JPS5889869A - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法Info
- Publication number
- JPS5889869A JPS5889869A JP56187631A JP18763181A JPS5889869A JP S5889869 A JPS5889869 A JP S5889869A JP 56187631 A JP56187631 A JP 56187631A JP 18763181 A JP18763181 A JP 18763181A JP S5889869 A JPS5889869 A JP S5889869A
- Authority
- JP
- Japan
- Prior art keywords
- film
- polysilicon
- oxide film
- insulating film
- gate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
Landscapes
- Non-Volatile Memory (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Semiconductor Memories (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56187631A JPS5889869A (ja) | 1981-11-20 | 1981-11-20 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56187631A JPS5889869A (ja) | 1981-11-20 | 1981-11-20 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5889869A true JPS5889869A (ja) | 1983-05-28 |
| JPS6312389B2 JPS6312389B2 (enrdf_load_stackoverflow) | 1988-03-18 |
Family
ID=16209485
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56187631A Granted JPS5889869A (ja) | 1981-11-20 | 1981-11-20 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5889869A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60198855A (ja) * | 1984-03-23 | 1985-10-08 | Nec Corp | 半導体集積回路装置の製造方法 |
| JPS615574A (ja) * | 1984-06-20 | 1986-01-11 | Hitachi Micro Comput Eng Ltd | 半導体装置の製造方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5394780A (en) * | 1977-01-14 | 1978-08-19 | Hitachi Ltd | Manufacture of semiconductor device |
| JPS558062A (en) * | 1978-07-03 | 1980-01-21 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Manufacture of semiconductor |
| JPS5559778A (en) * | 1978-10-30 | 1980-05-06 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Method of fabricating semiconductor device |
-
1981
- 1981-11-20 JP JP56187631A patent/JPS5889869A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5394780A (en) * | 1977-01-14 | 1978-08-19 | Hitachi Ltd | Manufacture of semiconductor device |
| JPS558062A (en) * | 1978-07-03 | 1980-01-21 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Manufacture of semiconductor |
| JPS5559778A (en) * | 1978-10-30 | 1980-05-06 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Method of fabricating semiconductor device |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60198855A (ja) * | 1984-03-23 | 1985-10-08 | Nec Corp | 半導体集積回路装置の製造方法 |
| JPS615574A (ja) * | 1984-06-20 | 1986-01-11 | Hitachi Micro Comput Eng Ltd | 半導体装置の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6312389B2 (enrdf_load_stackoverflow) | 1988-03-18 |
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