=CC=CC=1)OCCN1CCCCC1 UNPLRYRWJLTVAE-UHFFFAOYSA-N 0.000 description 1
- 241000219112 Cucumis Species 0.000 description 1
- 235000015510 Cucumis melo subsp melo Nutrition 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- 241000406668 Loxodonta cyclotis Species 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 101000905241 Mus musculus Heart- and neural crest derivatives-expressed protein 1 Proteins 0.000 description 1
- 101000744152 Naja oxiana Cytotoxin 2 Proteins 0.000 description 1
- 208000012868 Overgrowth Diseases 0.000 description 1
- 101150076031 RAS1 gene Proteins 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- FJJCIZWZNKZHII-UHFFFAOYSA-N [4,6-bis(cyanoamino)-1,3,5-triazin-2-yl]cyanamide Chemical compound N#CNC1=NC(NC#N)=NC(NC#N)=N1 FJJCIZWZNKZHII-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 125000006615 aromatic heterocyclic group Chemical group 0.000 description 1
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 238000003287 bathing Methods 0.000 description 1
- 150000001555 benzenes Chemical class 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000013256 coordination polymer Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 125000002573 ethenylidene group Chemical group [*]=C=C([H])[H] 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 150000003278 haem Chemical class 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 150000002391 heterocyclic compounds Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 230000002895 hyperchromatic effect Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 238000007699 photoisomerization reaction Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920005596 polymer binder Polymers 0.000 description 1
- 239000002491 polymer binding agent Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- WXNYILVTTOXAFR-UHFFFAOYSA-N prop-2-en-1-ol;styrene Chemical compound OCC=C.C=CC1=CC=CC=C1 WXNYILVTTOXAFR-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- KAKZBPTYRLMSJV-UHFFFAOYSA-N vinyl-ethylene Natural products C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US43819482A | 1982-11-01 | 1982-11-01 | |
| US438194 | 1982-11-01 | ||
| US536923 | 1983-09-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59104642A true JPS59104642A (ja) | 1984-06-16 |
| JPS6240697B2 JPS6240697B2 (enrdf_load_stackoverflow) | 1987-08-29 |
Family
ID=23739639
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58203764A Granted JPS59104642A (ja) | 1982-11-01 | 1983-11-01 | 集積回路の製法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59104642A (enrdf_load_stackoverflow) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6184644A (ja) * | 1984-09-04 | 1986-04-30 | マイクロサイ，インコーポレイテッド | 写真製版方法及びバリヤ−層を含む組合せ |
| JPS61250634A (ja) * | 1985-04-30 | 1986-11-07 | Toshiba Corp | パタ−ン形成材料 |
| JPH0341452A (ja) * | 1989-06-02 | 1991-02-21 | Digital Equip Corp <Dec> | 厚い垂直壁を有するフォトレジストパターンを製造するためのマイクロリソグラフィ方法 |
| US5188924A (en) * | 1984-05-14 | 1993-02-23 | Kabushiki Kaisha Toshiba | Pattern forming method utilizing material with photoresist film underlayer and contrast enhancement overlayer containing photosensitive diazonium salt |
| JPH06148899A (ja) * | 1992-11-02 | 1994-05-27 | Shin Etsu Chem Co Ltd | レジストパターン形成方法 |
| US5902716A (en) * | 1995-09-05 | 1999-05-11 | Nikon Corporation | Exposure method and apparatus |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI875260B (zh) * | 2023-10-23 | 2025-03-01 | 奇美實業股份有限公司 | 水溶性組合物、其用途及半導體裝置的製造方法 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3416922A (en) * | 1963-07-04 | 1968-12-17 | Azoplate Corp | Resinous printing plate compositions containing light-sensitive nitrones |
| GB1186772A (en) * | 1966-07-01 | 1970-04-02 | American Cyanamid Co | Improved Technique of Photographic Dodging and Modified Photographic Film |
| JPS4988466A (enrdf_load_stackoverflow) * | 1972-11-30 | 1974-08-23 | ||
| US3873313A (en) * | 1973-05-21 | 1975-03-25 | Ibm | Process for forming a resist mask |
| US4005437A (en) * | 1975-04-18 | 1977-01-25 | Rca Corporation | Method of recording information in which the electron beam sensitive material contains 4,4'-bis(3-diazo-3-4-oxo-1-naphthalene sulfonyloxy)benzil |
-
1983
- 1983-11-01 JP JP58203764A patent/JPS59104642A/ja active Granted
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3416922A (en) * | 1963-07-04 | 1968-12-17 | Azoplate Corp | Resinous printing plate compositions containing light-sensitive nitrones |
| GB1186772A (en) * | 1966-07-01 | 1970-04-02 | American Cyanamid Co | Improved Technique of Photographic Dodging and Modified Photographic Film |
| JPS4988466A (enrdf_load_stackoverflow) * | 1972-11-30 | 1974-08-23 | ||
| US3873313A (en) * | 1973-05-21 | 1975-03-25 | Ibm | Process for forming a resist mask |
| US4005437A (en) * | 1975-04-18 | 1977-01-25 | Rca Corporation | Method of recording information in which the electron beam sensitive material contains 4,4'-bis(3-diazo-3-4-oxo-1-naphthalene sulfonyloxy)benzil |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5188924A (en) * | 1984-05-14 | 1993-02-23 | Kabushiki Kaisha Toshiba | Pattern forming method utilizing material with photoresist film underlayer and contrast enhancement overlayer containing photosensitive diazonium salt |
| JPS6184644A (ja) * | 1984-09-04 | 1986-04-30 | マイクロサイ，インコーポレイテッド | 写真製版方法及びバリヤ−層を含む組合せ |
| JPS61250634A (ja) * | 1985-04-30 | 1986-11-07 | Toshiba Corp | パタ−ン形成材料 |
| JPH0341452A (ja) * | 1989-06-02 | 1991-02-21 | Digital Equip Corp <Dec> | 厚い垂直壁を有するフォトレジストパターンを製造するためのマイクロリソグラフィ方法 |
| JPH06148899A (ja) * | 1992-11-02 | 1994-05-27 | Shin Etsu Chem Co Ltd | レジストパターン形成方法 |
| US5902716A (en) * | 1995-09-05 | 1999-05-11 | Nikon Corporation | Exposure method and apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6240697B2 (enrdf_load_stackoverflow) | 1987-08-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |