JPS5855566A - 対向タ−ゲツト式スパツタ装置 - Google Patents
対向タ−ゲツト式スパツタ装置Info
- Publication number
- JPS5855566A JPS5855566A JP15299481A JP15299481A JPS5855566A JP S5855566 A JPS5855566 A JP S5855566A JP 15299481 A JP15299481 A JP 15299481A JP 15299481 A JP15299481 A JP 15299481A JP S5855566 A JPS5855566 A JP S5855566A
- Authority
- JP
- Japan
- Prior art keywords
- target
- targets
- substrate
- sputtering
- magnetic field
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004544 sputter deposition Methods 0.000 title claims abstract description 55
- 239000000758 substrate Substances 0.000 claims description 40
- 210000000554 iris Anatomy 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 239000002245 particle Substances 0.000 abstract description 18
- 239000010409 thin film Substances 0.000 abstract description 10
- 239000010408 film Substances 0.000 abstract description 9
- 239000000203 mixture Substances 0.000 abstract description 3
- 238000010586 diagram Methods 0.000 description 7
- 238000000151 deposition Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 241000218691 Cupressaceae Species 0.000 description 1
- 239000011149 active material Substances 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 210000003323 beak Anatomy 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Thin Magnetic Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15299481A JPS5855566A (ja) | 1981-09-29 | 1981-09-29 | 対向タ−ゲツト式スパツタ装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15299481A JPS5855566A (ja) | 1981-09-29 | 1981-09-29 | 対向タ−ゲツト式スパツタ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5855566A true JPS5855566A (ja) | 1983-04-01 |
| JPS6214633B2 JPS6214633B2 (enrdf_load_stackoverflow) | 1987-04-03 |
Family
ID=15552627
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15299481A Granted JPS5855566A (ja) | 1981-09-29 | 1981-09-29 | 対向タ−ゲツト式スパツタ装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5855566A (enrdf_load_stackoverflow) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6089569A (ja) * | 1983-10-21 | 1985-05-20 | Teijin Ltd | 合金薄膜の形成方法 |
| JPS60182711A (ja) * | 1984-02-29 | 1985-09-18 | Konishiroku Photo Ind Co Ltd | 磁性薄膜の形成方法およびその装置 |
| US5051972A (en) * | 1987-06-30 | 1991-09-24 | Kabushiki Kaisha Toshiba | Track accessing control apparatus having a high-pass filter for extracting a tracking signal |
| US5533042A (en) * | 1993-10-12 | 1996-07-02 | Fuji Xerox Co., Ltd. | Semiconductor laser device and driving method for the same as well as tracking servo system employing the same |
| EP1261042A1 (en) * | 2001-05-14 | 2002-11-27 | Kido, Junji | Method for producing organic thin-film device by use of facing-targets-type sputtering apparatus |
| JP2015535889A (ja) * | 2012-09-26 | 2015-12-17 | ビーエムシー カンパニー リミテッド | プラズマ化学気相蒸着装置 |
| WO2017169029A1 (ja) * | 2016-03-30 | 2017-10-05 | 京浜ラムテック株式会社 | スパッタリングカソード、スパッタリング装置および成膜体の製造方法 |
| JP2017179437A (ja) * | 2016-03-30 | 2017-10-05 | 京浜ラムテック株式会社 | スパッタリングカソード、スパッタリング装置および成膜体の製造方法 |
| WO2018069091A1 (en) * | 2016-10-14 | 2018-04-19 | Evatec Ag | Sputtering source |
| JP2018111886A (ja) * | 2018-04-10 | 2018-07-19 | 京浜ラムテック株式会社 | デバイスの製造方法およびフィルムの製造方法 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4563629B2 (ja) | 2001-11-19 | 2010-10-13 | 株式会社エフ・ティ・エスコーポレーション | 対向ターゲット式スパッタ装置 |
-
1981
- 1981-09-29 JP JP15299481A patent/JPS5855566A/ja active Granted
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6089569A (ja) * | 1983-10-21 | 1985-05-20 | Teijin Ltd | 合金薄膜の形成方法 |
| JPS60182711A (ja) * | 1984-02-29 | 1985-09-18 | Konishiroku Photo Ind Co Ltd | 磁性薄膜の形成方法およびその装置 |
| US5051972A (en) * | 1987-06-30 | 1991-09-24 | Kabushiki Kaisha Toshiba | Track accessing control apparatus having a high-pass filter for extracting a tracking signal |
| US5533042A (en) * | 1993-10-12 | 1996-07-02 | Fuji Xerox Co., Ltd. | Semiconductor laser device and driving method for the same as well as tracking servo system employing the same |
| EP1261042A1 (en) * | 2001-05-14 | 2002-11-27 | Kido, Junji | Method for producing organic thin-film device by use of facing-targets-type sputtering apparatus |
| JP2015535889A (ja) * | 2012-09-26 | 2015-12-17 | ビーエムシー カンパニー リミテッド | プラズマ化学気相蒸着装置 |
| WO2017169029A1 (ja) * | 2016-03-30 | 2017-10-05 | 京浜ラムテック株式会社 | スパッタリングカソード、スパッタリング装置および成膜体の製造方法 |
| JP2017179437A (ja) * | 2016-03-30 | 2017-10-05 | 京浜ラムテック株式会社 | スパッタリングカソード、スパッタリング装置および成膜体の製造方法 |
| US10692708B2 (en) | 2016-03-30 | 2020-06-23 | Keihin Ramtech Co., Ltd. | Sputtering cathode, sputtering device, and method for producing film-formed body |
| WO2018069091A1 (en) * | 2016-10-14 | 2018-04-19 | Evatec Ag | Sputtering source |
| CN109804455A (zh) * | 2016-10-14 | 2019-05-24 | 瑞士艾发科技 | 溅射源 |
| JP2019533762A (ja) * | 2016-10-14 | 2019-11-21 | エヴァテック・アーゲー | スパッタリングソース |
| CN109804455B (zh) * | 2016-10-14 | 2022-03-15 | 瑞士艾发科技 | 溅射源 |
| JP2018111886A (ja) * | 2018-04-10 | 2018-07-19 | 京浜ラムテック株式会社 | デバイスの製造方法およびフィルムの製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6214633B2 (enrdf_load_stackoverflow) | 1987-04-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CA2326202C (en) | Method and apparatus for deposition of biaxially textured coatings | |
| US9394603B2 (en) | Soft sputtering magnetron system | |
| JPH11302839A (ja) | スパッタリング装置 | |
| US20190252166A1 (en) | Sputtering source | |
| JPS5855566A (ja) | 対向タ−ゲツト式スパツタ装置 | |
| JP2934711B2 (ja) | スパッタ装置 | |
| JP2001064770A (ja) | スパッタリング装置 | |
| JPH079062B2 (ja) | スパツタ装置 | |
| US20090205950A1 (en) | Film deposition apparatus and film deposition method | |
| JPH08209343A (ja) | 平面マグネトロン・スパッタリングの方法と装置 | |
| JPS6151410B2 (enrdf_load_stackoverflow) | ||
| JPS58189371A (ja) | スパツタ装置 | |
| JPH056286B2 (enrdf_load_stackoverflow) | ||
| JP3151031B2 (ja) | マグネトロンスパッタ装置 | |
| JP2001081553A (ja) | スパッタ方法と装置 | |
| JPS61272374A (ja) | スパツタ装置 | |
| JPS61170566A (ja) | スパツタ装置 | |
| JPH0116912B2 (enrdf_load_stackoverflow) | ||
| JPH0459606A (ja) | 超伝導薄膜作成装置 | |
| JPS6320303B2 (enrdf_load_stackoverflow) | ||
| JPH056287B2 (enrdf_load_stackoverflow) | ||
| JPS61124567A (ja) | スパツタリング装置 | |
| JPS59143067A (ja) | スパツタリング装置 | |
| JPH0470392B2 (enrdf_load_stackoverflow) | ||
| JPS63140079A (ja) | スパツタリング装置 |