JPS5872837U - 減圧気相成長装置 - Google Patents

減圧気相成長装置

Info

Publication number
JPS5872837U
JPS5872837U JP16801681U JP16801681U JPS5872837U JP S5872837 U JPS5872837 U JP S5872837U JP 16801681 U JP16801681 U JP 16801681U JP 16801681 U JP16801681 U JP 16801681U JP S5872837 U JPS5872837 U JP S5872837U
Authority
JP
Japan
Prior art keywords
vapor phase
phase growth
pressure vapor
reduced pressure
growth equipment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16801681U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0438515Y2 (enrdf_load_stackoverflow
Inventor
柴田　英治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Denki Electric Inc
Original Assignee
Hitachi Kokusai Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Kokusai Electric Inc filed Critical Hitachi Kokusai Electric Inc
Priority to JP16801681U priority Critical patent/JPS5872837U/ja
Publication of JPS5872837U publication Critical patent/JPS5872837U/ja
Application granted granted Critical
Publication of JPH0438515Y2 publication Critical patent/JPH0438515Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
JP16801681U 1981-11-10 1981-11-10 減圧気相成長装置 Granted JPS5872837U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16801681U JPS5872837U (ja) 1981-11-10 1981-11-10 減圧気相成長装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16801681U JPS5872837U (ja) 1981-11-10 1981-11-10 減圧気相成長装置

Publications (2)

Publication Number Publication Date
JPS5872837U true JPS5872837U (ja) 1983-05-17
JPH0438515Y2 JPH0438515Y2 (enrdf_load_stackoverflow) 1992-09-09

Family

ID=29960067

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16801681U Granted JPS5872837U (ja) 1981-11-10 1981-11-10 減圧気相成長装置

Country Status (1)

Country Link
JP (1) JPS5872837U (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6037717A (ja) * 1983-08-10 1985-02-27 Seiko Epson Corp 半導体装置の製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4994568U (enrdf_load_stackoverflow) * 1972-10-25 1974-08-15
JPS55180774U (enrdf_load_stackoverflow) * 1979-06-08 1980-12-25

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4994568U (enrdf_load_stackoverflow) * 1972-10-25 1974-08-15
JPS55180774U (enrdf_load_stackoverflow) * 1979-06-08 1980-12-25

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6037717A (ja) * 1983-08-10 1985-02-27 Seiko Epson Corp 半導体装置の製造方法

Also Published As

Publication number Publication date
JPH0438515Y2 (enrdf_load_stackoverflow) 1992-09-09

Similar Documents

Publication Publication Date Title
JPS5872837U (ja) 減圧気相成長装置
JPS5885110U (ja) 高周波加熱装置
JPS5955231U (ja) ガス燃焼炉
JPS59109777U (ja) 原料ガス供給装置
JPS60136137U (ja) 減圧ｃｖｄ装置
JPS60149132U (ja) 半導体熱処理炉
JPS60152669U (ja) 連続焼鈍炉内の雰囲気ガス混合防止装置
JPS5926238U (ja) Ｃｖｄ装置
JPS587863U (ja) 粉体吹込み用ランス
JPS59109776U (ja) 気相成長装置
JPS60119743U (ja) 化学的気相付着装置
JPS59110039U (ja) ガス反応器
JPS5815802U (ja) ボイラ
JPS58168574U (ja) 気相成長反応炉
JPS6018541U (ja) 気相成長装置
JPS59165461U (ja) ガス吹込み用ノズル
JPS59176000U (ja) オ−ルケ−ス型真空熱処理炉用端子
JPS6113298U (ja) 耐火物の火災溶射用ガンノズル
JPS60136136U (ja) 半導体製造装置
JPS6142832U (ja) 気相成長装置
JPS5858334U (ja) 半導体ウエハ−熱処理用ノズル式炉芯管
JPS596836U (ja) 薄膜気相成長装置
JPS58173237U (ja) 基板の熱処理装置
JPS6139228U (ja) ガス燃焼装置
JPS6113929U (ja) 気相成長装置