JPS5856414A - プラズマ気相法 - Google Patents

プラズマ気相法

Info

Publication number
JPS5856414A
JPS5856414A JP56155425A JP15542581A JPS5856414A JP S5856414 A JPS5856414 A JP S5856414A JP 56155425 A JP56155425 A JP 56155425A JP 15542581 A JP15542581 A JP 15542581A JP S5856414 A JPS5856414 A JP S5856414A
Authority
JP
Japan
Prior art keywords
silicon
reactive gas
silicon carbide
tube
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56155425A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0332209B2 (en:Method
Inventor
Shunpei Yamazaki
舜平 山崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
Original Assignee
Semiconductor Energy Laboratory Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Priority to JP56155425A priority Critical patent/JPS5856414A/ja
Publication of JPS5856414A publication Critical patent/JPS5856414A/ja
Publication of JPH0332209B2 publication Critical patent/JPH0332209B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only
    • H10P14/24—
    • H10P14/2923—
    • H10P14/3208—
    • H10P14/3408—

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Led Devices (AREA)
  • Photovoltaic Devices (AREA)
JP56155425A 1981-09-30 1981-09-30 プラズマ気相法 Granted JPS5856414A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56155425A JPS5856414A (ja) 1981-09-30 1981-09-30 プラズマ気相法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56155425A JPS5856414A (ja) 1981-09-30 1981-09-30 プラズマ気相法

Publications (2)

Publication Number Publication Date
JPS5856414A true JPS5856414A (ja) 1983-04-04
JPH0332209B2 JPH0332209B2 (en:Method) 1991-05-10

Family

ID=15605720

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56155425A Granted JPS5856414A (ja) 1981-09-30 1981-09-30 プラズマ気相法

Country Status (1)

Country Link
JP (1) JPS5856414A (en:Method)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0529652A (ja) * 1991-07-19 1993-02-05 Tdk Corp 青色発光素子及びその製造方法
CN102891073A (zh) * 2012-09-28 2013-01-23 南京航空航天大学 一种低温等离子体辅助铝诱导多晶碳化硅薄膜的制备方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0529652A (ja) * 1991-07-19 1993-02-05 Tdk Corp 青色発光素子及びその製造方法
CN102891073A (zh) * 2012-09-28 2013-01-23 南京航空航天大学 一种低温等离子体辅助铝诱导多晶碳化硅薄膜的制备方法

Also Published As

Publication number Publication date
JPH0332209B2 (en:Method) 1991-05-10

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