JPS5894149A - 光デイスクの光干渉型案内溝作製用原板の製造法 - Google Patents

光デイスクの光干渉型案内溝作製用原板の製造法

Info

Publication number
JPS5894149A
JPS5894149A JP56192113A JP19211381A JPS5894149A JP S5894149 A JPS5894149 A JP S5894149A JP 56192113 A JP56192113 A JP 56192113A JP 19211381 A JP19211381 A JP 19211381A JP S5894149 A JPS5894149 A JP S5894149A
Authority
JP
Japan
Prior art keywords
guide groove
optical
type guide
photo resist
recording
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56192113A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0313652B2 (enrdf_load_stackoverflow
Inventor
Nobuhiko Sakai
酒井　順彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP56192113A priority Critical patent/JPS5894149A/ja
Publication of JPS5894149A publication Critical patent/JPS5894149A/ja
Publication of JPH0313652B2 publication Critical patent/JPH0313652B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP56192113A 1981-11-30 1981-11-30 光デイスクの光干渉型案内溝作製用原板の製造法 Granted JPS5894149A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56192113A JPS5894149A (ja) 1981-11-30 1981-11-30 光デイスクの光干渉型案内溝作製用原板の製造法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56192113A JPS5894149A (ja) 1981-11-30 1981-11-30 光デイスクの光干渉型案内溝作製用原板の製造法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2510489A Division JPH0656672B2 (ja) 1989-02-03 1989-02-03 光ディスクの光干渉型案内溝作製用原板の製造法

Publications (2)

Publication Number Publication Date
JPS5894149A true JPS5894149A (ja) 1983-06-04
JPH0313652B2 JPH0313652B2 (enrdf_load_stackoverflow) 1991-02-25

Family

ID=16285875

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56192113A Granted JPS5894149A (ja) 1981-11-30 1981-11-30 光デイスクの光干渉型案内溝作製用原板の製造法

Country Status (1)

Country Link
JP (1) JPS5894149A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6284449A (ja) * 1985-10-09 1987-04-17 Nippon Telegr & Teleph Corp <Ntt> 多数溝同時形成方法
JPS63271741A (ja) * 1987-04-30 1988-11-09 Canon Inc 光記録媒体の製造方法
JPH02127648A (ja) * 1988-11-08 1990-05-16 Matsushita Electric Ind Co Ltd 光ディスク原盤の製造方法
US20070274633A1 (en) * 2006-04-24 2007-11-29 Alex Raub Large area patterning using interferometric lithography
US7459241B2 (en) * 2003-09-22 2008-12-02 Seagate Technology Llc Rotary apertured interferometric lithography (RAIL)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6284449A (ja) * 1985-10-09 1987-04-17 Nippon Telegr & Teleph Corp <Ntt> 多数溝同時形成方法
JPS63271741A (ja) * 1987-04-30 1988-11-09 Canon Inc 光記録媒体の製造方法
JPH02127648A (ja) * 1988-11-08 1990-05-16 Matsushita Electric Ind Co Ltd 光ディスク原盤の製造方法
US7459241B2 (en) * 2003-09-22 2008-12-02 Seagate Technology Llc Rotary apertured interferometric lithography (RAIL)
US7642041B2 (en) 2003-09-22 2010-01-05 Seagate Technology Llc Rotary apertured interferometric lithography (RAIL)
US20070274633A1 (en) * 2006-04-24 2007-11-29 Alex Raub Large area patterning using interferometric lithography
US8685628B2 (en) * 2006-04-24 2014-04-01 Stc.Unm Large area patterning using interferometric lithography

Also Published As

Publication number Publication date
JPH0313652B2 (enrdf_load_stackoverflow) 1991-02-25

Similar Documents

Publication Publication Date Title
US5399461A (en) Optical disk for use in optical memory devices
JP2723986B2 (ja) 光ディスク原盤の作製方法
EP0108258B1 (en) A master disk for optical disk manufacture, and a method and the system for manufacturing the same
JPS60170045A (ja) アドレス，案内溝付光デイスク製造方法
JPS5894149A (ja) 光デイスクの光干渉型案内溝作製用原板の製造法
JPS63257921A (ja) 情報記録媒体とその製造方法
JPH01315048A (ja) 光ディスクの光干渉型案内溝作製用原板の製造法
JPS63124246A (ja) 光学的記録媒体用原盤の製造方法
JP2508076B2 (ja) 光デイスク原盤露光方法
JPH02244440A (ja) 光ディスク原盤の製造方法
JPS6284450A (ja) 光デイスク用基板の製造方法
EP0982716A1 (en) Optical recording medium and master to produce it and optical recording and/or reproducing apparatus
JP2577058B2 (ja) 光メモリ素子用基板およびその製造方法
JPS5933645A (ja) 情報記憶媒体用原盤及びその製造方法
JPS62223837A (ja) 光記録原盤の製造方法
JPH02126436A (ja) 光ディスク原盤の製造方法
JPH02189747A (ja) 光記録媒体製造方法
JPH01185851A (ja) 光ディスク原盤の製造方法
JPS58199451A (ja) 光情報記録媒体の製造方法
JPS63133334A (ja) 光デイスク用原盤の製造方法
JPS59203251A (ja) 光記録媒体
JPS59180839A (ja) 原盤の溝形成方法
JPS62183047A (ja) 光学式記録媒体の製造方法
JPS5936340A (ja) 情報記憶媒体用原盤及びその製造方法
JPS6129592A (ja) 二次元光学用パタ−ンの形成方法