JPS5855325A - アモルフアスシリコン生成装置 - Google Patents

アモルフアスシリコン生成装置

Info

Publication number
JPS5855325A
JPS5855325A JP56150949A JP15094981A JPS5855325A JP S5855325 A JPS5855325 A JP S5855325A JP 56150949 A JP56150949 A JP 56150949A JP 15094981 A JP15094981 A JP 15094981A JP S5855325 A JPS5855325 A JP S5855325A
Authority
JP
Japan
Prior art keywords
gas
gaseous
amorphous silicon
hydrogen
reaction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56150949A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0112836B2 (https=
Inventor
Kunio Sukigara
鋤柄　邦男
Toyoki Kazama
風間　豊喜
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Fuji Electric Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd, Fuji Electric Manufacturing Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP56150949A priority Critical patent/JPS5855325A/ja
Priority to US06/382,475 priority patent/US4460673A/en
Priority to DE19823220683 priority patent/DE3220683A1/de
Publication of JPS5855325A publication Critical patent/JPS5855325A/ja
Publication of JPH0112836B2 publication Critical patent/JPH0112836B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Recrystallisation Techniques (AREA)
  • Light Receiving Elements (AREA)
  • Silicon Compounds (AREA)
  • Chemical Vapour Deposition (AREA)
JP56150949A 1981-06-03 1981-09-24 アモルフアスシリコン生成装置 Granted JPS5855325A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP56150949A JPS5855325A (ja) 1981-09-24 1981-09-24 アモルフアスシリコン生成装置
US06/382,475 US4460673A (en) 1981-06-03 1982-05-27 Method of producing amorphous silicon layer and its manufacturing apparatus
DE19823220683 DE3220683A1 (de) 1981-06-03 1982-06-02 Verfahren und vorrichtung zur herstellung einer amorphen siliciumschicht

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56150949A JPS5855325A (ja) 1981-09-24 1981-09-24 アモルフアスシリコン生成装置

Publications (2)

Publication Number Publication Date
JPS5855325A true JPS5855325A (ja) 1983-04-01
JPH0112836B2 JPH0112836B2 (https=) 1989-03-02

Family

ID=15507934

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56150949A Granted JPS5855325A (ja) 1981-06-03 1981-09-24 アモルフアスシリコン生成装置

Country Status (1)

Country Link
JP (1) JPS5855325A (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016522140A (ja) * 2013-04-24 2016-07-28 エボニック デグサ ゲーエムベーハーＥｖｏｎｉｋ Ｄｅｇｕｓｓａ ＧｍｂＨ ポリシランの製造方法および製造装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016522140A (ja) * 2013-04-24 2016-07-28 エボニック デグサ ゲーエムベーハーＥｖｏｎｉｋ Ｄｅｇｕｓｓａ ＧｍｂＨ ポリシランの製造方法および製造装置

Also Published As

Publication number Publication date
JPH0112836B2 (https=) 1989-03-02

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