JPS5835527B2 - 電子官能性樹脂 - Google Patents

電子官能性樹脂

Info

Publication number
JPS5835527B2
JPS5835527B2 JP52059292A JP5929277A JPS5835527B2 JP S5835527 B2 JPS5835527 B2 JP S5835527B2 JP 52059292 A JP52059292 A JP 52059292A JP 5929277 A JP5929277 A JP 5929277A JP S5835527 B2 JPS5835527 B2 JP S5835527B2
Authority
JP
Japan
Prior art keywords
resin
methacrylate
radical
item
alkyl group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP52059292A
Other languages
English (en)
Japanese (ja)
Other versions
JPS52142793A (en
Inventor
アルマン・エラニアン
クロード・デユシユン
フランセーズ・バール
マリーズ・ガザール
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Publication of JPS52142793A publication Critical patent/JPS52142793A/ja
Publication of JPS5835527B2 publication Critical patent/JPS5835527B2/ja
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/38—Esters containing sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/143—Electron beam

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
JP52059292A 1976-05-21 1977-05-21 電子官能性樹脂 Expired JPS5835527B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7615520A FR2352007A1 (fr) 1976-05-21 1976-05-21 Resine sensible aux electrons et procede de fabrication de ladite resine

Publications (2)

Publication Number Publication Date
JPS52142793A JPS52142793A (en) 1977-11-28
JPS5835527B2 true JPS5835527B2 (ja) 1983-08-03

Family

ID=9173500

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52059292A Expired JPS5835527B2 (ja) 1976-05-21 1977-05-21 電子官能性樹脂

Country Status (5)

Country Link
US (1) US4315067A (enExample)
JP (1) JPS5835527B2 (enExample)
DE (1) DE2722951C2 (enExample)
FR (1) FR2352007A1 (enExample)
GB (1) GB1576741A (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2382709A1 (fr) * 1977-03-04 1978-09-29 Thomson Csf Famille de composes comportant un cycle thiirane, reticulables par irradiation photonique
FR2441634A1 (fr) * 1978-11-14 1980-06-13 Thomson Csf Resine a cycle thietane reticulable par irradiation electronique ou photonique et son utilisation pour la fabrication de composants electroniques et de couches de protection
FR2472768A1 (fr) * 1979-12-27 1981-07-03 Thomson Csf Composition photopolymerisable comportant un cycle thiirane, procede de revetement d'une fibre optique utilisant une telle composition, et fibre ainsi revetue
JPS59146048A (ja) * 1983-02-09 1984-08-21 Chisso Corp 電子線又はｘ線に感応性の樹脂
GB2163435B (en) * 1984-07-11 1987-07-22 Asahi Chemical Ind Image-forming materials sensitive to high-energy beam
FR2630744B1 (fr) * 1988-04-29 1992-04-17 Thomson Csf Procede d'obtention d'un materiau polymere utilisable en optique non lineaire et materiau polymere obtenu
JP3245324B2 (ja) * 1995-03-31 2002-01-15 カネボウ株式会社 金属接着剤及び接着方法
TWI482814B (zh) * 2007-03-16 2015-05-01 Mitsubishi Gas Chemical Co 光學材料用樹脂組成物及由該組成物得到之光學材料
GB2515697B (en) * 2012-04-26 2020-03-04 Ppg Ind Ohio Inc Polymerizable compositions containing ethylenically unsaturated monomers having episulfide functional groups and related methods
US9279907B2 (en) 2012-12-05 2016-03-08 Ppg Industries Ohio, Inc. Epoxide and thioepoxide functional, polymerizable compositions and methods of preparing optical articles therefrom

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3364184A (en) * 1959-12-04 1968-01-16 Shell Oil Co Oil - soluble polymeric glycidyl compounds and functional organic compositions containing them
US3404158A (en) * 1964-05-18 1968-10-01 Thiokol Chemical Corp Thioglycidyl compounds
US4130424A (en) * 1976-08-06 1978-12-19 Bell Telephone Laboratories, Incorporated Process using radiation curable epoxy containing resist and resultant product

Also Published As

Publication number Publication date
DE2722951A1 (de) 1977-12-01
FR2352007A1 (fr) 1977-12-16
JPS52142793A (en) 1977-11-28
DE2722951C2 (de) 1987-05-07
FR2352007B1 (enExample) 1979-08-17
US4315067A (en) 1982-02-09
GB1576741A (en) 1980-10-15

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